氧浓度对磁控溅射Ti／WO3薄膜光学性能的影响

在不同氧浓度下，采用直流反应磁控溅射技术在玻璃基片上制备了Ti掺杂的WO3薄膜并在450℃退火。用X射线衍射（XRD）、分光光度计、台阶仪等对薄膜的结构和光学性质进行表征，分析了不同氧浓度对气敏薄膜的透光率、微结构及光学带隙的影响。结果表明，氧浓度增大，沉积速率越慢，膜厚度减小，薄膜的平均晶粒尺寸增大，晶面间距增大；透射率曲线随着氧浓度的增加逐渐向短波方向移动，表明薄膜的光学带隙宽度随氧浓度的增大而变大。

Influence of O2 Concentration on Structure and Optical Properties of WO3/Ti Thin Films Prepared by DC Sputtering

The WO3： Ti thin films are prepared on glass substrates at different O2 concentration by DC-reactive magnectron sputtering technology and then annealed at 450℃. The films are characterized with X-ray diffraction （XRD）, ultraviolet visible transmittance spectroscopy （UV-Vis） and step devices. Optical properties, structual properties of Ti/WO3 thin films are also studied. It is presented that the crystallite phase and the mean grain size vary considerably with the various annealing temperature. Finally, the Ti/WO3 thin films with hexagonal structure are obtained. The result also shows that the O2 concentration significantly affects the microstructures and transmittance of the films. With the increasing of O5 concentration, the deposited velocity slows, the thickness of Ti/WO3thin films increasing, the mean size of particles increases and the interplaner spacing increases gradually. In addition, the transmittance curves move towards the shortwave, which indicates the optical band gap of Ti/WO3 increasing with the increasing of O2 concentration.