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一种基于第一性原理的4H-SiC结构缺陷计算模型
引用本文:高春燕,李德昌,张玉明,汤晓燕,苗瑞霞. 一种基于第一性原理的4H-SiC结构缺陷计算模型[J]. 科技信息, 2009, 0(29): 50-51
作者姓名:高春燕  李德昌  张玉明  汤晓燕  苗瑞霞
作者单位:[1]西安电子科技大学微电子学院宽禁带半导体材料与器件重点实验室,陕西西安710071 [2]陕西青年职业学院数字信息技术系,陕西西安710068 [3]西安电子科技大学理学院,陕西西安710071
摘    要:本文运用基于密度泛函理论(DFT)的第一性原理计算方法,根据原子尺度上的缺陷特性研究了4H—SiC的位错结构模型,并对4H—SiC基面位错的结构进行分析。建立了一种模型。文章简要介绍了4H-SiC材料中结构缺陷的分子动力学模拟方法,势能模型及主要技术细节。

关 键 词:4H-SiC  缺陷模型  第一性原理计算

Model of Simulatations of Structure Defects in 4H-SiC With First-priniciples Calculation
Affiliation:GAO Chun-yan LI De-chang (1.School of Microelectronics, Xidian University,Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xi 'an Shanxi, 710071, China;2.Department of Digital Information and Techniques, shannxi Youth Vocational College, Xi'an Shanxi, 710068, China; 3.Department of Science, Xidian Univ., Xi 'an Shanxi ,710071,China)
Abstract:In this paper, Based on the first-priniciples calculation (DF-f), I have proposed a new defects model that can use to analysis state density, band gap structure and transform of BPDS in the 4H-SiC bomoepitaxial layers, Which lead to improve capability of SiC p-i-n diodes . Also, Article briefly describes the structure defects in 4H-SiC with molecular dynamics simulation method, potential energy model and mostly technique details.
Keywords:4H-SiC  Defects simulation  First-priniciples calculation
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