| 叔丁酚酚醛树脂化学增幅抗蚀剂 |
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| 引用本文： | 刘劲松 顾江楠. 叔丁酚酚醛树脂化学增幅抗蚀剂[J]. 北京师范大学学报(自然科学版), 1993, 29(1): 107-112 |
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| 作者姓名： | 刘劲松 顾江楠 |
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| 作者单位： | 北京师范大学化学系，北京师范大学化学系，北京师范大学化学系 100875 北京新外大街，100875 北京新外大街，100875 北京新外大街 |
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| 摘 要： | 以叔丁酚改性酚醛树脂与双叔丁氧碳酸酐为原料,合成了一种化学增幅感光性高分子,摸索出这类合成反应的最佳条件,进而配制出一系列化学增幅抗蚀剂组成物,并对其感光性能及光解动力学进行了研究。
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| 关 键 词： | 叔丁酚 酚醛树脂 化学增幅 抗蚀剂 |
CHEMICAL AMPLIFICATION RESIST DERIVED FROM TERT-BUTYL PHENOL NOVOLAC RESIN |
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| Liu Jinsong Gu Jiangnan Yu Shangxian. CHEMICAL AMPLIFICATION RESIST DERIVED FROM TERT-BUTYL PHENOL NOVOLAC RESIN[J]. Journal of Beijing Normal University(Natural Science), 1993, 29(1): 107-112 |
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| Authors: | Liu Jinsong Gu Jiangnan Yu Shangxian |
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| Abstract: | A kind of chemical amplification polymer is successfully synthesized by the reaction of tert-butylphenol novolac resin with di-tert- butyl dicarbonate and the optium conditions for this reaction are investigated. On this basis a series of chemical amplification resist components are pre- pared. Furthermore, their photosensitivity and photodecompo-sition kinetics are studied. |
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| Keywords: | chemical amplification resist tert-butyl phenol novolac resin di-tert-butyl dicarbonate photoinduced acid precursor |
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