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对球形尖端导体表面附近静电场的研究
引用本文:兰明建 李旭. 对球形尖端导体表面附近静电场的研究[J]. 重庆工商大学学报(自然科学版), 2004, 21(3): 305-308
作者姓名:兰明建 李旭
作者单位:1. 重庆工商大学,理学院,重庆,400067
2. 重庆师范大学,物理学与信息技术系,重庆,400047
摘    要:尖端导体表面附近的静电场分析,是研究静电平衡时导体表面电荷分布与其表面曲率关系的重要手段。求解球形尖端导体表面附近的静电场,发现这种导体表面附近的电场、导体上的电荷分布规律与理想尖端或锥形尖端相比较,电场强度和电荷密度均小得多,它们的分布随相关参数的变化而更快。

关 键 词:球形尖端导体 静电场 电荷分布 曲率 电场强度
文章编号:1672-058X(2004)03-0305-04

Research on electrostatic field near sharp -point conductor surface
LAN Ming-jian,Li Xu. Research on electrostatic field near sharp -point conductor surface[J]. Journal of Chongqing Technology and Business University:Natural Science Edition, 2004, 21(3): 305-308
Authors:LAN Ming-jian  Li Xu
Affiliation:LAN Ming-jian~1,Li Xu ~2
Abstract:When the static charges are in balance,it is an important method by studying the electrostatic field near the sharp-point to analyze the relation between the distribution of electric charges which are on its surface and its surface curvature.This paper solved the electrostatic field near the sharp-point which had a certain figure,finds that both electrostatic field intensity and the electric charges density decreased much more those near an ideal sharp-point or taper sharp-point;furthermore they change more rapidly with the change in corresponding parameters.
Keywords:sharp-point conductor  electrostatic field  distribution of electric charge  curvature.
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