复合式鱼雷战斗部威力试验研究

该文分析了复合式鱼雷战斗部的结构和性能，结合模拟威力试验，验证了利用复合式鱼雷战斗部攻击抗爆能力强的大、中型潜艇的可行性，并提出了增强威力的具体措施，为进一步指导复合式鱼雷战斗部设计提供参考。     

微波辐射合成季铵盐型阳离子淀粉絮凝剂

研究了季铵盐型阳离子改性淀粉絮凝剂的微波辐射合成.该工艺反应时间短、产率高、操作简便,同时有效抑制了副反应的发生,提高了产品纯度.讨论了诸因素对反应的影响,通过正交试验确定了反应的最佳条件为:氢氧化钠、2,3-环氧丙基三甲基氯化铵与淀粉的摩尔比1.4∶1∶2.2,辐射反应时间1.5 m in,微波功率280 W.     

硅表面双聚体空位附近原子沉积的理论研究

采用经验紧束缚近似方法模拟重构硅(100)表面单个双聚体空位(SDV)附近的单个硅原子的沉积行为，根据绘制的SDV附近附加能量差异的三维及投影图，确定了沉积束缚点和一些鞍点，并研究其可能的扩散路径。     

脉冲激光沉积法制备氧化铋薄膜及其电化学性质研究

首次采用355nm脉冲激光沉积在不锈钢基片上制备了氧化铋薄膜，X—射线衍射(XRD)测试表明在基片温度为300℃，沉积时间为0．5h制备得到的Bi2O3薄膜具有四方结构，SEM和Raman光谱测定对该Bi2O3薄膜的表面形貌和锂化前后的结构进行了表征，结果表明薄膜由小于100nm针状晶粒组成，锂化后的产物可能是LixBi2O3。此外，由电位阶跃法测定了上述Bi2O3薄膜电极的锂离子扩散系数。电化学测定表明，上述Bi2O3薄膜具有充放电循环性能,在电压范围为0．70～3．5V，该氧化铋薄膜在充放电速率为2C时的比容量大约为100mAh／g，并且保持经100次以上充放电循环而没有明显的衰减。     

金属基体表面热熔敷玻璃涂层耐蚀性研究

利用斑点试验、点蚀试验、电化学测试及扫描电镜等方法 ,研究了熔敷温度、保温时间和稀土添加量等工艺参数对热熔敷法制备的玻璃涂层耐蚀性的影响 ,探讨了添加稀土提高玻璃涂层耐蚀性的机理。试验结果表明 ,采用热熔敷法制备的玻璃涂层有较好的耐蚀性。随着熔敷温度的提高和保温时间的延长 ,形成了一定量的晶相后会降低涂层的耐蚀性。试验结果表明 ,熔敷温度为 70 0℃、保温 5min后能够得到耐蚀性良好的玻璃涂层。添加稀土提高了釉料的软化温度和熔融釉料的粘度 ,阻止了结晶形核和晶核长大 ,减少了晶相 ,同时提高了涂层的电极电位 ,使涂层耐蚀性显著提高。当稀土含量为 2 %时 ,涂层的耐蚀性较好。     

从黄土Sr同位素探讨海水87Sr/86Sr变化的原因

目前多数认为河流输入是引起海水^87Sr／^86Sr变化的最主要因素，对此推论并没有提供确实的定量分析和依据．通过对黄土高原洛川剖面黄土—古土壤Sr同位素组成和沉积速率等的定量计算说明，在过去2．5Ma期间，海水^87Sr／^86Sr上升总量仅是河流输人海洋总量的大约1/10，而其9／10被海底玄武岩的热液蚀变输入所抵消．海底玄武岩的热液蚀变输入对海水^87Sr／^86Sr变化的总影响量应近似等于河水输入对海水^87Sr／^86Sr变化的总影响量．海水^87Sr／^86Sr变化的原因是河水输入与海底玄武岩的热液烛变输入联合作用的结果．     

碳钢粉末渗铝试验研究

对 2 0碳钢进行了粉末包埋渗铝试验 ,优化了渗剂配方及渗铝工艺。采用X射线衍射仪分析了渗铝层的相成分 ,并对渗铝层的微观组织和渗铝钢的力学性能进行了测试。结果表明 ,使用 3号渗剂的 2 0碳钢的表面渗铝效果最好。 2 0碳钢渗铝层内未出现高铝脆性相 (FeAl3 、Fe2 Al5等 ) ,这有利于改善渗铝钢的力学性能和焊接性能。 2 0碳钢经渗铝处理后 ,其机械性能略有降低 ,高温持久性能明显降低 ,而抗高温氧化性能大大提高。     

HV/CVD Grown Relaxed SiGe Buffer Layers for SiGe HMOSFETs

High-vacuum/chemical-vapor deposition (HV/CVD) system was used to grow relaxed SiGe buffer layers on Si substrates. Several methods were then used to analyze the quality of the SiGe films. X-ray diffraction and Raman spectroscopy showed that the upper layer was almost fully relaxed. Second ion mass spectroscopy showed that the Ge compositions were step-graded. Transmission electron microscopy showed that the misfit dislocations were restrained to the graded SiGe layers. Tests of the electrical properties of tensile-strained Si on relaxed SiGe buffer layers showed that their transconductances were higher than that of Si devices. These results verify the high quality of the relaxed SiGe buffer layer. The calculated critical layer thicknesses of the graded Si1-xGex layer on Si substrate and a Si layer on the relaxed SiGe buffer layer agree well with experimental results.     

Evolution of the South China Sea and monsoon history revealed in deep-sea records

As the third summary report of ODP Leg 184 to the South China Sea (SCS), this paper discusses the evolution of the East Asian monsoon and the SCS basin. A multi-proxy approach, involving geochemistry, micropale-ontology, pollen and other analyses, was adopted for reconstructing the evolutionary history of the East Asian monsoon, which was characterized by a series of paleo-climate events especially at 8, 3.2, 2.2 and 0.4 Ma. The new record indicates similar stages in the development of the East and South Asian monsoons, with an enhanced winter monsoon over East Asia being the major difference. The rich spectrums of monsoon variability from the southern SCS also reveal other characteristic features of the low latitude ocean. Evidence for the evolution of the SCS includes the hemipelagic Oligocene sediments, implying the existence of deep water environments during the early seafloor spreading stage of the SCS basin. The four major unconformities and some remarkabl ediagenetic features in upper Oligocene deposits indicate the strongest tectonic events in the region. From a careful comparison of lithologies and sedimentation rates, we conclude that the prominent differences in sedimentary environments between the southern and northern SCS were established only by ～3 Ma.     

Ni-Fe-P合金化学镀的工艺条件及晶化行为研究

采用硼酸为缓冲剂,柠檬酸钠为络合剂在碱性介质中化学沉积Ni Fe P合金.考察了工艺条件如pH、FeSO4·7H2O浓度和温度对沉积速度的影响.获得了沉积速度快,镀液稳定性好的工艺条件.采用差示扫描量热和X射线衍射研究了Ni Fe P合金的晶化行为.结果表明,镀层在镀态呈非晶结构,镀层在200.5℃晶化为亚稳的Ni Fe合金,310℃晶化为立方FeNi3合金,369.2℃晶化为四方的Ni3P,而491.3℃为继续生成FeNi3的吸热峰.