AlN／CrN纳米多层膜的制备及性能的研究

采用多弧离子镀技术制备A1N／CrN纳米多层膜，研究了多层膜调制周期对A1N生长结构的影响以及纳米多层膜的机械性能．结果表明：在小调制周期下A1N会以立方结构存在，并与CrN层形成同结构共格外延生长，使纳米多层膜产生较大的晶格畸变；A1N／CrN纳米多层膜硬度和弹性模量随着调制周期的减小呈现上升的趋势，当调制周期小于8nm时其增速明显增大，并在调制周期为3．8nm时达到最高硬度35．0GPa和最高弹性模量405GPaA1N／crN纳米多层膜的硬度和弹性模量在小调制周期时的升高与c-A1N的产生并和CrN形成的共格结构有关．

On synthesis and properties of nanoscale AlN/CrN multilayered coatings

The A1N/CrN multilayered coatings were prepared by using multi-arc ion plating, and the effects of modulation period on the microstructure of A1N and mechanical properties of the coatings were studied. The results showed that A1N had cubic structure at small modulation period and formed the same structure with CrN layers through coherent epitaxial growth, which made serious lattice distortion in the coatings. Accordingly, the hardness and elastic modulus of nanoscale A1N/CrN multilayered coatings increased with the decrease of modulation period, and their values increased more quickly as the modulation period was less than 8 nm. The maximum hardness and elastic modulus were 35 GPa and 405 GPa respectively at the modulation period of 3.8 nm. The increase of hardness and elastic modulus at small modulation period might be caused by the formation of c-A1N and the coherent structure with CrN.