磁控反应溅射与激光退火处理制备高浓度氮掺杂二氧化钛晶化薄膜材料

氮掺杂二氧化钛的光催化活性能够被可见光激活,从而大大提高其对太阳光能的利用效率。为了解决材料晶化与氮掺杂在晶化过程中损失这一矛盾,以制备出高浓度氮掺杂二氧化钛晶化薄膜材料,本文的研究发展出一种结合了磁控反应溅射与激光退火处理的新型非平衡态制备工艺。与传统的热处理工艺相比,激光退火处理能够获得具有更高氮掺杂浓度、更好晶化效果、更好可见光吸收效果的样品,在光催化分解有机污染物实验中展现出更优异的性能。激光退火处理晶化工艺可以在室温下进行,对于薄膜基体的影响范围非常浅,特别适用于晶化塑料/有机物基体上的薄膜涂层。通过在溅射薄膜中保持掺杂物浓度,激光退火处理能够获得传统工艺无法得到的材料性能。这种方法能进一步推广应用在其它材料体系中,制备出具有新性能的各种薄膜材料,以满足广泛的应用需要。

Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing

Nitrogen-doped TiO2(TiON)could be activated by visible light,which largely enhances its utilization of the sun light for photocatalytic applications.To resolve the opposing requirements on crystallization and minimization of dopant loss for creating heavily nitrogen-doped TiO2(TiON)thin film,a novel nonequilibrium approach was recently developed,which combines low temperature reactive sputtering and excimer laser annealing.Compared with the traditional thermal annealing,the excimer laser annealing created T...