A new DFM flow for sub-100nm standard cells

DFM （Design-For-Manufacturability） method, which aims to improve manufacturability of ICs through specific design considerations, is becoming important nowadays. In particular, standard cells now should be designed by DFM method. This paper reports a new DFM flow for sub-100 nm standard cell design with a group of technologies for process modeling, manufacturability simulation and trial RETs. Based on this flow, a set of DFM-friendly 90nm standard cells were designed.