An atomic level study on the out-of-plane thermal conductivity of polycrystalline argon nanofilm

At present, there have been few direct molecular dynamics simulations on the thermal conductivity of polycrystalline nanofilms. In this paper, we generate polycrystalline argon nanofilms with random grain shape using the three-dimensional Voronoi tessellation method. We calculate the out-of-plane thermal conductivity of a polycrystalline argon nanofilm at different temperatures and film thicknesses by the Muller-Plathe method. The results indicate that the polycrystalline thermal conductivity is lower than that of the bulk single crystal and the single-crystal nanofilm of argon. This can be attributed to the phonon mean-free-path limit imposed by the average grain size as well as the grain boundary thermal resistance due to the existence many grain boundaries in polycrystalline materials. Also, the out-of-plane thermal conductivity of the polycrystalline argon nanofilm is insensitive to temperature and film thickness, and is mainly dominated by the grain size, which is quite different from the case of single-crystal nanofilms.     

Fe-Al_2O_3纳米颗粒膜的巨磁电阻效应及微结构

采用磁控溅射方法在玻璃基片上制备了一系列的 Fe- Al2 O3 颗粒膜样品 ,对样品的巨磁电阻效应 (GMR)和磁性能进行了测量 ,并用高分辨电镜 (HRTEM)对膜中 Fe颗粒的微结构进行观察 .结果表明 :磁电阻 MR随 Fe含量而变化 ,在体积分数为 47%时获得最大值 4.0 % .45 % Fe-Al2 O3 颗粒膜的室温磁性表现为超顺磁性 ,磁电阻 MR与 - (M/Ms) 2 成正比 ,相关常数 A≈ 0 .0 3 6 .HRTEM观察表明 ,当 Fe颗粒尺寸约小于 1 nm时 ,Fe颗粒为非晶态 ,而大于该尺寸时则为晶态 .在 Fe- Al2 O3 颗粒膜体系中存在与隧道相关的 GMR,GMR的起因可归于传输电子的自旋相关的散射     

Hardness of Mn_2V_2O_7 thin films and its influential factors

Mn2V2O7 thin films were deposited onto amorphous glass substrates using a chemical bath deposition method and different deposition time. X-ray diffraction(XRD) analysis was used to define the structure of the films. Their roughness, thickness, and surface properties were evaluated through atomic force microscopy(AFM). The hardness of the films was measured using a nanohardness tester. The film thickness, average grain size, and roughness were positively correlated with each other. These three parameters were observed to increase with the deposition time. The film thickness and average grain size were inversely correlated with the hardness and roughness. In addition, the number of crystallites per unit area and the dislocation density were observed to be positively correlated with the hardness and roughness. This study was designed to elucidate and formalize the underlying reasons for these relationships.     

Hardness of Mn2V2O7 thin films and its influential factors

Mn2V2O7 thin films were deposited onto amorphous glass substrates using a chemical bath deposition method and different deposition time. X-ray diffraction (XRD) analysis was used to define the structure of the films. Their roughness, thickness, and surface properties were evaluated through atomic force microscopy (AFM). The hardness of the films was measured using a nanohardness tester. The film thickness, average grain size, and roughness were positively correlated with each other. These three parameters were observed to increase with the deposition time. The film thickness and average grain size were inversely correlated with the hardness and rough-ness. In addition, the number of crystallites per unit area and the dislocation density were observed to be positively correlated with the hardness and roughness. This study was designed to elucidate and formalize the underlying reasons for these relationships.     

a-Si:H薄膜固相晶化法制备大晶粒多晶硅薄膜

用等离子体化学气相沉积（PCVD）法制备：a－Si：N薄膜材料（衬底温度20O℃～350℃），用固相晶化法（SPC）获得多晶硅薄膜（退火温度500℃～650℃）,用X射线衍射法测得平均晶粒尺寸依赖于退火温度和沉积条件，随着沉积温度的降低需要较高的退火温度,用SEM观测形貌测得平均晶粒大小为1,0～1,5μm     

TiN晶体尺寸与其力学性能的第一性原理研究

 纳米多晶体材料因其独特的力学性能而成为当前材料科学领域的研究热点之一,尤其是晶粒尺寸对其力学性能的影响倍受关注。本文采用基于密度泛函理论的第一性原理方法,模拟计算了晶粒尺寸为0.6387—2.332nm的TiN的力学性能,得到应力应变关系及屈服强度。计算结果表明,随着晶粒尺寸的增加,TiN的屈服强度降低,晶粒呈现软化趋势。通过对应力-应变曲线分析可知：TiN在应变5%处开始屈服,其屈服强度大约为21.5GPa;抗拉强度发生在应变约为15%时,且随着晶粒尺寸的增加,抗拉强度降低。本文对照了屈服极限的计算值和有限元方法的拟合值,讨论了实验中TiN表面的微观结构与硬度、弹性模量的关系。研究表明,TiN试样中的缺陷对其硬度和强度有很大影响。     

含He纳米钛膜的XRD研究

本文采用直流磁控溅射方法,在He／Ar混合气氛中,通过分别改变He／Ar流量比和沉积偏压制备不同He含量的钛膜.利用XRD(X-ray diffraction)对含He钛膜的微观结构和晶粒尺寸进行了研究.结果表明,在其它实验参数不变的情况下,当He／Ar流量比从1.0增加到25时,钛膜的平均晶粒尺寸从19.02 nm减小到8.63 nm.随着膜中He含量的增加,衍射峰宽化,晶粒细化,He的掺入有抑制纳米晶粒长大的趋势.而当沉积偏压从24 V增加到151 V时,其平均晶粒尺寸基本不变.He引入引起了（002     

Ag/FePt/C薄膜的结构和磁性

采用直流和射频磁控溅射在Si(001)基片上制备Ag/FePt/C薄膜,并将其在不同温度下进行真空热处理,得到了具有高矫顽力的L10-FePt薄膜.利用X射线荧光(XRF)、X射线衍射(XRD)和振动样品磁强计(VSM)研究样品的成分、结构和磁性.结果表明,样品经400℃热处理后发生了无序—有序相转变,以Ag元素为底层可降低有序化温度,添加Ag和C可抑制晶粒生长.随着热处理温度的升高,FePt的晶粒尺寸和矫顽力逐渐增大,经600℃热处理后,样品中FePt的平均晶粒尺寸为14nm,垂直膜面和平行膜面的矫顽力分别为798.16kA/m和762.35kA/m.     

含He纳米钛膜的XRD研究

本文采用直流磁控溅射方法,在He／Ar混合气氛中,通过分别改变He／Ar流量比和沉积偏压制备不同He含量的钛膜。利用XRD(X-ray diffraction)对含He钛膜的微观结构和晶粒尺寸进行了研究。结果表明,在其它实验参数不变的情况下,当He／Ar流量比从1.0增加到25时,钛膜的平均晶粒尺寸从19.02nm减小到8.63nm。随着膜中He含量的增加,衍射峰宽化,晶粒细化,He的掺入有抑制纳米晶粒长大的趋势。而当沉积偏压从24V增加到151V时,其平均晶粒尺寸基本不变。He引入引起了（002）晶面衍射峰向小角度移动,晶格参数c增加,而a不变。     

用EXCEL计算沉积物粒度分布参数

介绍了用ＭｉｃｒｏｓｏｆｔＥｘｃｅｌ软件对平均值、标准差、偏度和尖度等沉积物粒度分布参数进行统计计算（矩法计算）的方法,包括函数的调用和具体操作过程。该方法操作简单、快捷,使过去完全无法对大量样品进行的粒度参数统计计算变得极其容易。在计算速度、可靠性、适用性以及绘图功能等方面,用Ｅｘｃｅｌ对沉积物进行粒度分布参数的统计计算都显著优于图解法粒度计算和各种用于粒度分析的图像分析系统。此外,该方法也可用于油层物理研究中的孔隙和喉道分布参数的计算。