采用热壁外延技术在GaAs衬底上生长CdTe单晶薄膜

我们采用自行设计制造的热壁外延(HWE)装置在GaAs(100)衬底上生长了CdTe晶膜。分析测试表明,该膜为(100)单晶膜。HWE技术生长的CdTe/GaAs结构为外延生长HgCdTe提供了十分合适的衬底。 外延源是用99.999％的cd和Te,在10~(-4)Pa真空,800～1000℃温度下煅烧100h而获得的CdTe多晶。衬底采用(100)GaAs单晶片,解理成6×6 mm~2方块。清洁处理     

温度和掺杂浓度对delta掺杂GaAs量子阱电子态结构和子带间光学吸收的影响

在有效质量近似下,通过自洽计算求解薛定谔方程和泊松方程,得到了温度不为零时Siδ掺杂的Ga As量子阱系统的电子态结构.研究了温度和掺杂浓度对系统子带能量、费米能级、电子密度分布和子带间光学吸收系数的影响.发现在一定的掺杂浓度下,费米能级会随着温度的升高而降低,子带间入射光总的吸收系数随温度升高而降低;在温度一定时,费米能级和子带能级随掺杂浓度的增大而增大,子带间入射光总吸收系数随掺杂浓度增大而增大.     

Low energy H+ effects on the photovoltaic and optical properties of polycrystalline silicon solar cells

Low energy hydrogen ion was used to passivate the electrically active defects existing in grains and grain boundaries of polycrystalline silicon solar cells. Short-circuit current of H⁺ implanted cells remarkably increased before and after preparing TiO₂AR (antireflective) coating. The measurements (at λ=6328 Å) of the optical properties of H⁺ implanted silicon samples show that: the value of absorption coefficient reached the level of a-Si; refractive indexn and ref?ectivityR significantly decreased; the optical band gap increased from 1.1 eV to 1.3 eV. The results indicate that Si-H bonds have been formed after H⁺ implantation. The calculation shows that the optical thickness cycle of TiO₂ AR coating will reduce correspondingly in order to obtain the optimum optical match between AR coating and implanted silicon since refractive index decreases after H⁺ implantation.     

室温不可逆原电池技术制备BaMoO_4多晶薄膜(英文)

室温条件下于Ba(OH)2溶液中采用无外加电流的非可逆原电池技术在钼金属基片上制备了BaMoO4多晶薄膜.采用XRD、SEM和Raman技术表征了制备薄膜的微结构;同时探讨了BaMoO4薄膜的电化学形成机制.XRD,SEM和Raman分析结果表明制备的薄膜表面均匀、致密,是白钨矿结构的四方单相BaMoO4;非可逆原电池条件下BaMoO4薄膜的形成包括阳极氧化溶解反应和溶液沉积反应,原电池反应的驱动力是电池的正极与负极的电势差.     

n型掺杂GaAs中电子与空穴的超快弛豫特性

研究了n型重掺杂GaAs中的光生电子与空穴的超快弛豫特性.在n型重掺杂情况下,由于费米面已进入导带之中,抑制了费米面附近光激发电子的弛豫过程对泵浦探测信号的贡献,而突出了空穴弛豫在饱和吸收谱中的地位.理论计算表明空穴通过吸收光声子在～300fs时间内达到与晶格热平衡,并由此所导出的材料光学形变势常数d0=31eV.计算值与实验测量结果相符合.     

Growth of AgGaS2 single crystal by descending crucible with rotation method and observation of properties

This note reports a new procedure of polycrystalline synthesis and a new technique of single crystal growth on AgGaS₂, i.e. two-zone temperature oscillation vapor transporting and descending crucible with rotation. A single phase dense AgGaS₂ polycrystalline ingot was synthesized, and a crack-free AgGaS₂ single crystal with 15 mm in diameter and 30 mm in length was grown by the techniques mentioned above. Structure integrity of the crystal was studied by the X-ray diffraction technique. Six order X-ray spectra from the 011 face of the crystal were obtained, and an anomalous phenomenon was observed for the first time that intensity of the higher order diffraction peak is much stronger than that of the lower order diffraction peak. Etch-pits of the crystal were observed by the scanning electron microscopy (SEM).     

GaAs红外发光管芯片的表面性质

利用扫描电子显微镜观察 Ｇａ Ａｓ 外延层及 Ｉ Ｒ Ｌ Ｅ Ｄ 芯片的表面，测量了输出辐射强度随芯片表面不同形貌的变化，讨论了 Ｇａ Ａｓ 红外发光二极管外延及芯片工艺对器件光学、电学性质的影响． 结果显示，芯片表面玷污、划伤，电极磨损，使输出辐射强度降低．     

Measurement of GaAs start duration in different solution concentration using infrared images

This paper proposes a new infrared method to measure the start duration of GaAs substrate in chemical etching. When etching starts, the temperature of liquid-film will change because of heat release in the chemical reaction. As a result, the start duration of GaAs can be tested by collecting real-time in-frared thermal images in the course of temperature variation. Both theoretical analysis and experi-mental results show that the line shape liquid film of a 2-mm width is a good monitoring subject. By making use of the grey distribution change of a certain cross section of the line shape liquid film, the start duration of reaction between GaAs and H2SO4-H202-H20 is obtained. The start durations of reac-tion between GaAs substrate and H2SO4： H202： H20 （=5：1：50 and 15：3：50） solution are about 0.2 s and 0.3-0.4 s, respectively. This result and relative method will impulse the research of wet chemical etching technology of GaAs and so on.     

坩埚下降法生长红外砷化镓晶体的研究

利用坩埚下降法生长红外砷化镓晶体,坩埚下降炉控温1 260℃,晶体以2.5mm/h速度在温度梯度为10℃/cm的条件下结晶生长.PBN坩埚外壁黏附有气相自发成核、尺寸为1~3mm的砷化镓单晶颗粒.生长的砷化镓晶体直径约50.8mm,总长约140mm.晶体头部放肩阶段存在异相成核,尾部出现多晶.截断后获得的砷化镓单晶长约100mm,成晶率达70%.砷化镓单晶结晶质量良好,头尾平均位错密度分别为868cm-2和1 436cm-2,电阻率达107Ω·cm量级.砷化镓单晶整体红外透过率约为55%,接近最高理论透过率55.8%.满足工业界使用要求.     

GaAs：Cr中深能级俘获效应对电导的影响

本文报导半绝缘GaAs:Cr的低压和低频电流振荡现象,在室温下系统地测量电流和电压关系的伏安特性,并进一步研究在红外和可见光辐照下的振荡规律,分析了深能级俘获过程对导带内电子浓度和迁移率的影响。