光纤传输系统啁啾的影响与补偿

通过研究光纤传输系统中激光器初始啁啾、光纤非线性和色散的相互作用,提出了用ＳＰＭ（自相位调制）补偿激光器的初始啁啾和光纤正色散补偿ＳＰＭ的原理和方法,并对其在具体系统中的应用进行了讨论。     

本征晶格缺陷对BNT铁电薄膜光响应性能的影响简

用溶胶-凝胶法在YSZ/Si衬底上制备Bi3．15 Nd0．85 Ti3 O12（BNT）铁电薄膜,研究了退火气氛和退火温度对BNT薄膜的光响应性能的影响。对不同退火气氛和退火温度下的BNT薄膜进行微观结构和光响应性能表征。研究结果表明：随着退火气氛中氧含量的降低,光响应增大,BNT薄膜中氧空位起到了为光生载流子传输提供通道的作用;随着退火温度的降低,光开启电压和饱和光电导增大,BNT薄膜中高密度的晶界虽然阻碍了光生载流子的迁移,却有利于使光生载流子在晶界处及时分开。     

Preparation of Electrospun CdSe-Quantum-Dots-Doped Porous Films

Electrospun porous films doped with the green-synthesized CdSe quantum dots were synthesized. Glycerol was chosen to prepare the quantum dots （ QDs）, with the highest quantum yield of 78.28%. Polycaprolactone （PCL） was electrospun with CdSe QDs to avoid the QDs＇ toxicity and improve the QDs＇ cytocompatibility. The electrospun QDs-doped films preserve the original QDs＇ fluorescence. Pores can be detected from the SEM of the films, predicting the possibility of loading drugs in the cancer therapy. The cell proliferation assay shows excellent cytocompatibility of the eletrospun CdSe-QDs-doped films. The present eletrospun CdSe- QDs-doped porous films are cytocompatibale, highly-fluorescent and ootential to load drugs in cancer therapy.     

热处理温度对溶胶-凝胶法制备的Ce_(0.97)Co_(0.03)O_2薄膜结构和光学性能的影响

采用溶胶-凝胶法,在Si(100)衬底上制备了3%Co掺杂CeO2薄膜,研究了不同热处理温度对Ce0.97Co0.03O2薄膜结构和光学性质的影响。X射线衍射(XRD)表明,3%Co掺杂CeO2薄膜为多晶薄膜,且未破坏CeO2原有的结构,随着退火温度的升高,晶粒尺寸逐渐增大。椭偏光谱法研究表明,Ce0.97Co0.03O2薄膜的光学常数(折射率n、消光系数k)随着退火温度增加而增大,光学带隙Eg随退火温度增加而减小,这是薄膜结构随退火温度增加发生变化所致。     

High-energy ion treatments of amorphous As40Se60 thin films for optical applic ations

The treatment of 100 MeV Ag swift-heavy ion(SHI) irradiation with five different fluences(3 1010, 1 1011, 3 1011, 1 1012, and3 1012ions/cm2) was used to design optical and structural properties of amorphous(a-) As40Se60 chalcogenide thin films. Swanepoel method was applied on transmission measurements to determine the changes in optical bandgap, Tauc parameter and linear optical parameters, i.e., linear optical absorption, extinction coefficient and linear refractive index. Dispersion of the material was determined by Wemple–DiDomenico relation.Changes in nonlinear optical parameters of third-order optical susceptibility and nonlinear refractive index were determined using semi-empirical relations. Changes in surface morphology of the films were investigated using SEM observation, which indicated that fluence 3 1012ions/cm2was upper threshold limit for these films for ion treatment. It is observed that optical bandgap reduces from 1.76 eV to 1.64 eV, and nonlinear refractive index increases from 1.31 10 10[esu] to 1.74 10 10[esu]. Linear refractive index initially increases from 2.80 to 3.52(for fluence3 1010ions/cm2) and then keeps decreasing. The observed changes in optical properties upon irradiation were explained in terms of structural rearrangements by Raman measurement. The study was compiled with the previous literature to propose SHI as an effective optical engineering technique to achieve desired changes according to the need of optical/photonic applications.     

阳极Ta/Ta2O5的薄膜曲界面结构特征及形成机理

采用电化学方法制备了钽电解电容器阳极.通过场发射扫描电镜和理论分析对钽阳极断面的曲面结构特征及其形成机理进行了研究.研究结果发现Ta/Ta_2O_5的薄膜曲界面存在间隙层(1nm),该间隙层为氧空位及其缺陷离子迁移所致;曲面结构的应力模型表明曲面薄膜界面的电化学生长过程生产缺陷浓度高于平面系统,讨论了钽电解电容器曲面薄膜的形成过程对电场应力畸变屏蔽的机理.     

氩气分压与膜厚对溅射Al膜微结构及应力的影响

在不同氩气分压下,用直流溅射法在室温Si基片上制备了不同厚度的Al膜。用光学干涉相移法和X射线衍射技术,对薄膜应力和微结构进行了测试分析。微结构分析表明:制备的Al膜均呈多晶状态,晶体结构仍为面心立方;氩气分压分别为1Pa和3Pa的Al膜相比,1Pa下制备的薄膜结晶程度明显优于3Pa下制备的薄膜。1Pa下Al膜平均晶粒尺寸随膜厚的增加由17.9nm逐渐增大到26.3nm;晶格常数由0.4037nm增大到0.4047nm,均比标准值0.40496nm稍小。应力分析表明:同一工作气体压强(氩气分压)下,Al膜的平均应力随着膜厚的增加变小,应力分布趋向均匀。相同时间1Pa和3Pa的Al膜,其微结构和应力有较大差别。     

无氢类金刚石膜的光致发光特性研究

使用脉冲激光沉积（PLD）技术制备了系列无氢类金刚石（DLC）薄膜,测量了样品的Raman光谱、光吸收和光致发光,研究了光致发光与制备条件的依赖关系。结果表明,这种薄膜是有少量sp^2键和sp^2键组成的非晶碳膜。薄膜的光学带隙在1．68～2.46eV,发光在可见光区呈宽带结构。沉积温度对类金刚石薄膜的结构和发光性质有较大影响。当沉积温度从室温升高至400℃时,sp^2团簇的长大使C原子的有序度增强,从而导致薄膜的光学带隙变窄,发光峰红移且半高宽变小。     

缺陷态全介质多层光纤在DWDM系统中的应用

由亥姆霍兹方程得到的解,应用传榆矩阵法,对加入缺陷的全介质多层光纤的径向滤波特性进行了计算和仿真,最终设计了一种加入缺陷的全介质多层光纤,通道间隔B约为0．8am,可以很好地抑制四波混频效应,能很好地用于DWDM系统,也可以用于N通道波分复用一解复用滤波器。     

YSZ薄膜的阻抗谱测量及其电学性能的研究

应用４１９２Ａ低频阻抗分析仪测量了不同温度下的ＹＳＺ薄膜的阻抗谱,利用Ｂａｕｅｒｌｅ等效电路模型研究了ＹＳＺ薄膜的电导率随温度的变化规律,探讨了掺杂氧化物（Ｙ２Ｏ３）对ＹＳＺ薄膜电导率的影响,其结果表明：ＹＳＺ薄膜的阻抗谱是一个完整的半圆,圆心稍低于实轴,在５００℃时,ＹＳＺ薄膜的电导率为０．０１４Ω＾－１ｃｍ＾－１,且随着测试温度的升高,ＹＳＺ薄膜的电导率增大,稳定剂浓度对ＹＳＺ薄膜的电导率有显