基体偏压对CrTiAlN镀层摩擦磨损性能的影响

应用闭合场非平衡磁控溅射离子镀技术在高速钢和单晶硅基体上制备了一组随基体偏压变化的CrTiAlN梯度镀层,并测试了其摩擦学性能。结果表明,随偏压的增大,镀层的厚度、硬度、膜基结合强度和耐磨性能表现出先升后降、摩擦系数较低、具有良好的韧性;在-75 V左右偏压下沉积的镀层具有最佳的综合性能。通过XRD、SEM的分析表明,由CrN、TiN、AlN、Cr和Ti2N等微晶组成的复合镀层,晶粒细小,属于纳米级颗粒,从而使镀层具有良好的摩擦学性能。     

ZnO薄膜的粉靶溅射沉积

氧化锌是一种重要的压电与光电材料,用粉靶代替常规的固体陶瓷靶溅射沉积ZnO薄膜,对基底的加热温度、溅射气压和氧气的混合比率等沉积条件对氧化锌薄膜特性的影响进行了研究,主要对沉积在玻璃基片上的ZnO薄膜进行了X-射线衍射(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)以及台阶仪的测量和分析比较,用粉靶溅射的ZnO薄膜具有很好的C轴长相和很窄的衍射峰半宽(0.2°～0.27°)。因为ZnO膜在C轴方向有很强的压电性,从而也说明了用粉靶溅射的ZnO薄膜具有很好的压电特性。分析和测量结果显示用粉靶溅射ZnO薄膜的最佳条件是:(1)基片加热温度为300～400℃。(2)氧气的混合含量为0.5～0.8.(3)溅射气压为1～2 Pa。得出了利用粉靶溅射制备的ZnO薄膜与用陶瓷靶制备同样具有很好的性能。     

Nano Cr Interlayered CrN Coatings on Steels

CrN coated steels assisted with a nano Cr interlayer were investigated. The Cr nano-interlayers were prepared by sputter deposition with a thickness about 70-100 nm. CrN coatings were also prepared by sputter deposition on the Cr nano-interlayers. The crystal structures, microhardness, and scratch resistance of CrN/Cr coatings were determined. Results show that the Cr nano-interlayers improve scratch resistance and the microhardness of CrN coated steels. A rapid heat treatment with infrared （IR） was performed for coated specimens in the attempt to improve bonding, With IR heat treatments, the beneficial effect of the Cr nano-interlayers was clearly observed. Without the Cr nano-interlayers, severe cracks on the surface of coatings were observed after IR heat treatment. However, with a Cr interlayer, no cracks on the surface of CrN coatings were observed after the heat treatment. The scratch resistance of coatings was also affected by the Cr nano-interlayers. The scratch track was clean and showed significantly smaller amount of scratch debris for CrN coatings with Cr interlayers than those without the Cr nano-interlayers. The microhardness of coatings with the Cr nano-interlayers is higher than those without the Cr nano-interlayers after IR heat treatment. The Cr and CrN phase have been identified with X-ray diffraction analysis, and the results show that the higher the nitrogen content in the sputtering gas, the stronger the CrN peaks observed in the diffraction patterns are.     

镍钴锌铁氧体/二氧化硅复合靶材的制备

溅射靶材的利用率低,导致其成本高．以自制的纳米晶镍钴锌／二氧化硅复合铁氧体粉体为原料,冷等静压后高温烧结制备成磁控溅射复合靶材．用XRD和SEM分析靶材的物相成分和微观形貌．结果表明：靶材为尖晶石型铁氧体和二氧化硅的复合材料,表面平整,残留着微米级的气孔,靶材收缩率达14％,可承受300W左右的溅射功率．整个制备过程工艺简单,设备操作方便可行,靶材成本低。     

磁控溅射涂层的耐蚀性

通过采用磁控溅射工艺,将两种铁基和镍基材质的靶材溅射到基材(1Cr18Ni9Ti)上,形成4种薄膜。对靶材、基材和薄膜等分别在不同浓度硫酸中的耐腐蚀性进行了测量,并对薄膜在0.05mol/L硫酸中的耐点蚀性进行了研究。通过对Tafel曲线、循环极化曲线及显微组织的分析,结果表明:溅射后薄膜组织为微晶,薄膜的耐蚀性普遍比溅射材前靶的耐蚀性要好;薄膜耐点蚀性很好。     

S-枪溅射NiCr薄膜的Monte Carlo模拟

对Ｓ－枪溅射ＮｉＣｒ合金薄膜过程采用ＭｏｎｔｅＣａｒｌｏ法进行了计算模拟．用靶刻蚀图形作为粒子发射频度函数,采用Ｔｈｏｍｐｓｏｎ能量分布,并考虑了环境气体的热运动,得到沉积粒子的能量、入射角度的分布随溅射工艺参数的变化规律．     

溅射薄膜的B．A．Movchan－A．V．Demchishin微观结构的模拟

文章从物理统计规律观点出发．研究了微观溅射粒子的动力学淀积过程。着重考虑到真空度、基片温度、溅射角度等因素对淀积的影响．模拟研究了Ｂ．Ａ．Ｍｏｖｃｈａｎ－ＡＶ．Ｄｅｍｃｈｉｓｈｉｎ的溅射微观结构关系图。