| 适用于获得砷硼浅结的快速热退火解析模型 |
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| 引用本文： | 汤庭鳌,C.A.PazdeAraujo.适用于获得砷硼浅结的快速热退火解析模型[J].复旦学报(自然科学版),1987(3). |
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| 作者姓名： | 汤庭鳌 C.A.PazdeAraujo |
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| 作者单位： | 复旦大学电子工程系
E.E.(汤庭鳌)，Dept.of UCCS(C.A.PazdeAraujo) |
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| 摘 要： | 利用Boltzmann-Matno变换方法,求解与浓度有关的扩散方程,得到了砷硼快速热退火再分布的解析模型.实验证明本解析结果较好地符合快速热退火再分布的实际规律.
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| 关 键 词： | 浅结 快速热退火 解析模型 扩散方程 增强扩散 离子注入 杂质再分布 |
AN ANALYTICAL MODEL OF RAPID THERMAL ANNEALING FOR OBTAINING BORON AND ARSENIC SHALLOW JUNCTION |
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| Tang Ting-ao.AN ANALYTICAL MODEL OF RAPID THERMAL ANNEALING FOR OBTAINING BORON AND ARSENIC SHALLOW JUNCTION[J].Journal of Fudan University(Natural Science),1987(3). |
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| Authors: | Tang Ting-ao |
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| Abstract: | With the use of Boltzmann-Matano Transformation method, the concentration dependent diffusion equation is solved. An analytical model of redistribution for Boron and Arsenic during Rapid Thermal Annealing (RTA) is obtained. Experiments show that this analytical result is in good agreement with real redistribution of RTA. |
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| Keywords: | shallow junction rapid thermal annealing analytical model diffusion equation enhancement diffusion ion implantation impurity redistribution |
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