| The research and progress of micro-fabrication technologies of two-dimensional photonic crystal |
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| 作者姓名： | XU XingSheng ZHANG DaoZhong |
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| 作者单位： | [1]State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China [2]Key Laboratory of Optical Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100083, China |
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| 基金项目： | Supported by the National Natural Science Foundation of China （Grant Nos. 60345008, 60377011 and 60537010） and the China ＂863＂ Program （Grant No. 2005AA311030） |
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| 摘 要： | The novel material of photonic crystal makes it possible to control a photon, and the photonic integration will have breakthrough progress due to the application of photonic crystal. It is based on the photonic crystal device that the photonic crystal integration could be realized. Therefore, we should first investigate photonic crystal devices based on the active and the passive semiconductor materials, which may have great potential application in photonic integration. The most practical and important method to fabricate two-dimensional photonic crystal is the micro-manufacture method. In this paper, we summarize and evaluate the fabrication methods of two-dimensional photonic crystal in near-infrared region, including electron beam lithography, selection of mask, dry etching, and some works of ours. This will be beneficial to the study of the photonic crystal in China.
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| 关 键 词： | 二维光子晶体 微细加工方法 研究进展 掩模 电子束平版印刷术 干性蚀刻 |
| 收稿时间： | 18 May 2006 |
| 修稿时间： | 2006-05-182006-08-27 |
The research and progress of micro-fabrication technologies of two-dimensional photonic crystal |
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| XU XingSheng ZHANG DaoZhong.The research and progress of micro-fabrication technologies of two-dimensional photonic crystal[J].Chinese Science Bulletin,2007,52(7):865-876. |
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| Authors: | Xu XingSheng Zhang DaoZhong |
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| Institution: | (1) State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China;(2) Key Laboratory of Optical Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100083, China |
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| Abstract: | The novel material of photonic crystal makes it possible to control a photon, and the photonic integration will have breakthrough progress due to the application of photonic crystal. It is based on the photonic crystal device that the photonic crystal integration could be realized. Therefore, we should first investigate photonic crystal devices based on the active and the passive semiconductor materials, which may have great potential application in photonic integration. The most practical and important method to fabricate two-dimensional photonic crystal is the micro-manufacture method. In this paper, we summarize and evaluate the fabrication methods of two-dimensional photonic crystal in near-infrared region, including electron beam lithography, selection of mask, dry etching, and some works of ours. This will be beneficial to the study of the photonic crystal in China. |
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| Keywords: | photonic crystal fabrication method mask electron beam lithography dry etching semiconductor material |
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