交流脉冲制备TiO2薄膜的性能研究

利用150kHz交流脉冲放电进行等离子体化学气相沉积（PCVD），使用Ti（OC3H7）4为源物质，在普通钠钙载玻片上制备了TiO2膜．主要考查了交流脉冲电压、反应室工作气压、气体流量、薄膜沉积温度等工艺参数对薄膜光学特性的影响,通过薄膜透过率和吸光度分析，探讨了各工艺参数对成膜品质的影响．结果表明：在载玻片上．根据不同沉积条件可制成性能不同的TiO2薄膜，均有光催化特性且附着力好．

Research of the TiO2 Film Quality Prepared by AC Pulse Discharge

In this paper,the TiO_2 films are deposited on common natrium calcium glass slide through plasma enhanced CVD with Ti(OC_3H_7)_4 as the source material, using 150KHz AC pulse discharge.The pulse voltage,air pressure of reactive container,gas flux and operating temperature parameters will be studied on the film qualities.The correlative parameters of the film quality are analyzed through absorbency and permeability.The experiments show that different deposited conditions will result in different quality film on the glass slide,while the films also possess photocatalysis characteristic and well adhesion.