Smog chamber studies of ozone formation potentials for isopentane

The incremental reactivity and ozone formation potential of isopentane have been studied with chamber experiments and computer simulations. The chemical mechanism used in the computer simulations is an isopentane sub-mechanism from the Master Chemical Mechanism （MCM）. The results from the chamber experiments suggest that the MCM can well simulate i-C5H12-NOx chamber experiments. The heterogeneous reaction of NO2 and water is an important source for OH radicals in the chamber experiments. The photolysis of HONO is responsible for the initiation of isopentane in photochemical reactions. The reaction rate constant for NO2 → HONO was determined to be 3.9×10-4―5.9×10-3 min-1 by conducting 3 sets of CO-NOx-air irradiations. 5 sets of isopentane-NOx irradiations under different conditions were performed in our chamber. Compared with the experiment with a low relative humidity （RH）, an increase in RH can increase the reaction rate of NO2 with H2O, so that the peak ozone occurs earlier. When isopentane is predominant over NOx, the peak ozone concentration is largely dependent on NOx concentrations.     

臭氧的理论最高压力

推导了光化反应的标准平衡常数Kpo与光子的波长λ之间的关系为ΔGmo+RTlnKpo=0.1λ1196-0.1196λ2,并利用公式计算了臭氧层和地表臭氧的理论最高压力.计算得到的臭氧层和地表的最高压力分别为1.04×10-2Pa和0.32×10-2Pa,与其各自的实际最高压力0.75×10-2Pa和0.7×10-2Pa非常接近.     

大中型城市交通废气与光化学污染的数值模拟

运用一个三维边界层光化学模式模拟了南京市主要由交通排放引起的多种光化学污染物的时空分布及相互联系。模拟表明：南京市冬季虽然没有形成光化学烟雾,但污染物浓度相当可观;夏季,不少地方臭氧浓度出现较高值,超过国家二级标准,并且其它光化学污染物的浓度亦较高,表明南京市已具有形成光化学烟雾的潜在趋势。     

Resistless photochemical etching of a silicon wafer by UV laser with an H<Superscript>2</Superscript>O<Superscript>2</Superscript> and HF aqueous solution

A new resistless etching method has been developed for Silicon wafers. This new method uses an aqueous solution consisting of hydrogen peroxide (H₂O₂) and hydrogen fluoride (HF) as the activating etchants. A 193 nm ArF excimer laser and a 266 nm fourth harmonic generation Nd: YAG laser were used as the photon sources. Results showed that pattern etching has been achieved without any photoresist film. In the case of the 193 nm laser, the optimal etching appeared at a 1.3 H₂O₂÷HF ratio, where an etch depth of 210 nm was achieved with a fluence of 29 mJ/cm² and shot number of 10000. At the same conditions, the etch depth with H₂O₂ and HF solution was three times of that by using H₂O and HF mixture. In the case of the 266 nm Nd: YAG laser, the optimal etching appeared at twice ratio of H₂O₂/HF, where the etch depth of 420 nm was achieved with a fluence of 12 mJ/cm² and shot number of 30000. Results showed that the etch effect of the 266 nm Nd: YAG laser was more desirable than that of the 193 nm ArF excimer laser.     

光动力学法测定水及食品中的水溶性硫化物

测定水及食品中硫化物的常用方法是碘量法或斑点法,但当硫离子含量低时碘量法的精密度和准确度较差,而斑点法则仅是半定量法.硫化物是一种还原剂,可被碘氧化。文献[3～5]曾报导了在酸性介质中用紫外光照射碘化钾溶液产生碘来测定一些实际样品中的氧化还原性物质。本文采用光动力学法对水及食品中的硫化物进行了测定。用汞灯照射碘化钾溶     

波长对NO光解反应的影响

利用公式ΔGo+RTlnKop=0.1196n/λ计算了不同波长条件下NO光解反应的标准平衡常数.当波长为183 nm和230 nm时,反应NO+hv→N.+O.的标准平衡常数分别为3.64×109和1.45×10-14;当波长为230 nm时,反应2NO+hv→N2+O2的标准平衡常数为e279.72.解释了为什么NO吸收λ<183 nm的光子后解离为游离态的氮原子和氧原子,而吸收λ<230 nm的光子后形成激发态分子NO*,进而与NO反应形成N2和O2.     

4种杂交杨荧光光响应曲线

比较研究伊犁地区杂交杨4个不同品系(P.deltaids cv-64(P64)、P.balsamifera L.(Da)、P.euramericana(I-262)和P.euramerieanacv(I-467))的荧光参数与光量子通量密度(DPF)的响应变化特征.4种杂交杨的光照下最大可变荧光(F′m)大小直接影响光合反应中心最大的开放程度和实际的开放程度(ΦPSⅡ)的大小;光照下最小荧光(F′o)更多地参与4种杂交杨的ΦPSⅡ能量捕获效率.光合速率(Pn)作为植物生物行为对于植物叶绿素光捕获的光化学行为存在滞后效应,而真正决定植物转化光能的总量由植物叶片叶绿素捕获光量子量决定.vETR反映植物驱动PSⅡ的实际量子流量,vETR达到最大值时,光化学反应转化的光能量PE也同样达到最大值,是植物最大限度转化利用太阳能的点.建议用vETR和DPF的荧光光响应曲线作为计算和估算植物对光能的利用及叶片光能转化为净能量的能力,是比表观量子效率更为理想的指标.     

Sr掺杂纳米TiO2光催化性能的工艺

为揭示Sr掺杂纳米TiO2光催化性能的工艺条件,采用水热合成法制备Sr掺杂纳米TiO2粉体。以日光作为催化光源,水中罗丹明B作为降解对象,讨论了水热反应时间、水热反应温度、pH和Sr掺杂量对样品光催化性能的影响。研究结果表明:样品对水中罗丹明B的降解反应符合零级反应动力学规律,最佳制备工艺条件为水热反应时间达4 h、温度150℃、pH=8.5、Sr掺杂量1.20%时,样品的光催化性能最优。     

氧化剂和金属离子对刚果红光化学反应的影响

在紫外光作用下,采用静态方法研究了氧化剂和金属离子对刚果红光化学反应的影响.结果表明,氧化剂对刚果红光化学反应的影响较大,其加速降解顺序为KIO4>K2S2O8>KBrO3>H2O2,加速脱色顺序为KIO4>K2S2O8≈KBrO3>H2O2;金属离子对刚果红光化学反应的影响较小,Fe2 /Cu2 /Al3 /Y3 /La3 易与刚果红生成配合物,Mn2 /Zn2 能够稍微加速刚果红光化学脱色且作用相似;HO·是导致刚果红发生光化学脱色的一个重要因素.     

金属离子和氧化剂对甲基橙光化学降解的影响

在实验条件下 ,金属离子对甲基橙光化学降解的影响较小 ,其顺序为 Fe2 + >Y3 + =La3 + >Mn2 + =Zn2 + .氧化剂对甲基橙光化学降解有较强的影响 ,其顺序为 KIO4 >K2 S2 O8>KBr O3 ≈H2 O2 .Mn2 + +KIO4 ,H2 O2 +Fe2 +对甲基橙光化学降解的影响非常显著 .