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等离子喷射CVD金刚石膜制备过程中的断弧保护
引用本文:高亮. 等离子喷射CVD金刚石膜制备过程中的断弧保护[J]. 河北省科学院学报, 2008, 25(1): 42-45
作者姓名:高亮
作者单位:河北省激光研究所,河北,石家庄,050081
摘    要:通过对等离子体喷射CVD金刚石设备的控制电路的改进,增加了沉积过程中在断弧情况下对已经沉积的膜的保护.该部分是在不影响开机点火的前提下,从主电流(电弧电流)取信号来控制冷却系统,使已生成的金刚石膜缓慢地冷却到室温,减小金刚石膜与衬底因温度瞬间下降而造成的相互作用力,金刚石内应力的释放相对减少.宏观裂纹明显减少,提高膜的完整性和产品的利用率和出材率.

关 键 词:控制电路  应力  继电器  效率
文章编号:1001-9383(2008)01-0042-04
修稿时间:2007-12-18

Protection during the arc breaking off of CVD diamond jet
GAO Liang. Protection during the arc breaking off of CVD diamond jet[J]. Journal of The Hebei Academy of Sciences, 2008, 25(1): 42-45
Authors:GAO Liang
Affiliation:Hebei Institute of Laser;Shijiazhuang Hebei050081;China
Abstract:The protection for the deposited film during the breaking off of the arc as deposition can be achieved through ameliorating the control circuit of CVD diamond film device.A signal got from the main current(the current of arc) without infections for initial working are used to control the circulating water system and the function that when the arc breaks down the current and water will be cut off can be carried out.After that the temperature of film can decrease down slowly to that of air and it can be done ...
Keywords:Control circuit  Stress  Relay  Efficiency  
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