在扫描电镜中用x射线荧光法(SEM-EDXRF)测硅衬底上铝膜厚度

在以前的工作中,我们实现了扫描电镜中的x射线荧光分析(SEM-EDXRF),得到了较理想的原级x射线束。现在,我们又利用SEM-EDXRF方法测量了硅片上的铝膜厚度,其原理是测量由衬底发出的x射线荧光强度。对硅片上有不同厚度铝膜样品测量结果表明,衬底的x射线荧光强度的对数与膜厚成线性关系,并与理论符合很好。本实验预示了在扫描电镜中利用EDXRF方法测微区膜厚的可能性。

The Determination of Thickness of Aluminium Film Deposited on a Silican Substrate by SEM-EDXRF Method in SEM

In an earlier paper , we presented that SEM-EDXRF can be realized and the idealer primary X- ray beam was achieved in a scanning electron microscope . Now , we have measure the thickness of a alulminiulm film deposited on a silican substrate . This can be achieved by measuring the attenuation of a substrate line intenmeasured the fluorescent intensityof sik line emitted from substrates shown that logarithms of the fluoresoont intensityemitted from substrates have linear relationship with thicknesses of film depostited on silican substrates . Good agreement between the theoretical and experimental values is observeved.Our experiment presages the possibility of measurement thickness of micro-area film using EDXRF method in SEM.