| 快速沉积的金刚石薄膜生长特性 |
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| 引用本文： | 白亦真,吕宪义,金曾孙,邹广田.快速沉积的金刚石薄膜生长特性[J].吉林大学学报(理学版),1991(3). |
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| 作者姓名： | 白亦真 吕宪义 金曾孙 邹广田 |
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| 作者单位： | 吉林大学原子与分子物理研究所 长春
(白亦真，吕宪义，金曾孙)，吉林大学原子与分子物理研究所 长春(邹广田) |
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| 摘 要： | 本文研究了用直流电弧等离子体喷射法快速沉积的金刚石薄膜的生长特性,并与用热解CVD法沉积的金刚石薄膜生长特性做了比较。
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| 关 键 词： | 快速沉积 金刚石薄膜 生长特性 |
The Growth Characteristics of High-rate Deposited Diamond Films |
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| Bai Yizhen,Lu Xianyi,Jin Zengsun and Zou Guangtian.The Growth Characteristics of High-rate Deposited Diamond Films[J].Journal of Jilin University: Sci Ed,1991(3). |
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| Authors: | Bai Yizhen Lu Xianyi Jin Zengsun and Zou Guangtian |
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| Abstract: | The growth characteristics of diamond films deposited by DC arc plasma jet method were studied and compared with that of diamond films deposited by thermal CVD method. |
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| Keywords: | high-rate deposition diamond films growth characteristic |
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