提高大学生上课出勤率的工作方案探索

高校的学风建设对教育质量的提高有着重要作用,而大学生上课出勤率问题也越来越受到高校的关注.目前,大学生缺勤现象十分普遍,这一问题不仅影响了高校教学工作的正常开展与大学生专业知识水平的提高,而且对高校的声誉也造成不好的影响.因此,大学生的上课出勤率问题已成为高校教学与管理不能忽视的重要问题,对这一问题的研究越来越具有实际的意义.     

Annealing-induced interfacial toughening using a molecular nanolayer

Self-assembled molecular nanolayers (MNLs) composed of short organic chains and terminated with desired functional groups are attractive for modifying surface properties for a variety of applications. For example, organosilane MNLs are used as lubricants, in nanolithography, for corrosion protection and in the crystallization of biominerals. Recent work has explored uses of MNLs at thin-film interfaces, both as active components in molecular devices, and as passive layers, inhibiting interfacial diffusion, promoting adhesion and toughening brittle nanoporous structures. The relatively low stability of MNLs on surfaces at temperatures above 350-400 degrees C (refs 12, 13), as a result of desorption or degradation, limits the use of surface MNLs in high-temperature applications. Here we harness MNLs at thin-film interfaces at temperatures higher than the MNL desorption temperature to fortify copper-dielectric interfaces relevant to wiring in micro- and nano-electronic devices. Annealing Cu/MNL/SiO2 structures at 400-700 degrees C results in interfaces that are five times tougher than pristine Cu/SiO2 structures, yielding values exceeding approximately 20 J m(-2). Previously, similarly high toughness values have only been obtained using micrometre-thick interfacial layers. Electron spectroscopy of fracture surfaces and density functional theory modelling of molecular stretching and fracture show that toughening arises from thermally activated interfacial siloxane bridging that enables the MNL to be strongly linked to both the adjacent layers at the interface, and suppresses MNL desorption. We anticipate that our findings will open up opportunities for molecular-level tailoring of a variety of interfacial properties, at processing temperatures higher than previously envisaged, for applications where microlayers are not a viable option-such as in nanodevices or in thermally resistant molecular-inorganic hybrid devices.     

O2流量对O2/C4F8等离子体刻蚀SiCOH低k薄膜的影响

研究了O2/C4F8等离子体刻蚀SiCOH低k薄膜时O2流量对刻蚀率、表面结构的影响,及其放电等离子体特性的关联.发现O2流量的增大可以极大地提高多孔SiCOH薄膜的刻蚀速率,降低表面的粗糙度,减少SiCOH薄膜表面的C:F沉积.等离子体特性的光谱分析表明,O2的添加,增强了C与O之间的反应,从而在Si、F反应刻蚀Si的同时,C、O之间的反应使C消耗,实现Si、C的同步刻蚀,从而获得SiCOH低k薄膜的高刻蚀率和低粗糙度表面.     

Magnetic circuit optimization and experimental study of new internally excited automatic balancing

Mass imbalance-induced vibration affects the rotating machinery very large,especially the high-speed types.Off-line balancing techniques have been widely develo...     

基于协方差矩阵的主动学习方法及应用研究

由于工业过程采集的数据中常包含大量的无标签样本,而有标签样本数量少且人工标记成本较高,因此,提出一种基于协方差矩阵的主动学习方法。利用有标签样本建立高斯过程回归模型,并构建无标签样本之间的协方差矩阵,以协方差矩阵行列式的值作为评价指标。在挑选信息量较大的无标签样本的同时,衡量样本间的相似性,避免样本的冗余添加,最终在相同标记代价下提升模型预测精度。基于工业过程数据进行算法的应用仿真,验证了所提方法的可行性和有效性。     

基于HMM的多维数据下扶贫对象状态预测

针对扶贫领域中贫困、脱贫和返贫状态预测不准确,影响状态变迁的关键因素难以识别的问题,从扶贫基础数据和多个行业数据中提取8个关键特征和22个观测状态,构建观察状态和隐含状态关联关系,建立扶贫对象状态预测隐马尔可夫模型(hidden markov model,HMM)。以某深度贫困县连续3年的数据为样本,进行参数训练、测试实验和结果验证,结果表明该方法对返贫、贫困和脱贫状态有较强的预测能力,误差率较低,且能准确识别出影响返贫的关键要素。该方法对指导精准扶贫工作具有非常重要的实际意义。     

Nest structure and all stages of the long-cheeked yellow jacket Dolichovespula intermedia Birula (Hymenoptera: Vespidae)

Nest structure, morphology of all stages and behaviour have contributed to the phylogenetic and taxonomic studies of social vespids. Two aerial nests of Dolichovespula intermedia were discovered in China. The morphology of the three castes, the five larval instars, and the nest structure of D. intermedia Birula, are described in detail and illustrated. The presence of only one campaniform sensillum above each labial palp and the dense minute spicules on the posterior gena found in D. intermedia larvae are mentioned here for the first time for Dolichovespula. The identification characters between D. intermedia and Dolichovespula sylvestris are briefly discussed.