纳米氧化锌薄膜的光致发光特性研究

本文报道了利用低压金属有机气相外延（LP－MOCVD）工艺首先在二氧化硅衬底上生长硫化锌（ZnS）薄膜，然后，将硫化锌薄膜在氧气中于不同温度下进行热氧化，制备高质量的纳米氧化锌（ZnO）薄膜。X－射线衍射（XRD）结果表明，氧化锌具有六角纤锌矿晶体结构，在900℃退火的样品的光致发光（PL）中，在长为3.3eV处观察到一束强紫外光致发光和相当弱的深能级发射，紫外发光强度与深能级发射强度之比是80，表明纳米ZnO薄膜的高质量结晶。     

ZnO纳米线的自催化生长、微结构和荧光特性

采用高温碳还原ZnO粉末获得了大量直径约为40 nm的ZnO纳米线.通过X射线衍射、光电子能谱、扫描电镜、透射电镜对其微结构特征进行了深入的研究.结果表明ZnO纳米线的生长机理不同于传统的气-固(Vapor-Solid,VS)生长模式,是典型的自催化气-液-固(Vapor-Liquid-Solid,VLS)生长模式,且反应过程中最初形成的液态纳米颗粒在ZnO纳米线的生长过程中起催化剂作用.荧光光谱表明ZnO纳米线中氧空位缺陷密度大,因而具有强可见光发射.     

Ni掺杂ZnO的结构、光学和磁学性质

利用溶胶-凝胶法制备了Zn1-xNixO(x=0.1 %,0.4 %,0.7 %,1.0 %)粉末,研究了样品的结构、光学和磁学性质.X射线衍射表明所有样品都具有纤锌矿结构,没有发现第2相.随着掺杂量的增加c轴晶格常数变小.X射线光电子能谱显示样品中的Ni离子处于+2价态.由紫外可见光吸收谱发现,随着掺杂量的增加能隙逐渐变小,证实了Ni2+对Zn2+的替代.由光致发光谱发现,在390 nm附近出现了由于近带边自由激子复合引起的紫外峰和以467 nm为中心宽带深能级发光带组成的由缺陷引起的较宽的蓝光.磁化强度测量表明,样品具有室温铁磁性,且随着掺杂浓度的增加,饱和磁化强度增加.当掺杂量为1.0 %时饱和磁化强度最大为0.076 μB/Ni.     

氧化锌薄膜的紫外光致发光的低能带尾发射

利用直流射频磁控溅射制备了氧化锌薄膜,测量了不同温度下的氧化锌薄膜的光致发光,氧化锌薄膜的室温紫外发射谱是由两个发射峰构成,峰的中心位置分别是在3．31和3．22eV,它们分别为自由激子发射和自由激子的一阶声子伴线(1-LO)．而在82K下,紫外发射谱是由光子能量分别在3．371eV,3．358eV,3．316eV,3．235ev和3．166eV峰组成．它们分别是自由激子,束缚激子和自由激子的一阶(1-LO)、二阶(2-LO)和三阶(3-LO)的声子伴线．根据变温光谱结果,我们提出室温下的紫外发射的低能带尾是来自自由激子的一阶声子(1-LO)伴线。     

Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm: Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide (a-Al2O3) thin films have been prepared by an alternative pulsed laser deposition. The phase structure and the surface of the deposited thin films were characterized by the X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. Effective photoluminescence (PL) in the region of 350-900nm was observed when pumped at 325nm, and the PL performance has been improved by modifying the Tm3 concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382nm and 500nm bands was improved effectively while that of 76Snm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm3 and Er3 play an important role in the evolution of the luminescent response.     

Ferroelectric, dielectric, and optical properties of Nd-substituted Bi4Ti3O12 nanoparticles synthesized by sol-gel method

This paper reports the synthesis of neodymium substituted bismuth titanate nanoparticles(BNdT) for ferroelectric random access memory(Fe RAM) based applications using sol-gel route. X-ray diffraction pattern showed that the BNdT nanoparticles exhibited perovskite structure with orthorhombic phase. The microstructure of the BNdT nanoparticles showed that the grains were in spherical structure with a bi-modal distribution of spheres. Dielectric constant and dielectric loss of BNdT nanoparticles were measured in the frequency range 100 Hz to 100 kHz. Nd-substituted BNdT nanoparticles showed the high remanent polarization(P_r=33.2 μC/cm~2, Ec=62.5 kV/cm) than pure bismuth titanate(BT)(P_r=14.6 μC/cm~2, Ec=182.8 kV/cm) ideal for FeRAM based applications. The occurrence of red shift in photoluminescence(PL) spectrum is considered to be due to the isomerisation that may occur from the heating of samples.     

Pulsed laser deposited Al-doped ZnO thin films for optical applications

Highly transparent and conducting Al-doped Zn O(Al:Zn O) thin films were grown on glass substrates using pulsed laser deposition technique.The profound effect of film thickness on the structural, optical and electrical properties of Al:Zn O thin films was observed. The X-ray diffraction depicts c-axis, plane(002) oriented thin films with hexagonal wurtzite crystal structure. Al-doping in Zn O introduces a compressive stress in the films which increase with the film thickness. AFM images reveal the columnar grain formation with low surface roughness. The versatile optical properties of Al:Zn O thin films are important for applications such as transparent electromagnetic interference(EMI) shielding materials and solar cells. The obtained optical band gap(3.2–3.08 e V) was found to be less than pure Zn O(3.37 e V) films. The lowering in the band gap in Al:Zn O thin films could be attributed to band edge bending phenomena. The photoluminescence spectra gives sharp visible emission peaks, enables Al:Zn O thin films for light emitting devices(LEDs) applications. The current–voltage(I–V) measurements show the ohmic behavior of the films with resistivity(ρ) 10-3Ω cm.     

ZnSe 纤锌矿纳米带及两相共存纳米线的制备和表征

采用简单的热蒸发方法,以ZnSe粉末合成了较均匀的纤锌矿的纳米带,及少量纳米线.纳米带有统一的宽度100～200 nm,长10～20μm,纳米带的生长遵循气—固的生长机制.纳米线存在立方相和六方相的相互转换,其直径约为30 nm左右.样品的光致发光显示出在2.00 eV较强的深能级发射峰,同时也可以观察到相对较弱的的位于2.66 eV的带边发射峰.     

掺杂钐的纳米二氧化钛粉体的制备和发光性质

采用溶胶凝胶法(sol-gel)制备了纯的和掺杂不同量Sm3 离子的纳米TiO2粉体,并测试了样品的X射线衍射谱(XRD)和荧光光谱(PL).讨论了不同热处理温度,不同掺杂浓度对Sm3 离子室温发射的影响.     

Luminescence Property of Phosphor Gd 3Ga 5O 12 :Ag

采取在不同的温度下烧结不同的时间方法制备了一种新型的兰色发学材料,用Ｘ光衍射对材料的结构进行了分析．并利用电子束蒸发的方法制备该材料的薄膜电臻发光器件．对该器件进行了光致发光,电致发光,亮度电压等发光性质进行了测试．得出器件亮度大约为２尼特