Preparation of Electrospun CdSe-Quantum-Dots-Doped Porous Films

Electrospun porous films doped with the green-synthesized CdSe quantum dots were synthesized. Glycerol was chosen to prepare the quantum dots （ QDs）, with the highest quantum yield of 78.28%. Polycaprolactone （PCL） was electrospun with CdSe QDs to avoid the QDs＇ toxicity and improve the QDs＇ cytocompatibility. The electrospun QDs-doped films preserve the original QDs＇ fluorescence. Pores can be detected from the SEM of the films, predicting the possibility of loading drugs in the cancer therapy. The cell proliferation assay shows excellent cytocompatibility of the eletrospun CdSe-QDs-doped films. The present eletrospun CdSe- QDs-doped porous films are cytocompatibale, highly-fluorescent and ootential to load drugs in cancer therapy.     

基于修正模态应变能法的硬涂层薄板阻尼性能预估

在考虑硬涂层材料的小阻尼特点以及经典模态应变能法计算误差的前提下,提出了一种适用于硬涂层复合结构阻尼性能预估的新方法.推导了修正模态应变能法的原理性公式.以一个涂敷Mg-Al硬涂层的悬臂薄板为例进行了实例研究,并讨论了硬涂层材料参数、涂层厚度对结构系统阻尼性能的影响.结果发现增大硬涂层的杨氏模量、损耗因子及厚度均可提高复合结构的阻尼性能.相关研究成果可为硬涂层材料制备及阻尼减振设计提供参考.     

热处理温度对溶胶-凝胶法制备的Ce_(0.97)Co_(0.03)O_2薄膜结构和光学性能的影响

采用溶胶-凝胶法,在Si(100)衬底上制备了3%Co掺杂CeO2薄膜,研究了不同热处理温度对Ce0.97Co0.03O2薄膜结构和光学性质的影响。X射线衍射(XRD)表明,3%Co掺杂CeO2薄膜为多晶薄膜,且未破坏CeO2原有的结构,随着退火温度的升高,晶粒尺寸逐渐增大。椭偏光谱法研究表明,Ce0.97Co0.03O2薄膜的光学常数(折射率n、消光系数k)随着退火温度增加而增大,光学带隙Eg随退火温度增加而减小,这是薄膜结构随退火温度增加发生变化所致。     

High-energy ion treatments of amorphous As40Se60 thin films for optical applic ations

The treatment of 100 MeV Ag swift-heavy ion(SHI) irradiation with five different fluences(3 1010, 1 1011, 3 1011, 1 1012, and3 1012ions/cm2) was used to design optical and structural properties of amorphous(a-) As40Se60 chalcogenide thin films. Swanepoel method was applied on transmission measurements to determine the changes in optical bandgap, Tauc parameter and linear optical parameters, i.e., linear optical absorption, extinction coefficient and linear refractive index. Dispersion of the material was determined by Wemple–DiDomenico relation.Changes in nonlinear optical parameters of third-order optical susceptibility and nonlinear refractive index were determined using semi-empirical relations. Changes in surface morphology of the films were investigated using SEM observation, which indicated that fluence 3 1012ions/cm2was upper threshold limit for these films for ion treatment. It is observed that optical bandgap reduces from 1.76 eV to 1.64 eV, and nonlinear refractive index increases from 1.31 10 10[esu] to 1.74 10 10[esu]. Linear refractive index initially increases from 2.80 to 3.52(for fluence3 1010ions/cm2) and then keeps decreasing. The observed changes in optical properties upon irradiation were explained in terms of structural rearrangements by Raman measurement. The study was compiled with the previous literature to propose SHI as an effective optical engineering technique to achieve desired changes according to the need of optical/photonic applications.     

Cu衬底上ZnO纳米结构及其光催化性能分析

采用两步电化学沉积法在Cu衬底上沉积得到ZnO纳米结构薄膜。用X-射线衍射（XRD）和扫描电子显微镜（SEM）对其结构及形貌进行表征,发现先在Cu衬底上沉积一层Zn致密膜,更有利于在其表面上得到附着力强、形貌较好的ZnO纳米结构膜。系统考察了沉积温度和沉积时间等工艺参数对ZnO纳米结构的影响。结果表明,沉积温度和沉积时间对晶体结构和形貌有显著影响,通过对工艺进行适宜控制可以得到结晶性良好的六方纤锌矿型ZnO纳米结构膜。以罗丹明B为目标有机污染物,分析了ZnO膜的光催化性能,表明所制备的ZnO膜可以作为光催化剂,其光催化效率可达到72.4%。     

阳极Ta/Ta2O5的薄膜曲界面结构特征及形成机理

采用电化学方法制备了钽电解电容器阳极.通过场发射扫描电镜和理论分析对钽阳极断面的曲面结构特征及其形成机理进行了研究.研究结果发现Ta/Ta_2O_5的薄膜曲界面存在间隙层(1nm),该间隙层为氧空位及其缺陷离子迁移所致;曲面结构的应力模型表明曲面薄膜界面的电化学生长过程生产缺陷浓度高于平面系统,讨论了钽电解电容器曲面薄膜的形成过程对电场应力畸变屏蔽的机理.     

油菜薄层细胞培养中不同光质对愈伤组织诱导和增殖的效应

本实验以油菜(Brassica napus L.)花序轴薄层细胞为外植体,基本培养基为MS,附加不同浓度和比例的NAA和6-BA组合。接种后,选取白光、植物生长灯、红光、蓝光四种不同光质的光进行光照,以黑暗为对照,置恒温培养柜中培养,探讨不同光质对愈伤组织诱导和增殖的效应。结果表明:在相同或不同的培养基上,不同光质对愈伤组织的诱导效应都不同,蓝光,红光对油菜愈伤组织诱导具有明显的促进作用。在相同培养基中,不同光质处理对愈伤组织的增殖效应也不同,蓝光、红光对愈伤组织增殖的促进作用也是明显的。     

趋肤效应的演示

本文介绍用镀铁细铜丝演示趋肤效应的基本思想和方法。     

氩气分压与膜厚对溅射Al膜微结构及应力的影响

在不同氩气分压下,用直流溅射法在室温Si基片上制备了不同厚度的Al膜。用光学干涉相移法和X射线衍射技术,对薄膜应力和微结构进行了测试分析。微结构分析表明:制备的Al膜均呈多晶状态,晶体结构仍为面心立方;氩气分压分别为1Pa和3Pa的Al膜相比,1Pa下制备的薄膜结晶程度明显优于3Pa下制备的薄膜。1Pa下Al膜平均晶粒尺寸随膜厚的增加由17.9nm逐渐增大到26.3nm;晶格常数由0.4037nm增大到0.4047nm,均比标准值0.40496nm稍小。应力分析表明:同一工作气体压强(氩气分压)下,Al膜的平均应力随着膜厚的增加变小,应力分布趋向均匀。相同时间1Pa和3Pa的Al膜,其微结构和应力有较大差别。     

无氢类金刚石膜的光致发光特性研究

使用脉冲激光沉积（PLD）技术制备了系列无氢类金刚石（DLC）薄膜,测量了样品的Raman光谱、光吸收和光致发光,研究了光致发光与制备条件的依赖关系。结果表明,这种薄膜是有少量sp^2键和sp^2键组成的非晶碳膜。薄膜的光学带隙在1．68～2.46eV,发光在可见光区呈宽带结构。沉积温度对类金刚石薄膜的结构和发光性质有较大影响。当沉积温度从室温升高至400℃时,sp^2团簇的长大使C原子的有序度增强,从而导致薄膜的光学带隙变窄,发光峰红移且半高宽变小。