| 多孔薄膜介电常数的测试方法研究 |
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| 引用本文： | 吴兆丰,姚兰芳. 多孔薄膜介电常数的测试方法研究[J]. 盐城工学院学报(自然科学版), 2008, 21(2): 1-5 |
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| 作者姓名： | 吴兆丰 姚兰芳 |
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| 作者单位： | 1. 盐城工学院基础教学部,江苏,盐城,224003
2. 上海理工大学物理系,上海,20093 |
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| 摘 要： | 为了降低超大规模集成电路中的信号传输延迟和串扰，多孔低k薄膜材料日益受到人们广泛关注。介绍了测试多孔低k薄膜材料介电常数的几种常用方法及其原理和优缺点，并详细分析了不同的测试方法对测试结果产生的影响。
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| 关 键 词： | 多孔薄膜 介电常数 测试方法 |
Study on the Measurement Methods for Dielectric Properties of Porous Films |
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| WU Zhao-feng,YAO Lan-fang. Study on the Measurement Methods for Dielectric Properties of Porous Films[J]. Journal of Yancheng Institute of Technology(Natural Science Edition), 2008, 21(2): 1-5 |
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| Authors: | WU Zhao-feng YAO Lan-fang |
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| Affiliation: | WU Zhao-feng , YAO Lan-fang (1. Department of Fundament Courses Yancheng Institute of Technology,Jiangsu Yancheng 224003,China; 2. Department of Puysics University of Shanghai for Science and Technology,Shanghai 200093,China) |
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| Abstract: | In the resent years, porous films with ultra -low -k are believed to be necessary to reduce the RC time delay and erosstalk in the VLSI. In this paper, we introdueed several measurement methods for dieleetrie properties of porous films, In addition, the testing results of the dieleetrie properties whieh measured by these methods were eontrasted and diseussed. |
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| Keywords: | porous films dielectric constant measurement methods |
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