| 仿金氮化钛薄膜的磁控反应溅射法研究 |
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| 引用本文： | 陈弟虎,林理彬.仿金氮化钛薄膜的磁控反应溅射法研究[J].中山大学学报(自然科学版),1992,31(2):122-125. |
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| 作者姓名： | 陈弟虎 林理彬 |
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| 作者单位： | 中山大学物理学系，四川大学物理学系，四川大学物理学系 |
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| 摘 要： | 本文利用磁控反应溅射法研究制备氮化钛薄膜,结果表明,氮气分气压P_(N_2)直接影响膜中的氮、钛原子比,适当的衬底负偏电压可以消除膜中氧原子的存在。薄膜变与膜中原子组份、微观结构有关。
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| 关 键 词： | 氮化钛 钛 薄膜 |
Gold Color of Titanium Nitrade Prepared by Reactive Magnetron Sputting |
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| Chen Dihu,Lin Libing,Xie Jianhua.Gold Color of Titanium Nitrade Prepared by Reactive Magnetron Sputting[J].Acta Scientiarum Naturalium Universitatis Sunyatseni,1992,31(2):122-125. |
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| Authors: | Chen Dihu Lin Libing Xie Jianhua |
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| Institution: | Chen Dihu;Lin Libing;Xie Jianhua
Department of Physics |
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| Abstract: | The titanim nitrade films deposited by reactive DC magnetron sputting have been investigated. The deposition parameters such as the partial nitrade pressure P_N_2, the substrate bias voltage Vb and the substrate temperature Tb are discussed and their effects on the film atomic composition and physical properties are presented. The results showed that the nitrogen-to-titanium ratio is directly related to P_N_2. Impurity oxygen in the films can be elimiated for |Vb|>100V and the substrate temperature affects the microstructure of the films. It pointed out that the changes of the properties are related to changes of the atomic composition and microstructure of the films |
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| Keywords: | T N Ti films |
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