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高温超导薄膜射频溅射靶的简便制作
引用本文:陈宝琼,张世宏,等.高温超导薄膜射频溅射靶的简便制作[J].中山大学学报(自然科学版),1992,31(4):128-129.
作者姓名:陈宝琼  张世宏
作者单位:中山大学物理学系,中山大学物理学系,中山大学物理学系,中山大学物理学系
摘    要:本文报导了一个极其简便的高温超导薄膜溅射靶的制作方法。并制得可控制名义组分的Bi-Sr-Ca-Cu-O的超导薄膜,其T_(CM)温度为84K,零电阻温度为60.3K。

关 键 词:高温超导薄膜  射频溅射

Preparation of Radio-Frequency Sputtering Target for High Tc Superconductive Film of Bi-Sr-Ca-Cu-O
Chen Baoqiong,Zhang Shihong,Tang Guiying,Peng Shaoqi.Preparation of Radio-Frequency Sputtering Target for High Tc Superconductive Film of Bi-Sr-Ca-Cu-O[J].Acta Scientiarum Naturalium Universitatis Sunyatseni,1992,31(4):128-129.
Authors:Chen Baoqiong  Zhang Shihong  Tang Guiying  Peng Shaoqi
Institution:Chen Baoqiong;Zhang Shihong;Tang Guiying;Peng Shaoqi Department of Physics
Abstract:An extremely simple and convenient method of preparing radio-frequencysputtering target for high Tc superconductive film in the Bi-Sr-Ca-Cu-O withcontrolled component ratio is reported. The film transition temperature ismeasured to be around 84K and non-resistance temperature is at about 60. 3K.
Keywords:high Tc superconductive film  radio-frequency sputtering
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