10MeV电子辐照GaAs Raman谱的研究

研究了１０ＭｅＶ电子辐照掺ＳｅＧａＡｓ外延层和半绝缘（ＳＩ）ＧａＡｓ的Ｒａｍａｎ测量．观察了几个相关缺陷的特征,认为２２０ｃｍ－１峰与Ａｓｉ相联系,这至少部份和ＥＬ２及ＥＬ１２缺陷有关．对掺Ｓｅ样品的２０４ｃｍ－１和２５８ｃｍ－１峰,可能和小砷簇的振动模式有关．而７７ｃｍ－１和１８５ｃｍ－１峰则应是由无序活化Ｒａｍａｎ散射引起的．辐照结果显示,小砷簇和无序态随辐照剂量增加而增加．本文还将讨论其它的有关的Ｒａｍａｎ峰     

光调制反射光谱实验研究

通过室温下GaAs的PR谱与ER谱的比较,对PR谱的机理及线型分析作了有益的讨论,结果表明,PR谱具有电场调制的本质,可以用电场调制理论中的“三点法”来确定各临界点参量.     

LaAlO_3/GaAs异质结界面的空穴导电行为分析

采用脉冲激光沉积方法在GaAs(001)单晶基片上生长LaAlO_3薄膜构成LaAlO_3/GaAs异质结,利用原子力显微镜和XRD对LaAlO_3/GaAs异质结进行表征,并通过PPMS对LaAlO_3/GaAs异质结进行面内电阻和霍尔电阻测试,研究其界面电输运性能。结果表明,LaAlO_3在GaAs表面生长均匀,LaAlO_3/GaAs异质结界面处存在空穴型的导电行为,且该空穴来源于界面处的悬空键效应。     

一款应用于LTE移动终端的射频功率放大器设计

基于WIN InGaP/GaAsHBT工艺,设计了一款应用于LTE移动终端的射频功率放大器。工作在AB类偏置状态,由三级放大电路级联构成,并带有温度补偿和线性化的偏置电路。芯片版图面积为1410×785μm2,电源电压为3.4V。仿真结果显示:功率增益大于30.1dB、1dB压缩点输出功率为31.2dB.m,在Band38(2570～2620)MHz内,输入回波损耗S11小于-15dB,S21大于30.1dB,输出回波损耗S22低于-25dB,1dB压缩点输出功率的功率附加效率高达36.6%。     

GaAs MMIC钝化层介质Si3N4的可靠性评价

在斜坡电压应力条件下对GaAsMMIC介质层Si3N4的击穿特性进行了测试,探讨了电容面积、周长以及斜率对与时间有关的介质击穿（TDDB）特性的影响．实验结果表明,电容面积越大,周长越长,介质中的缺陷就越多,其击穿电压也就越低,可靠性越差．根据TDDB线性电场模型,采用不同斜率的斜坡电压应力测试数据预测了正常工作电压下的Si3N4寿命．与温度加速实验相比,文中所提方法快速、成本低廉．     

InAs/GaAs量子点生长中应力分析

围绕InAs（InGaAs）/GaA叠层量子点电池的制作,本文通过文献研究和对近邻面生长实验研究认为,InAs/GaAs量子点生长形貌和特性受生长环境条件和生长条件影响。其中,客观、不可改变的外延层与衬底晶格常数、生长台面、超晶格结构等环境条件对量子点生长最为重要。这些环境条件通过生长应力,决定了量子点生长中的有序成核、生长、合并,直至出现缺陷的多晶体生长,其作用贯穿整个量子点生长过程。     

Photoconductive study and carrier dynamics of vertically aligned GaAs nanowires

Single wire devices are generally fabricated to study the electrical and photoelectric behaviors of semiconductor nanowires(NWs);however detriment or contamination can hardly be avoided during manipulation of NWs under focused ion and electron beams.This could not be a trivial factor for III-V NWs which are candidates for high efficiency solar energy harvesting and sensitive photodetection.In this study an alternative way to probe the photoconductive property of individual epitaxial GaAs NWs is presented.For the sample preparation,a uniform spin-coated layer of polymer was selected to be the supporting medium for the vertically aligned NWs structure;then the adequate thinning and polishing of the sample exposed the NW tip and also achieved the required height of NW.An external power adjustable laser was introduced as the excitation source,and the dark and photoconductive currentvoltage properties of individual NW were measured by the conductive atomic force microscopy.The typical Schottky style photoconductive behavior was observed in the vertically aligned GaAs NW,and its photoresponsivity has been found to be much higher than that of the reported for single NW photodetector.Finally,a numerical model based on the experimental setup was established to simulate the photoelectric behavior of individual NW.The minority hole lifetime has been found to dominate the photoconductive current-voltage properties of NW under the positive sample bias,and can be derived from the quantitative fitting of experimental photo-IV curves.     

砷化镓光导开关中流注辐射实验理论分析

分析了高增益砷化镓光导开关中流注一端的辐射复合实验现象,首次引入了单色光(890 nm)的辐射复合系数,导出了流注顶部的单色光自发辐射公式.比较理论计算结果与实验观测结果,两者很好符合,证明了流注顶部的单色光自发辐射模型的合理性.     

Raman spectroscopy of single quantum well wires

We used the micro-Raman spectroscopy to investigate the V-grooved quantum well wires (QWWs), and first observed and assigned the Raman spectra of single QWW. They were the disorder induced modes at 223 and 243 cm⁻¹, confined LO mode of GaAs QWW at 267 cm⁻¹, and higher order peaks of disorder induced modes at 488 and 707 cm⁻¹.     

表面S钝化技术与金属／GaAs界面异质结构

本文详细讨论了GaAs表面S钝化技术的发展过程，总结了近年来人们对S钝化技术的研究成果，并针对该技术在金属／GaAs异质结构领域的广泛应用前景进行了讨论。