| 磁控技术成膜的工艺研究与微观表征分析 |
| |
| 引用本文： | 冯侨华,施云波,殷景华,郭建英. 磁控技术成膜的工艺研究与微观表征分析[J]. 科技信息, 2007, 0(2): 15-16 |
| |
| 作者姓名： | 冯侨华 施云波 殷景华 郭建英 |
| |
| 作者单位： | 哈尔滨理工大学应用科学学院 黑龙江哈尔滨150080(冯侨华，殷景华)，哈尔滨理工大学测试技术与通讯工程学院 黑龙江哈尔滨150080(施云波，郭建英) |
| |
| 基金项目： | 哈尔滨市科技攻关项目“环境自适应热膜风速传感器研究”(编号2002aa1CG040)，国防基础“微机械加工超薄膜型Pt膜温度传感器技术研究”(编号K1403061112) |
| |
| 摘 要： | 在氩气的气氛中采用直流磁控溅射方法,在玻璃基片上制备铂薄膜热敏电阻,并对铂薄膜的微观组织进行分析,同时研究了磁控溅射镀膜工艺参数对制备铂薄膜的影响,分析了参数中溅射功率、溅射时间与膜厚的关系。并利用Matlab软件建立了溅射时间、溅射功率与膜厚的三维关系模型图。
|
| 关 键 词： | 磁控溅射 薄膜 铂 微观表征 |
Study on the technics of depositing film by magnetron sputtering and the microstructure characteristics of the film |
| |
| Feng Qiaohua Shi Yunbo Yin Jinghua Guo Jianying. Study on the technics of depositing film by magnetron sputtering and the microstructure characteristics of the film[J]. Science, 2007, 0(2): 15-16 |
| |
| Authors: | Feng Qiaohua Shi Yunbo Yin Jinghua Guo Jianying |
| |
| Affiliation: | Feng Qiaohua1 Shi Yunbo2 Yin Jinghua1 Guo Jianying2 |
| |
| Abstract: | Using direct current magnetron sputtering technology,in argon setting,platinum thin film is deposited on substrate of glass.The microstructure of the platinum thin film is analyzed.The effect of the parameters of magnetron sputtering on fabrication of platinum thin film is studied.The relations between sputtering power,sputtering time and the thickness of platinum film are analyzed.The three dimension model of sputtering time,sputtering power and the thickness of film is set up by Matlab software. |
| |
| Keywords: | magnetron sputtering thin film platinum microstructure characteristic |
| 本文献已被 CNKI 维普 等数据库收录！ |
