圆锥形图形化蓝宝石衬底对MOCVD生长GaN外延膜的位错密度和应力应变影响

通过金属氧化物化学气相沉积（MOCVD）方法在2．5μm×1．6μm×0．5μm圆锥形图形化蓝宝石衬底（CPSS）和没有图形化平面蓝宝石衬底（uss）上生长GaN外延膜．高分辨率X射线衍射仪（HRXRD）测试结果表明,生长在CPSS上GaN的刃位错的密度比生长在USS上GaN的刃位错密度低得多;从透射电子显微镜（TEM）观察,CPSS可有效地减小GaN外延膜中的线位错密度;拉曼散射谱显示通过CPSS可有效地减小GaN外延膜中的残余应力;比较两种外延膜中的光致发光谱（PL）,能从生长在CPSS上GaN外延膜中观察到强而尖的带边发射．以上结果表明：生长在CPSS上GaN外延膜的质量高于生长在USS上GaN外延膜的质量．     

铜化学机械抛光材料去除机理的准连续介质法研究

采用准连续介质力学方法研究了铜化学机械抛光过程的机械作用材料去除机理.模拟了不同大小磨粒在单晶铜工件上的磨削过程,分析了切削过程中工件内部材料变形、切屑的形成以及工件内部应力分布和切削力变化.研究结果表明,工件内部材料沿着与切削方向约45°变形形成剪切带,在剪切带区域伴随有位错、滑移等现象产生.磨粒较小时加工后的表面质量较差,磨粒较大时加工质量较好,但会造成工件内部较大的塑性变形与更深的残余应力分布.磨粒尺寸变化对于切向切削力影响不大.     

Fe基合金带表面抛光工艺研究

利用磁力显微镜(MFM)观测了经机械抛光、电解抛光、机械兼化学腐蚀抛光的Fe73.5Cu1Nb3Si13.5B9合金带表面结构,研究了MEP法处理样品表面粗糙度和腐蚀时间之间关系,基于MFM对材料表面结构的要求,实验结果表明Fe基合金表面最佳抛光工艺为:在30℃恒温下将MEP法处理样品投于浓度为36%~38%盐酸溶液中腐蚀15min。     

基于ANSYS水轮机修复专用机器人模态分析

为了研究水电站水轮机修复专用机器人的动力性能,对其进行磨削工况模拟,通过Pro/E软件建立实体模型,并基于有限元分析软件ANSYS生成有限元模型,进行有预应力的模态分析,从而得出机器人前五阶固有频率和振型.结果表明:振动剧烈的部位主要是各个部件的结合部,分析结果可为机器人结构改进提供理论依据.     

Influence of sample preparation on nanoindentation results of twinninginduced plasticity steel

Nanoindentation is an attractive characterization technique,as it not only measures the local properties of a material but also facilitates understanding of deformation mechanisms at submicron scales.However,because of the complex stress-strain field and the small scale of the deformation under the nanoindenter,the results can be easily influenced by artifacts induced during sample preparation.In this work,a systematic study was conducted to better understand the influence of sample preparation methods on the nanoindentation results of ductile metals.All experiments were conducted on a steel(Fe-22Mn-0.65C,wt%)with twinning-induced plasticity(TWIP),which was selected for its large grain size and sensitivity to different surface preparation methods.By grouping the results obtained from each nanoindent,chemical polishing was found to be the best sample preparation method with respect to the resulting mechanical properties of the material.In contrast,the presence of a deformation layer left by mechanical polishing and surface damage induced by focused ion beam(FIB)scanning were confirmed by the dislocation-nucleation-induced pop-in events of nanoindentation.     

氮化衬底对MOCVD生长GaN的影响

采用MOCVD生长技术以Al2O3为衬底对GaN生长进行了研究．用霍尔测量技术、光致发光技术以及光学显微镜测量了GaN的电学性能、光学性能以及表面形貌．研究表明,GaN低温缓冲层生长之前的氮化衬底工艺对GaN外延层表面形貌、发光性能、电学性能有显著影响．合适的氮化衬底条件可得到表面形貌、发光性能和电学性能均较好的GaN外延膜．研究表明长时间氮化衬底使GaN外延膜表面粗糙的原因可能是由于氮化衬底影响了后续高温GaN的生长模式,促使GaN三维生长所导致的．     

实验分析影响石材抛光的因素

介绍了影响石材抛光的几个因素:抛光剂的类型,抛光剂(膏),抛光磨具(块)和抛光工艺参数,重点通过实验的方法得出石才抛光光泽度与压力P的关系;光泽度与时间的关系;光泽度与进给速度Vw的关系。为石材的机械加工提供了实验依据。     

Gallium-Catalyzed Silicon Oxide Nanowire Growth

Silicon oxide nanowires tend to assemble into various complex morphologies through a metalcatalyzed vapor-liquid-solid （VLS） growth process. This article summarizes our recent efforts in the controlled growth of silicon oxide nanowire assemblies by using molten gallium as the catalyst and silicon wafer, SiO powder, or silane （Sill4） as the silicon sources. Silicon oxide nanowire assemblies with morphologies of carrotlike, cometlike, gourdlike, spindlelike, badmintonlike, sandwichlike, etc. were obtained. Although the morphologies of the nanowire assemblies are temperatureand silicon source-dependent, they share similar structural and compositional features： all the assemblies contain a microscale spherical liquid Ga ball and a highly aligned, closely packed amorphous silicon oxide nanowire bunch. The Ga-catalyzed silicon oxide nanowire growth reveals several interesting new nanowire growth phenomena that expand our knowledge of the conventional VLS nanowire growth mechanism.     

振动研磨工艺对QAl10-4-4合金的表面组织及性能的影响

研究了振动研磨工艺对涡轮用QAl10-4-4合金组织和表面性能的影响.结果表明：振动研磨处理后,QAl10-4-4合金产生了从研磨表面至心部硬度逐渐降低的硬化层,表面硬度提高约20%;相对于未研磨处理的QAl10-4-4合金,经振动研磨处理后,合金处于表面压应力状态,表面残余应力提高约300 MPa,表面粗糙度明显降低,表面摩擦因数显著下降,耐磨性显著提高.工程实际应用结果表明：使用振动研磨工艺处理QAl10-4-4合金蜗轮提高整机的传动效率超过20%.振动研磨后,材料表面综合性能的提高与表层组织细化有直接关系.     

清洗研磨对改善铜板带材表面质量的作用

通过铜板带质量缺陷的数据统计,得出铜板带材普遍存在的质量缺陷主要是表面缺陷的结论,并在此基础上论述了清洗研磨对改善铜板带材表面质量的作用,以及保证清洗研磨效果的四个关键要素,即选好研磨辊刷、选好刷辊线径、选好磨粒目数和选好包括接触压力、研磨量及刷辊速度在内的研磨工艺.文章对现实铜板带材生产过程中,如何进一步改善表面质量具有借鉴价值.