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Imprint Lithography at Room Temperature with Novolak Resin and Its Application
Authors:T.Numai
Affiliation:Deparment of Electrical and Electronic Engineering Ritsumeikan University Kusatsu 525-8577 Japan
Abstract:1 Results Imprint lithography[1] has attracted considerable attention from the viewpoint of low cost fabrication,because light exposure systems are not required. Up to now,polymethylmethacrylate (PMMA) films and hard molds were often used in imprint lithography.In this paper,we report on the successful demonstration of imprint lithography using novolak resin (OFPR-800),which is more suitable than PMMA for dry etching,and a soft mold such as a soft polyester sheet,which has a two-dimensional (2D) square ...
Keywords:imprint lithography   room temperature   novolak resin   graphoepitaxy  
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