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用增强质子背散射研究注氦纳米晶钛膜中氦的含量
引用本文:段艳敏,刘慢天,龙兴贵,吴兴春,罗顺忠,刘东剑,吴英,郑思孝,刘宁,安竹. 用增强质子背散射研究注氦纳米晶钛膜中氦的含量[J]. 四川大学学报(自然科学版), 2005, 42(1): 112-116
作者姓名:段艳敏  刘慢天  龙兴贵  吴兴春  罗顺忠  刘东剑  吴英  郑思孝  刘宁  安竹
作者单位:四川大学原子核科学技术研究所·辐射物理及技术教育部重点实验室,成都,610064;中国工程物理研究院核物理与化学研究所,四川,绵阳,621900
基金项目:中国工程物理研究院科学技术重大项目基金(2003Z0501) 通讯作者
摘    要:作者使用增强质子背散射方法,分析了几种Mo基体纳米钛膜中氦的保持量情况.结果表明:采用离子注入法注入的氯在纳米钛膜中能保存较长的时间,氦的释放速率受氯在钛膜及基体中的分布、钛膜中氦浓度大小的影响;Ar,He混合气体放电法工作参数的选择可影响渗氦的效率。

关 键 词:增强质子背散射  氦离子注入  纳米晶钛膜  保持剂量  释放速率
文章编号:0490-6756(2005)01-0112-05

Study of the Preservation of Helium Implanted in Nanocrystal Titanium Film by Enhanced Proton Backscattering Spectrometry
DUAN Yan-min,LIU Man-tian,LONG Xing-gui,WU Xing-chun,LUO Shun-zhong,LIU Dong-jian,WU Ying,ZHENG Si-xiao,LIU Ning,AN Zhu. Study of the Preservation of Helium Implanted in Nanocrystal Titanium Film by Enhanced Proton Backscattering Spectrometry[J]. Journal of Sichuan University (Natural Science Edition), 2005, 42(1): 112-116
Authors:DUAN Yan-min  LIU Man-tian  LONG Xing-gui  WU Xing-chun  LUO Shun-zhong  LIU Dong-jian  WU Ying  ZHENG Si-xiao  LIU Ning  AN Zhu
Abstract:The preservation dose of helium implanted in several nanocrystal titanium films deposited on Mo substrates is analyzed by enhanced proton backscattering spctrometry. The result demonstrates that the implanted helium can be preserved for a long time in nanocrystal titanium films and its release speed is affected by the ion implantation energy, the thickness of nanocrystal titanium films and the helium concentration in nanocrystal titanium films. The choice of parameters in Ar-He gas discharge method for helium implantation is very important, which has a crucial role on the helium implantation into nanocrystal titanium films.
Keywords:enhanced proton backscattering spectrometry  helium ion implantation  nanocrystal titanium film  preservation dose  release speed
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