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Gnedin NY 《Nature》2005,435(7042):572-573
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对墨西哥湾北部水深约540m的上陆坡GC185区(GC-F样品)和水深约2200m的下陆坡AC645区(AC-E样品)冷泉碳酸盐岩中的脂肪酸及其单体化合物的δ13C进行了分析.在AC-E和GC-F冷泉碳酸盐岩样品中检测到了30多种脂肪酸化合物,均以主峰碳为C16的低碳数(C20)脂肪酸为主,具偶碳优势,主要包括正构脂肪酸、异构(i-)/反异构(ai-)脂肪酸以及带支链的(iso/anteiso)奇碳数脂肪酸.其中n-C12:0,n-C13:0,i-C14:0和n-C14:0具有明显偏低的δ13C值(-39.99‰~-32.36‰),可能来源于冷泉生物.n-C18:2和C18:1△9具有相同的碳同位素值,可能来源于冷泉渗漏区贝氏硫细菌属/辫硫菌属.支链奇碳数脂肪酸(iso/anteiso-C13~C17)具有特别负的δ13C值(-63.95‰~-44.17‰),明显不同于其他类别脂肪酸的碳同位素值,推断这类化合物是海底渗漏区甲烷厌氧氧化过程中的硫酸盐还原细菌生命活动的产物.  相似文献   
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In this study we have used a combinatorial approach for producing binary and ternary alloy thin film libraries using a lab-scale RF co-sputtering system.Initially we used two elemental sputtering targets,i.e.aluminum(Al) target and neodymium(Nd) target,to produce a film library of varying composition and successfully identified a suitable composition range(1.95-2.38 at%Nd) in which resistance to hillock formation and resistivity of the film spots were found to be satisfactory in annealed state(350°C,30 min) .In another case,in order to form ternary alloy composition library we have used two sputtering targets,i.e.an Al-0.5 at%Nd alloy target and an elemental Ni target.Though,co-sputtered Al-0.6 at% Nd-0.9 at%Ni alloy films showed satisfactory resistance to hillock formation and low resistivity after annealing,film deposited from a ternary alloy target with the same composition failed to show satisfactory resistance to hillock formation during annealing.In case of Al-0.6 at%Nd-0.9 at%Ni alloy target,250 nm thick film showed poor resistance to hillock formation than the 500 nm thick film.This clearly showed thickness-dependent hillock performance of Al-0.6 at%Nd-0.9 at%Ni alloy.In this study it was found that,in addition to the process variables,metallurgical microstructure of the alloy sputtering targets had significant effect on the film properties which was not obvious from the results of films deposited using co-sputtering of the individual elemental targets.  相似文献   
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