| 聚酯型光致抗蚀剂的合成及其性能研究 |
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| 引用本文： | 黄建兴
,余显辉
,吕广镛
,叶和珏
,林忠捷
,华光
,梁致诚
,曾昭琼.聚酯型光致抗蚀剂的合成及其性能研究[J].华南师范大学学报(自然科学版),1986,0(1):1. |
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| 作者姓名： | 黄建兴 余显辉 吕广镛 叶和珏 林忠捷 华光 梁致诚 曾昭琼 |
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| 作者单位： | Huang Jinxing，Yu xianhui，Lu Guanyong，Ye Huojue，Lin Zhongjie，Hua Guang，Liang Zhicheng，Ceng Zhaoqiong |
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| 摘 要： | 本文研究了六种新的聚酯型负性光致抗蚀剂的合成,分别测定了它们的UV、IR、DTA和光刻性能.试验结果表明,六种新胶的光刻性能均全面超过现有商品聚酯胶.在集成电路、微波器件、超高频器件和普通印制线路上使用,均获得满意的结果.
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| 关 键 词： | 光致抗蚀剂(光刻胶) 感光性高分子(感光性树脂 光敏树脂) 聚酯 共缩聚 光刻性能 光刻 |
A STUDY OF THE SYNTHESIS OF POLYESTER TYPE PHOTORESISTS AND THEIR PROPERTIES |
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| Huang Jinxing,Yu xianhui,Lu Guanyong,Ye Huojue,Lin Zhongjie,Hua Guang,Liang Zhicheng,Ceng Zhaoqiong.A STUDY OF THE SYNTHESIS OF POLYESTER TYPE PHOTORESISTS AND THEIR PROPERTIES[J].Journal of South China Normal University(Natural Science Edition),1986,0(1):1. |
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| Authors: | Huang Jinxing Yu xianhui Lu Guanyong Ye Huojue Lin Zhongjie Hua Guang Liang Zhicheng Ceng Zhaoqiong |
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| Abstract: | A study of the synthesis of six new polyester type negative photoresists, together with their UV, IR, DIA and photoetching properties is made by the authors. Their cxpcrements proves that those new photoresist solution are more suitable and satisfactory for use in the ultraviolet light exposure for pho-toctching in integrated circuits, microwave transistors and common printed circuits than the commodity polymeric glue manufactured nowadays. |
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| Keywords: | photoresist photosenitive polymer lightsensitive polymer photopolymer polyester copolycondensation pho-toetching properties lithography |
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