| 注入电压对Ti6A14V合金离子注氧层结构的影响 |
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| 引用本文： | 马欣新,李金龙,孙明仁.注入电压对Ti6A14V合金离子注氧层结构的影响[J].中国科技论文在线,2008(4):246-249. |
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| 作者姓名： | 马欣新 李金龙 孙明仁 |
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| 作者单位： | 哈尔滨工业大学材料科学与工程学院,哈尔滨150001 |
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| 基金项目： | 高等学校博士学科点专项科研基金（20040213048） |
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| 摘 要： | 采用等离子体基氧离子注入技术对Ti6A14V合金进行表面处理。注入电压选取-30和-50kV。注入层的结构用X射线光电子能谱、小掠射角X射线衍射、Raman光谱进行表征。注入样品在注氧层中均形成了以TiO_2为主的键结构,-30kV低电压注入样品的注氧层中TiO_2为非晶态,经过500℃真空退火后,TiO_2结晶形成金红石。而-50kV高注入电压则可在注氧层中直接形成粒径为nm的金红石。
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| 关 键 词： | 材料学 结构 等离子体基氧离子注入 Ti6A14V合金 |
Influence of implanted voltage on structure of oxygen-implanted layer on Ti6AI4V alloy |
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| MA Xinxin,LI Jinlong,SUN Mingren.Influence of implanted voltage on structure of oxygen-implanted layer on Ti6AI4V alloy[J].Sciencepaper Online,2008(4):246-249. |
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| Authors: | MA Xinxin LI Jinlong SUN Mingren |
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| Institution: | (School of Materials Science and Engineering,Harbin Institute of Technology,Harbin 150001) |
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| Abstract: | Ti6A14V was treated by oxygen plasma based ion implantation of-30 and-50 kV.The structure of the oxygen-implanted layer was characterized by X-ray photoelectron spectroscopy （XPS）,glancing angle X-ray diffraction （GXRD） and Raman spectra.TiO_2 is predominant in the implanted layer of all implanted sample.For the samples implanted at-30 kV,TiO_2 exists as amorphous,and annealing at 500~C in vacuum makes it crystal to form ruffle.However,the implantation at-50 kV can directly produce rutile. |
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| Keywords: | materials science structure oxygen plasma based ion implantation Ti6A14V alloy |
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