质量工程背景下化学工程专业教学团队建设的实践①②

教学团队建设是“质量工程”的重要组成部分,该文根据我院近年来化学工程专业教学团队建设的实践,剖析了团队建设的思路和内容,对化工专业实验教学团队的建设实践提出了一些建议。实践表明,教学团队能够造就高素质的师资队伍,有效提高人才培养质量。     

BaCe0．7Zr0．1Y0．2O3－δ的合成、电学性能和化学稳定性

采用溶胶凝胶法合成了质子导体BaCe0．7Zr0．1Y0．2O3－δ（BCZY71）纳米粉体,研究了干凝胶到最终钙钛矿结构的转变过程,BCZY71陶瓷块体的电学性能和化学稳定性能。DTA－TG、IR、XRD结果表明经过三个热失重过程可以得到钙钛矿结构的BCZY71样品,1100℃焙烧2h以后可以得到正交相的BCZY71纳米粉末,经过1450℃烧结5h可以得到BCZY71陶瓷块体,BCZY71陶瓷块体的导电行为符合Arrhenius方程,活化能为0．67eV。BCZY71陶瓷块体化学稳定性能显示在100％C02气氛800℃下焙烧2h晶体结构没有发生变化,但是在沸水中煮沸12h以后,大部分钙钛矿结构的BCZY71转变为BaCO3。     

超声波和AES对原油的降粘试验简

通过试验得到：在去离子水中掺入AES后,其表面张力系数显著降低了,AES的浓度越大,其表面张力越小.该溶液经超声波处理后：表面张力系数有一定的上升,超声波功率越大、作用时间越长,表面张力系数上升越大;随超声波作用时间的增加,该溶液的化学需氧量越来越小,但随作用时间的增加,下降的趋势变慢.掺入AES后,原油的粘度有了较大的降低,其降粘率超过了80％.超声波对掺入AES的原油作用后,原油的降粘率超过了92％.     

北京化工大学科技创新能力分析＊--基于Innography平台的北京化工大学专利分析

基于Innography专利检索和分析平台,从专利申请数量、授权比例、存活率、合作申请、技术方向分布、国外专利情况、高强度专利等方面,对北京化工大学的专利情况进行了检索分析,并针对北京化工大学技术创新和专利产出的现状和存在问题,提出了相应建议。     

单双层石墨烯的制备及电导特性调控

石墨烯二维材料有着优异的物理、化学特性,在多个科学领域展现出广阔的应用前景.采用化学气相沉积方法在Cu-Ni合金表面制备了二维石墨烯薄膜并揭示其生长机制;研究生长时间、温度等对石墨烯覆盖度和晶格质量的影响.通过优化生长条件,成功制备了大面积单层及具有强烈层间耦合作用的AB堆叠双层石墨烯薄膜.进一步运用表面沉积技术在单层石墨烯上构建零维Au团簇和二维Au薄膜,研究其对石墨烯电导特性的影响;并结合第一性原理计算,揭示Au的形态及覆盖度影响石墨烯电导特性的规律.据此制作了石墨烯场效应晶体管器件,通过精确控制Au的覆盖度,实现石墨烯电导类型和载流子浓度的有效调控,拓展了其在微电子领域的应用.     

Bi_(1.6)La_(0.4)Ti_2O_7薄膜的制备及性能研究

采用化学溶液沉积法在ITO基片上制备不同退火温度的掺镧钛酸铋Bi1.6La0.4Ti2O7(BLT)薄膜。研究了其结构、介电性能、漏电流密度与外加电压I-V关系曲线和光学带隙。XRD射线衍射测试结果表明,经500、550、600℃1 h退火后的薄膜的主晶相为烧绿石结构,无杂相生成,600℃时BLT薄膜衍射峰比其他两种温度的强。在1 kHz频率下测得的介电常数、损耗因子分别为114,3%;129,3%;194,6%。BLT薄膜的漏电流密度与外加电压关系曲线表明,BLT薄膜600℃的漏电流比550和500℃稍微减小。通过透射谱分析得到BLT薄膜的光学带隙几乎不受温度影响,均为3.7 eV。这些结果表明制备BLT固溶体薄膜较佳为退火温度600℃,具有较好的性能,在光电器件有良好的应用前景。     

Microstructure and oxidation resistance of SiC–MoSi2 multi-phase coating for SiC coated C/C composites

In order to improve the anti-oxidation of C/C composites, a SiC–MoSi2multi-phase coating for SiC coated carbon/carbon composites(C/C)was prepared by low pressure chemical vapor deposition(LPCVD) using methyltrichlorosilane(MTS) as precursor, combined with slurry painting from MoSi2 powder. The phase composition and morphology were analyzed by scanning electron microscope(SEM) and X-ray diffraction(XRD) methods, and the deposition mechanism was discussed. The isothermal oxidation and thermal shock resistance were investigated in a furnace containing air environment at 1500 1C. The results show that the as-prepared SiC–MoSi2coating consists of MoSi2 particles as a dispersing phase and CVD–SiC as a continuous phase. The weight loss of the coated samples is 1.51% after oxidation at 1500 1C for 90 h, and 4.79% after 30 thermal cycles between 1500 1C and room temperature. The penetrable cracks and cavities in the coating served as the diffusion channel of oxygen, resulted in the oxidation of C/C composites, and led to the weight loss in oxidation.     

Cu衬底上ZnO纳米结构及其光催化性能分析

采用两步电化学沉积法在Cu衬底上沉积得到ZnO纳米结构薄膜。用X-射线衍射（XRD）和扫描电子显微镜（SEM）对其结构及形貌进行表征,发现先在Cu衬底上沉积一层Zn致密膜,更有利于在其表面上得到附着力强、形貌较好的ZnO纳米结构膜。系统考察了沉积温度和沉积时间等工艺参数对ZnO纳米结构的影响。结果表明,沉积温度和沉积时间对晶体结构和形貌有显著影响,通过对工艺进行适宜控制可以得到结晶性良好的六方纤锌矿型ZnO纳米结构膜。以罗丹明B为目标有机污染物,分析了ZnO膜的光催化性能,表明所制备的ZnO膜可以作为光催化剂,其光催化效率可达到72.4%。     

Properties and Morphology of TiN Films Deposited by Atomic Layer Deposition

In this study,TiN films were deposited on SiO2 substrates by Atomic Layer Deposition(ALD) using TiCl4and NH3 as precursors. Properties and morphology of the TiN films were characterized by different methods.Using Grazing Incidence X-Ray Diffraction(GIXRD),TiN films demonstrated polycrystalline structure with(111)preferred orientation. Film thickness was measured by Spectroscopic Ellipsometry(SE) and a stable growth rate of 0.0178 nm/cycle was reached after 500 deposition cycles,which was consistent with the essence of ALD as a surface-saturated self-limiting reaction. Film resistivity measured by a four-point probe continuously decreased with increasing deposition cycles until it reached the minimum value of 300μΩ cm at 5000 deposition cycles with a thickness of 87.04 nm. The surface roughness and morphology of the TiN films at different deposition cycles ranging from 50 to 400 were analyzed by Atomic Force Microscopy(AFM). The AFM results indicated that the initial film growth follows the Stranski-Krastanov mode.     

3D激光沉积增材制造TC4高应变率动态力学行为及本构关系研究

通过对3D激光沉积TC4在较宽温度（298~1 073 K）和应变率范围（0.001~5 000 s^-1）内的单轴压缩试验,系统研究了该材料的塑性流动行为,分析了材料的微观组织特性及其变形断裂微观机制.结果表明材料在压缩载荷下具有明显的应变率硬化和温度软化效应.在压缩加载条件下,材料的破坏模式为绝热剪切带的萌生和拓展,而初始缺陷成为诱导剪切带形成的主要原因.3D激光沉积TC4材料屈服强度与铸造TC4接近,略低于传统锻造TC4.文中基于位错动力学热激活理论建立了可以较好描述材料在不同温度不同应变率下的塑性流动行为物理概念的本构模型.