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直流反应磁控溅射制备Zn_(1-x)Cd_xO薄膜的结构和光学性能研究
引用本文:姚斌,;岳永高,;隋瑛锐,;杨景海. 直流反应磁控溅射制备Zn_(1-x)Cd_xO薄膜的结构和光学性能研究[J]. 吉林师范大学学报(自然科学版), 2014, 0(3): 1-5
作者姓名:姚斌,  岳永高,  隋瑛锐,  杨景海
作者单位:[1]吉林大学物理学院,吉林长春130023; [2]吉林师范大学物理学院,吉林四平136000
基金项目:国家自然科学基金项目(11274135,11254001)
摘    要:利用直流反应磁控溅射的方法在玻璃衬底上沉积了(002)方向高度择优生长的纤锌矿结构的Zn1-xCdxO(x=0,0.2)合金薄膜.利用XRD、XPS、TEM、PL对薄膜的结构和光学性能进行了详细研究.结果表明,随着x=0到x=0.2,(002)衍射峰从34.36°偏移到33.38°,(002)方向的晶面间距从0.260 nm增加到0.268 nm,Zn1-xCdxO薄膜的光学带隙也从3.20 eV减小到2.70 eV,相应的近带边发光峰从393 nm红移到467 nm.另外,我们还从能带结构观点对Zn1-xCdxO薄膜的发光机理进行了研究.

关 键 词:磁控溅射  Zn1-x  CdxO  薄膜  结构  光学性质

Structure and Optical Properties of Zn 1-x CdxO Thin Films Synthesized by the dc Reactive Magnetron Sputtering
Affiliation:YAO BIn, YUE Yong-gao, SUI YIng-ruI, YANG JIng-haI ( 1. College of Physics, Jilin University, Changchun 130023, China ; 2. College of Physics, Jilin Normal University, Siping 136000, China)
Abstract:The ternary Zn1-x Cdx O( x = 0,0. 2)thin films with wurtzite structure and highly(002)-preferred orientations were deposited on glass substrates by the direct current(dc)reactive magnetron sputtering method. The X-ray diffraction( XRD),X-ray photoelectron spectroscopy( XPS),transmission electron microscopy (TEM),optical absorption spectra and photoluminescence(PL)were employed to investigate the structural and the optical properties in detail. Results indicated that as x varies from x = 0 to 0. 2,the diffraction angle of the (002)peaks decreased from 34. 36 to 33. 38° and the lattice spacing increased from 0. 260 to 0. 268 nm. Moreover,the optical band-gap of the Zn1-x Cdx O thin films with the wurtzite structure decreased from 3. 20 eV at x = 0 to 2. 70 eV at x = 0. 2. Correspondingly,the near-band-edge emission peak was red-shifted from 393 to 467 nm. In addition,the PL mechanism of the Zn1-x Cdx O alloy films was discussed in detail from the viewpoint of band structure.
Keywords:magnetron sputtering  Zn1-x Cdx O film  structure  optical properties
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