一种新的低成本微电子机械系统微针加工方法

提出了一种新的空心微针阵列加工方法，利用三次同步辐射曝光和显影过程来加工微针．通过无掩膜曝光实现显影腐蚀的侧向扩展，从而获得微针的尖部形状；为克服因同步辐射光源的光束为近似椭圆高斯分布所造成的微针呈椭圆形及微针在各个方向上的强度不均匀问题，采用正交两次曝光方法来补偿同步辐射光源的光束分布不均匀性．这种方法工艺过程非常简单，并且无需任何特殊装置．文中所有实验是在日本立命馆大学的超导压缩存储环同步辐射光源AURORA的第13条线上完成的．实验结果表明，利用这种新方法可以非常方便地加工出高质量的空心微针，实现微针阵列的低成本、批量化制造．

A New Low-Cost Fabrication Method for Micro Electro Mechanical System Microneedles

A new fabrication method for hollow microneedle array is proposed with three times exposures in deep X-ray lithography of synchrotron radiation and the development procedure. The lateral and slant propagation of the dissolution front in development procedure is realized via the exposure without any mask, and the shape of needle tip can be obtained. The beam of the synchrotron radiation light source is an approximate elliptic Gaussian beam, which results in that the section of microneedle is elliptic and the strength of microneedle in all directions is not uni- form. A method of orthogonal double exposure is adopted to compensate the beam asymmetry of synchrotron radiation light source. The process of this fabrication method includes relatively few steps without special apparatuses. All experiments are carried out at the beam-line 13 of synchrotron radiation light source of the superconducting compact storage ring AURORA in Ritsumeikan University of Japan. The experimental results show that the high quality hollow microneedles can be fabricated simply by this method to meet the requirements of mass production of microneedle array with low cost.