GaN纳米线的成核及生长机制研究

报道了利用CVD方法研究GaN纳米线的成核和生长机理的最新结果,着重强调了生长温度和催化剂对纳米线生长的影响。通过分析GaN纳 米线的形貌、显微结构与生长温度、催化剂等影响因素之间的依赖关系,详细研究了GaN纳米线的生长过程。这一结果有助于了解一维纳米结构的生长机理,实现纳米材料的可控制生长,并有可能直接应用于GaN纳米器件的制备。     

GaN基高电子迁移率晶体管器件的可靠性及退化机制研究进展

GaN基高电子迁移率晶体管（high electron mobility transistor,HEMT）器件在航天、通讯、雷达、电动汽车等领域具有广泛的应用,近年来成为电力电子器件的研究热点。在实际应用中,GaN基HEMT器件随着使用时间的延长会发生退化甚至失效的情况,器件的可靠性问题仍是进一步提高HEMT器件应用的绊脚石。因此,研究器件的可靠性及退化机制对于进一步优化器件性能具有极其重要的意义。将从影响器件可靠性的几个关键因素如高电场应力、高温存储、高温电场和重离子辐照等进行阐述,主要对近几年文献里报道的几种失效机制及相应的失效现象进行了综述和总结,最后讨论了进一步优化器件可靠性的措施,对进一步提高HEMT器件的应用起促进作用。     

TiO2-assisted GaN-nanowire-based stable ultraviolet photoelectrochemical detection

Ultraviolet photodetection plays an important role in optical communication and chemical- and bio- related sensing applications. Gallium nitride (GaN) nanowires-based photoelectrochemical-type photodetectors, which operate particularly in acqueous conditions, have been attracted extensive interest because of their low cost, fast photoresponse, and excellent responsivity. However, GaN nanowires, which have a large surface-to-volume ratio, suffer suffered from instability in photoelectrochemical environments because of photocorrosion. In this study, the structural and photoelectrochemical properties of GaN nanowires with improved photoresponse and chemical stability obtained by coating the nanowire surface with an ultrathin TiO₂ protective layer were investigated. The photocurrent density of TiO₂-coated GaN nanowires changed minimally over a relatively long operation time of 2000 s under 365-nm illumination. Meanwhile, the attenuation coefficient of the photocurrent density could be reduced to 49%, whereas it is as high as 85% in uncoated GaN nanowires. Furthermore, the photoelectrochemical behavior of the nanowires was investigated through electrochemical impedance spectroscopy measurements. The results shed light on the construction of long-term-stable GaN-nanowire-based photoelectrochemical-type photodetectors.     

激光溅射沉积制备的氮化镓表面形貌分析

利用激光溅射沉积工艺室温下在n型Si（111）基片上沉积氮化镓（GaN）薄膜，并用原子力显微镜对其表面形貌进行测量，分析了薄膜生长的动力学过程，发现其表面具有自仿射分形特征．通过对高度-高度相关函数的分析，得出在此工艺条件下GaN薄膜生长界面表现出明显的时间和空间标度特性，并且表现出较为明显的颗粒特征，粗糙度指数α随着生长时间的增加逐渐增大，生长指数β在0．42左右，薄膜生长在短时间内可以用Kuramoto-Sivashinsky模型来描述，当生长时间较长时，可以用Mullins扩散模型来描述。     

氮化镓薄膜研究进展

介绍了CaN薄膜材料的主要性质，制备工艺，掺杂，衬底和缓冲层等相关问题，并概述了GaN基器件的研究现状，提出了目前CaN研究中所面临的主要问题．     

硅基GaN蓝光LED外延材料转移前后性能

利用外延片焊接技术, 把Si(111)衬底上生长的GaN 蓝光LED外延材料压焊到新的Si衬底上. 在去除原Si衬底和外延材料中缓冲层后, 制备了垂直结构GaN 蓝光LED. 与外延材料未转移的同侧结构相比, 转移后的垂直结构GaN 蓝光LED的电学性能、发光性能和结构性能明显改善, 光输出功率显著提高. 垂直结构LED的GaN层受到的张应力比同侧结构LED小.     

GaN受激喇曼散射谱研究

对ＧａＮ样品薄膜进行了喇曼背散射几何配置下的喇曼散射测试与分析,其样品分别是在不同衬底上以金属有机物气相沉积（ＭＯＣＶＤ）法和分子束外延（ＭＢＥ）法生长的,观测到了纤锌矿结构ＧａＮ的允许模式Ａ１（ＬＯ）模和Ｅ２（高）模,同时也观测到了一些禁戒模式,结果表明：受激喇曼散射是研究ＧａＮ结构的一种有效手段。     

应用Mg离子注入获得高表面空穴载流子浓度P-型GaN

应用Mg离子注入MOCVD法生长掺杂Mg的GaN中,在经过800℃, 1h的退火后,获得高空穴载流子浓度(8.28×10¹⁷cm^-3)的P-型GaN。首次报道了实验上通过Mg离子注入到Mg生长掺杂的GaN中并获得高的表面空穴载流子浓度。     

负电子亲和势GaN光电阴极特性研究

分析了NEAGaN光电阴极的产生背景,介绍了NEAGaN光电阴极的结构以及工作模式,研究了GaN光电阴极的光电发射机理以及NEA特性的形成原因,P型GaN经过Cs、O处理后的有效电子亲和势约为一1．2eV。分析表明：充分激活后形成的双偶极层是表面真空能级降低的原因,体内产生的光电子按照光电发射的“三步模型”逸出到真空中。     

The impact of nanoporous SiN x interlayer growth position on high-quality GaN epitaxial films

The impact of nanoporous SiN x interlayer growth position on high-quality GaN epitaxial film was elucidated from the behavior of dislocations. The best quality GaN film was achieved when a nanoporous SiN x interlayer was grown on a rough layer, with the high-resolution X-ray diffraction rocking curve full width at half maximum for ( 1102 ) reflection decreasing to 223 arcs, and the total dislocation density reduced to less than 1.0×10 8 cm 2 . GaN films were grown on sapphire substrates by metal organic chemical vapor deposition. The quality of these films was investigated with high-resolution X-ray diffraction, atomic force microscopy, and cross-sectional transmission electron microscopy. A preference for the formation of half-loops to reduce threading dislocations was observed when an SiN x interlayer was grown on a rough layer. A growth mechanism is proposed to explain this preference.