| 氯原子吸附对氧化铟锡001表面功函数的调制 |
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| 引用本文： | 任玲.氯原子吸附对氧化铟锡001表面功函数的调制[J].文山师范高等专科学校学报,2011,24(6):39-43. |
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| 作者姓名： | 任玲 |
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| 作者单位： | 昆明学院教务处,云南昆明,650214 |
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| 摘 要： | 采用第一性原理计算研究了氯原子吸附对氧化铟锡半导体表面功函数的调制作用,结果表明经过氯原子吸附后的氧化铟锡表面功函数随着氯原子覆盖度的增大而线性地增大。氯原子吸附导致氧化铟锡表面形成电偶极层,这一电偶极层提升了其表面真空势能从而导致功函数的提高。
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| 关 键 词： | 氧化铟锡 氯原子吸附 第一性原理 功函数 |
The Modification to ITO 001 Surface Work Function Through Chlorine Adsorption |
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| REN Ling.The Modification to ITO 001 Surface Work Function Through Chlorine Adsorption[J].Journal of Wenshan Teachers College,2011,24(6):39-43. |
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| Authors: | REN Ling |
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| Institution: | REN Ling (Office of Academic Affairs, Kunming University, Kunming 650214, China) |
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| Abstract: | The adsorption of chlorine atoms on ITO surface and the work-function modification has been investigated by fn＇st-principle calculations. Work function of ITO increases with the surface coverage of CI in linear way. A dipole layer formed on the surface is formed and it is the surface dipole that increases the surface potential energy and hence the work function. |
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| Keywords: | ITO adsorption of chlorine atoms first-principle work function |
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