非均匀介质下的可调光流控器件及其生化应用

 探讨了非均匀介质下不同光流控器件及其生化应用。在微流控芯片上，主要从2个方面开发和实现各类具有光波导、透镜、细胞计数、化学检测等功能的新器件。首先，在液液非均匀介质下，通过调节沟道内液体流速，控制液体间的对流扩散来实现液体在微腔内的渐变折射率分布和阶跃分布，从而得到其特殊的光学特性，例如光束分离、弯曲、自聚焦等。其次，在固体非均匀介质下，利用特殊的微流结构与液体相结合，实现更加灵敏可调的新型探测手段。这些新型技术手段分别在生物传感、能源生产、细胞探测及海水检测等诸多应用中可发挥关键性作用。     

具有Logistic增长项的两种群竞争Keller-Segel模型的稳定性分析

应用线性化方法研究两种群竞争的Keller-Segel模型常数平衡解的个数及其稳定性问题.     

Simultaneous anti-windup synthesis for linear systems subject to actuator saturation

A synthesis method for global stability and performance of input constrained linear systems, which uses a linear outputfeedback controller and a static anti-windup compensator is investigated. Different from the traditional two-step anti-windup design procedure, the proposed method synthesizes all controller parameters simultaneously. Sufficient conditions for global stability and minimizing the induced L2 gain are formulated and solved as a linear matrix inequalities(LMIs) optimization problem, which also provides an opportunity to search for a better performance tradeoff between the linear controller and the anti-windup compensator.The well-posedness of the close-loop system is also guaranteed.Simulation results show the effectiveness of the proposed method.     

Predicting Initial Formation Temperature for Deep Well Engineering with a New Method

With the progress of science and technology, human beings explore the energy under-ground with thousands of meters. As a thermophysical parameter, initial formation temperature (IFT) plays an essential...     

Notch Effect and Frequency Compensation of Dual-Sensor OBC Data in Shallow Water

Reverberation is significant in shallow water and produces obvious notches in OBC spec-tra. It also degrades the quality of sections and increases the difficulty of processing and interpretation. This ...     

适用于混沌密钥分发的新误码协调方法

对于现有的密钥分发中的误码协调方法的复杂性和多次传输的问题，使用倒三角类坐标定位法来解决。将所得裸钥放置于下三角矩阵中，三边分别进行奇偶比较并互相传输计算结果，以达到定位错误比特位的目的。使用互注入光反馈激光器产生相关性高的混沌态来提取裸钥，通过该协调方法，最终可以达到10－8～10－10量级的误码率。通过该方法可以简单、有效地删除裸钥中的误码，满足现实通信对误码率的容忍度。     

三维打印器件后处理液研究

分析了不同的填充强化剂(后处理A液)、不同的后处理B液基料、后处理B液中水性环氧乳液的掺量及后处理液浸泡时间对石膏基打印器件耐水性、抗压强度、尺寸偏差、表面微观结构的影响.结果表明:经纳米硅超硬固化剂处理后的打印器件抗压强度大幅提高,纳米硅超硬固化剂最适宜作为后处理A液;水性聚氨酯乳液PU-202B最适宜作为后处理B液的基料;后处理B液中加入水性环氧乳液,处理后打印器件的抗压强度增加、吸水率降低,但水性环氧乳液含量增加到一定程度后会出现尺寸偏差;后处理A、B液最佳浸泡时间分别为130 s和35 s;先浸泡后处理A液、后浸泡后处理B液的打印器件具有抗压强度高、吸水率小、表面较光滑、不脱粉等优良性能.