探究压强对折射率的影响

本实验利用光干涉的原理来观测空气的折射率,并通过迈克尔逊干涉仪研究压强对折射率的影响。本次实验,原理简洁易懂,方法简单科学,并能使学生进一步掌握光的干涉原理。     

基体温度和氩气压强对射频磁控溅射制备GZO薄膜性能的影响

采用射频磁控溅射方法,用Ga2O3含量为1%的ZnO做靶材,在不同基体温度和不同溅射压强的条件下制备了高质量的GZO透明导电薄膜.结果表明:基体温度和氩气压强对GZO薄膜的晶体结构、光电性能有较大影响.当温度为500℃,溅射气压为0.2Pa时制备的GZO薄膜光电性能较优,方块电阻为7.8Ω/□,电阻率为8.58×10-4Ω.cm,可见光的平均透过率为89.1%.     

确定薄膜折射率和厚度的波长法

提出一种只需测量垂直入射和斜入射的两条光谱曲线,就能分别确定薄膜的折射率 n(λ)和厚度的方法.该方法在薄膜的消光系数 k~2n~2时适用,精度优于1%.     

溅射压强对柔性PET衬底ZnO薄膜性能的影响

利用直流磁控溅射法,在室温水冷柔性PET衬底上成功制备出了掺钛氧化锌(ZnO:Ti,TZO)透明导电薄膜。通过X射线衍射(XRD)研究了薄膜的结构,用扫描电镜(SEM)研究了薄膜的表面形貌,用四探针和紫外-可见分光光度计等仪器对薄膜的特性进行测试分析,研究了溅射压强对ZnO:Ti薄膜表面结构、形貌、力学、电学和光学性能的影响。结果表明,溅射压强对PET衬底上的TZO薄膜的性能有显著的影响,实验制备的ZnO:Ti薄膜为具有C轴择优取向的六角纤锌矿结构的多晶薄膜;当溅射压强从2Pa增加到4Pa时,薄膜的电阻率由10.87×10-4Ω.cm快速减小到4.72×10-4Ω.cm,随着溅射压强由4Pa继续增大到6Pa,薄膜的电阻率变化平缓,溅射压强为5Pa时薄膜的电阻率最小,为4.21×10-4Ω.cm;经计算得到6Pa时样品薄膜应力最小,为0.785 839GPa;所有样品都具有高于91%的可见光区平均透过率。     

椭圆偏振仪测量薄膜厚度和折射率

文章通过对椭偏仪测量原理的分析给出了四区平均消光状态下的计算公式,利用该公式计算在一个周期内的薄膜厚度和折射率结果较好;同时给出了膜厚大于一个周期时的计算方法。     

沉积温度对BC2N薄膜的生长和附着性的影响

应用热丝辅助射频等离子体化学气相沉积法在硅、金刚石衬底上合成了BC2N薄膜,X－射线衍射、红外谱分析表明较高的温度有利于BC2N化合物的成核和生长。高温制备的薄膜的化学组分主要为BC2N,B,C和N原子间互相结合成键,但与硅衬底的附着力很差。选择热膨胀系数与硅接近的金刚石作为过渡层沉积BC2N多层膜,逐层提高生长温度,不仅提高生长温度,不仅提高了薄膜中BC2N的含量,而且提高了薄膜与衬底的粘 附力。     

波导薄膜折射率测量方法研究

本文讨论了四种测量波导薄膜的有效方法,对各种测量方法作了分析研究,并着重对棱镜耦合法进行了实验研究。     

浅论气体压强对金刚石薄膜质量的影响

以甲烷、氢气做为气源,利用微波等离子气相沉积的方法在硅片上沉积金刚石薄膜。研究了不同压强对金刚石薄膜质量的影响。结果表明当气氛压强为9KPa时可获得高质量的金刚石薄膜。     

沉积温度对类金刚石薄膜性能的影响

液相法制备工艺简单、成本低等,已成为制备类金刚石薄膜的热点方法,但适合工业化生产的制备工艺参数尚不明确。以Si单晶为基底,通过液相沉积法在Si表面制备类金刚石薄膜,研究了沉积温度与其摩擦学性能之间的关系。结果表明:在40℃条件下制备的类金刚石薄膜表面光滑平整、硬度最高。此时类金刚石薄膜的干摩擦系数最小,耐磨性最强,具有良好的摩擦学性能。     

低温下超薄膜分形生长的Monte-Carlo模拟

用 Monte-Carlo方法模拟了不同沉积速率下超薄膜中多粒子扩散、多中心生长的动力学过程。成核率随沉积速率的增大呈指数上升 ,成核率随时间的增大而迅速下降 ;对于确定的沉积速率 ,各个粒子在衬底上的扩散步数相差非常大 ;粒子按扩散步数的分步具有多重分形的特性。     

室温下Ba0.67Sr0.33TiO3薄膜的射频磁控溅射法制备及其电学性能研究

采用磁控溅射技术在室温下制备Ba0.67Sr0.33TiO3薄膜,通过引入LaNiO3作为缓冲层以及对退火工艺的研究,采用两步法快速退火工艺与常规退火工艺结合的方式获得了致密并具有良好电学性能的钛酸锶钡薄膜.X线衍射分析表明室温情况下获得的薄膜是非晶态,需要通过后续的退火处理才能获得晶化的薄膜,采用快速退火与常规退火相结合工艺,即以40℃/s的升温速率,先升温到850℃,再降温到450℃保温180s,然后再在500℃常规退火3h,可使室温下溅射的呈非晶态的BST薄膜晶化形成具有完全钙钛矿结构的BST薄膜,薄膜致密,晶粒大小均匀.室温下所制备的BST薄膜在100Hz时的介电常数约为300,介电损耗约为0.03,具有铁电性.     

TM polarization characteristics on thermal radiation of a negative refractive index thin film

Thermal radiation TM polarization characteristics of a negative refractive index thin film was studied based on the transmit matrix method and Kirchhoff radiation law. The influence of the thin film parameters on the thermal radiation directional characteristics and spectral property were discussed. And the influence of the evanescent waves was also discussed. The results show that two factors play important roles in the thermal radiation of negative index thin film: one is the interference effect of the thin film structure to the electromagnetic waves; the other is the photon tunneling effect of the negative refractive index material, which was caused by the amplifying evanescent wave. These indicate that spectral and directional characteristics of the thermal emissivity can be modulated by modifying the structure and the physics parameters of the negative refraction index thin film. Supported by the National Natural Science Foundation of China (Grant No. 50606003) and Aeronautic Science Foundation of China (Grant No. 2007ZA51006)     

CVD法TiO2薄膜的制备条件及光学性质的研究

以四异丙醇钛为钛源物质,采用常压化学气相沉积法制备了ＴｉＯ２膜,并对其光学性质进行了研究。实验结果表明,：沉积条件是影响ＴｉＯ２膜的沉积率和光学性质的重要因素。     

退火温度对CH3NH3PbI3薄膜结构和性能的影响

采用真空双源共蒸发技术制备了CH_3NH_3PbI_3薄膜,研究了退火温度对CH_3NH_3PbI_3薄膜结构和性能的影响。利用XRD、原子力显微镜、紫外—可见—近红外分光光度计和霍尔效应仪研究了CH_3NH_3PbI_3薄膜的微观结构和光电性能。研究结果表明:合适的退火温度(95℃)有助于薄膜结晶度的提高,利于晶粒长大,使得晶界减少,界面处缺陷度较低,带电粒子迁移率提高。退火温度超过100℃时,薄膜热稳定性急聚下降,使CH_3NH_3PbI_3分解,部分I-以CH3NH3I的形式挥发,产生大量过剩Pb I2相,导致薄膜载流子浓度降低,导电性能下降。退火后的薄膜在可见光区域内吸收系数提高。退火温度为95℃时,薄膜禁带宽度1.66 e V最小,最接近理论值1.55 e V。     

沉积温度对磁控溅射镀钌薄膜微观结构和附着力的影响

采用中频磁控溅射技术在钼圆片表面镀覆钌薄膜,通过X射线衍射仪、扫描电镜、平整度仪、宏观浸蚀试验和百格测试等对镀层进行表征和检测,研究不同沉积温度对薄膜微观结构和附着力的影响。结果表明,随着沉积温度由室温升至200℃,钌薄膜的表面平整性和致密性逐步改善,附着力得以提高;200℃沉积薄膜的膜/基结合力最大,其微观结构、致密性等也均达到最优;但当沉积温度进一步提高到300℃时,钌薄膜的表面起伏反而增大,附着力有所下降。     

Synthesis and characterization of cerium sulfide thin film

Cerium sulfide(Cex Sy)polycrystalline thin film is coated with chemical bath deposition on substrates(commercial glass).Transmittance,absorption,optical band gap and refractive index are examined by using UV/VIS.Spectrum.The hexagonal form is observed in the structural properties in XRD.The structural and optical properties of cerium sulfide thin films are analyzed at different p H.SEM and EDX analyses are made for surface analysis and elemental ratio in films.It is observed that some properties of films changed with different p H values.In this study,the focus is on the observed changes in the properties of films.The p H values were scanned at 6–10.The optical band gap changed with p H between 3.40 to 3.60 e V.In addition,the film thickness changed with p H at 411 nm to 880 nm.     

中频等离子体化学气相沉积法制备ZnO薄膜

ZnO是一种多功能材料,目前处于世界范围的研究热潮中。为了拓展和改善ZnO的应用,采用中频等离子体化学气相沉积法(MF-PCVD)制备了ZnO薄膜,并研究了衬底温度对晶型和成膜速率的影响．     

Magnetoresistance of the thin film ferromagnetic nanoconstrictions

The magnetoresistance and I-V characteristics at different temperatures of the thin film ferromagnetic nanoconstrictions of variable width (from 20 to 250 nm) and 10 nm thicknesses, fabricated by electron beam lithography and vacuum thin film deposition are compared. The magnetoresistance and resistance of the thin film ferromagnetic nanoconstrictions are not related to the width of the nanoconstrictions. Instead the resistance of the local nano-region in the middle of the thin film ferromagnetic nanoconstriction has only a minor role compared to that of the two microscale thin film ferromagnetic electrodes, which contribute the majority of the measured resistance. The magnetoresistances of the thin film ferromagnetic nanoconstrictions and a 0.2 cm × 0.8 cm thin ferromagnetic film deposited under the same conditions were also compared; the thin film ferromagnetic nanoconstrictions have higher magnetoresistances than the thin ferromagnetic film, which implies that the measured magnetoresistance of the thin film ferromagnetic nanoconstrictions comes mainly from the local nano-region in their centers. In conclusion, the measured magnetoresistance of the whole sample is similar to the anisotropic magnetoresistance, because the resistance of the two microscale thin film ferromagnetic electrodes is much higher than that of the local nano-region in the middle of the samples. Comparing the experimental results for the thin film ferromagnetic nanoconstrictions and the thin ferromagnetic film reveals that the magnetoresistance of the local nano-region in the middle of the sample is much higher than that of the two microscale thin film ferromagnetic electrodes attached to it.