Ultrathin permalloy films |
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Authors: | Yu Guanghua Zhao Hongchen Zhu Fengwu |
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Institution: | (1) Department of Materials Physics, University of Science and Technology, 100083 Beijing, China |
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Abstract: | In view of the principle of glow-discharge, ultrathin Ni81Fe19(12 nm) films were prepared at an ultrahigh base vacuum. The anisotropic magnetoresistance coefficient (ΔR/R %) for Ni81Fe19(12 nm) film reaches 1.2%, while the value of its coercivity is 127 A/m (i.e. 1.6 Oe). Ultrathin Ni81Fe19(12 nm) films were also prepared at a lower base vacuum. The comparison of the structure for two kinds of films shows that
the films prepared at an ultrahigh base vacuum have a smoother surface, a denser structure with a few defects; the films prepared
at a lower base vacuum have a rougher surface, a porouser structure with some defects. |
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Keywords: | NiFe film anisotropic magnetoresistance coercivity structure |
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