Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm:Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide （a-Al2O3） thin films have been prepared by an alternative pulsed laser deposition. The phase structure and the surface of the deposited thin films were characterized by the X-ray diffraction （XRD） and scanning electron microscopy （SEM）, respectively. Effective photoluminescence （PL） in the region of 350-900 nm was observed when pumped at 325 nm, and the PL performance has been improved by modifying the Tm^3＋ concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382 nm and 500 nm bands was improved effectively while that of 765 nm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm^3＋ and Er^3＋ play an important role in the evolution of the luminescent response.     

Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm:Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide (a-Al2O3) thin films have been prepared by alternative pulsed laser deposition. The phase structure and surface of the deposited thin films were characterized by the X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. Effective photoluminescence (PL) in the region of 350-900 nm was observed when pumped at 325 nm, and the PL performance has been improved by modifying the Tm³⁺ concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382 nm and 500 nm bands was improved effectively while that of 765 nm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm³⁺ and Er³⁺ play an important role in the evolution of the luminescent response.     

Effects of substrate temperature and ambient oxygen pressure on growth of Ba(Fe1/2Nb1/2)O3 thin films by pulsed laser deposition

Ba(Fe1/2Nb1/2)O3 thin films were grown on Pt/TiO2/SiO2/Si substrates with pulsed laser deposition (PLD) at temperatures ranging from 823 to 923 K with the varied ambient oxygen pressure. X-ray diffraction (XRD) data confirmed the single phase of polycrystalline Ba(Fe1/2Nb1/2)O3 thin films. The effects of substrate temperature and ambient oxygen pressure on the surface morphologies of the thin films were investigated by atomic force microscopy (AFM) and the growth dynamics of thin films was discussed. Larger grains and denser surface morphologies were observed with increasing substrate temperature. While finer grains were produced with increasing ambient oxygen pressure due to more frequent collisions between the ejected species and ambient oxygen molecules. The influence of the substrate temperature and ambient oxygen pressure on the dielectric properties was also discussed. Improved dielectric constant and decreased dielectric loss was observed for the thin film deposited at evaluated temperature.     

静电辅助的气溶胶化学气相沉积法制备Y2O3薄膜

采用静电辅助的气溶胶化学气相沉积的方法成功地在Si(100)衬底上制备了Y2O3薄膜,利用X射线衍射(XRD)、场发射扫描电镜(FE-SEM)、原子力显微镜(AFM)和X射线光电子能谱(XRP)对薄膜进行了表征.SEM分析结果显示,薄膜的颗粒为纳米级的,并且薄膜致密、平整.AFM分析结果表明,薄膜的粗糙度为11nm.由XPS分析可知,薄膜为基本上符合化学计量比的氧化物.附着力测试表明,Y2O3薄膜与Si衬底的附着力为4.2N.X射线衍射分析结果表明,沉积得到的Y2O3薄膜在热处理前为非晶结构,热处理之后薄膜具有立方晶体结构,并且沿(111)面择优生长.     

溅射功率对氧化铝薄膜结构和光学性能的影响

采用射频反应磁控溅射法,在K9双面抛光玻璃基底上制备了一系列不同溅射功率的Al2O3薄膜,并对部分薄膜进行退火处理.利用X线衍射法对Al2O3薄膜退火前后的晶体结构进行分析,采用椭圆偏振光谱仪对薄膜的厚度、折射率和消光系数进行测试和拟合.实验结果表明:测射功率在100~300 W时,沉积的Al2O3薄膜退火前后均为非晶态;薄膜在可见光范围内具有良好的透光性能,透射率接近90%,为透明膜;薄膜的沉积速率随溅射功率的增大而增大;薄膜在可见光波段的折射率n随波长的增大而减小,平均值随溅射功率的增大呈现出先增大后减小的变化趋势;薄膜消光系数k的平均值亦随溅射功率的增大呈现先增大后减小的变化趋势.     

溅射沉积TiO_2薄膜结构及性能的基础研究

采用超高真空反应射频磁控溅射方法,利用高纯Ti靶在光学玻璃基底上制备具有一定厚度的TiO2薄膜样品.通过扫描探针显微镜对其表面形貌进行观测和分析,利用XRD初步探讨了退火对薄膜结构及其透射率的影响,并研究了不同O2/Ar流量比对薄膜沉积速率的影响.     

沉积方式对HfO2薄膜激光损伤阈值的影响

分别采用电子束蒸镀、离子束辅助沉积、离子束反应辅助沉积、双离子束溅射技术制备了二氧化铪薄膜,研究了薄膜的光学特性、缺陷、残余应力、弱吸收和抗激光损伤阈值.发现离子束反应辅助沉积的二氧化铪薄膜具有低的缺陷密度和高的损伤阈值;双离子束溅射的二氧化铪薄膜具有高的折射率、高的残余应力和低的损伤阈值.对二氧化铪薄膜的损伤阈值与上述特性之间的依赖关系进行了讨论,发现残余应力是影响薄膜抗激光损伤阈值的一个重要原因.     

PLD制膜过程中等离子体羽辉演化的模拟

在建立脉冲激光沉积综合统一理论模型的基础上，进一步研究了制备了KTa0.65Nb0.35O3(KTN)薄膜过程中等离子体的空间演化规律，用有限差分法得到等离子体的速度在等温阶段和热阶段两个阶段的变化规律，并对这两个阶段粒子速度空间演化的物理机制进行了深入讨论，给出了相应演化过程的物理图像。     

铈锰铽激活硼酸镁的光致发光

研究不同组成铈锰铽激活硼酸镁的发射光谱和激发光谱表明:只含Mn~(2+)的硼酸镁发光很弱;Ce~(3+)能很好地吸收254nm紫外光并能把能量传递给Mn~(2+),Ce~(3+)→Mn~(2+)能量传递效率最高可达99.8％,从而获得发明亮红光的荧光粉。Ce~(3+)→Mn~(2+)能量传递的机理为共振传递。铈锰铽共激活的硼酸镁中,Tb~(3+)和Mn~(2+)都有较高的发光效率,增加Tb~(3+)浓度使色坐标x值降低,y值升高;相反,增加Mn~(2+)浓度使色坐标x值升高、y值降低,改变Tb~(3+)、Mn~(2+)的浓度可调整荧光粉发光的颜色。     

靶衬间距对脉冲激光沉积薄膜均匀性的影响

以国产脉冲激光沉积设备(PLD-Ⅲ型)在玻璃衬底上沉积Ti O2薄膜为例,研究了PLD法制膜过程中靶衬间距对薄膜均匀性的影响.实验过程中,以Ti O2陶瓷片作为靶材,玻璃作为衬底,保持其他工艺条件(如单脉冲能量、脉冲频率、沉积脉冲总数、衬底温度等)不变,专门考察了不同靶衬间距下,Ti O2薄膜在整个衬底台平面区域的沉积分布状况.结果表明,按样品的表观灰度划分,薄膜沉积的相对均匀区可分为2～3个轴对称区域,分别对应不同的沉积速率和厚度;在一定范围内调节靶衬间距(3.00～7.00 cm),可使高速率沉积区逐渐由轴对称的圆环状变为中心大圆斑(直径约2.20 cm).结合PLD沉积原理与靶衬之间的几何关系,分析了导致上述结果的机理.     

镍基高温合金表面激光熔覆制备A12O3-TiO2陶瓷涂层

利用不同工艺辅助激光熔覆技术制备了Al2O3-TiO2陶瓷涂层,以判断激光熔覆制备陶瓷涂层的可行性.结果表明:利用激光熔覆技术直接制备陶瓷层存在一定难度,陶瓷层裂纹较大,存在剥落现象;采用基底预热辅助激光熔覆法制备的陶瓷层整体脱落,可行性较差;结合冷等静压与高频表面预热技术进行激光熔覆陶瓷层试验,制备的陶瓷层表面光滑平...     

Effect of Al2O3 on the viscosity of CaO-SiO2-Al2O3-MgO-Cr2O3 slags

We investigated the effect of Al2O3 content on the viscosity of CaO-SiO2-Al2O3-8wt%MgO-1wt%Cr2O3(mass ratio of CaO/SiO2 is 1.0,and Al2O3 content is 17wt%-29wt%)slags.The results show that the viscosity of the slag increases gradually with increases in the Al2O3 content in the range of 17wt%to 29wt%due to the role of Al2O3 as a network former in the polymerization of the aluminosilicate structure of the slag.With increases in the Al2O3 content from 17wt%to 29wt%,the apparent activation energy of the slags also increases from 180.85 to 210.23 kJ/mol,which is consistent with the variation in the critical temperature.The Fourier-transform infrared spectra indicate that the degree of polymerization of this slag is increased by the addition of Al2O3.The application of Iida’s model for predicting the slag viscosity in the presence of Cr2O3 indicates that the calculated viscosity values fit well with the measured values when both the temperature and Al2O3 content are at relatively low levels,i.e.,the temperature range of 1673 to 1803 K and the Al2O3 content range of 17wt%-29wt%in CaO-SiO2-Al2O3-8wt%MgO-1wt%Cr2O3 slag.     

靶材制备工艺与配比对ZrW2O8薄膜制备的影响

分别采用钨酸锆靶（ZrW2O8）和氧化锆（ZrO2）与氧化钨（WO3）的复合靶,在磁控溅射条件下制备钨酸锆（ZrW2O8）薄膜,研究了靶材制备工艺、复合靶成分配比以及热处理温度对薄膜成分的影响,并对薄膜生长方式进行了初步探讨．结果表明：ZrW2O8靶材制备的薄膜在700℃处理后薄膜中ZrW2O8纯度较高,相同配比下,复合靶制备的薄膜经750℃处理后薄膜中ZrW2O8含量最高;以凡（ZrO2）：n（WO3）为1：2．8的复合靶材制备的薄膜经热处理后,结晶度优于凡（ZrO2）：n（WO3）为1：2获得的薄膜,并且ZrW2O8最佳含量的热处理温度较低;热处理时薄膜的生长机制为岛状生长方式;ZrW2O8薄膜在（211）和（220）晶面上的热膨胀系数均为负值．     

强激光冲击波作用下Al2O3陶瓷材料的断裂特征

使用激光冲击对Al2O3陶瓷进行了冲击试验,并通过扫描电子显微技术,对陶瓷材料在强激光冲击下的断口形貌进行了分析．发现随激光能量的变化。陶瓷出现不同的断裂特征．在高能量激光冲击下,试样宏观上出现中心裂纹,其微观主要仍以沿晶断裂和穿晶解理所形成的脆性断裂模式为主;但在激光能量降低到一定程度的情况下,脆性陶瓷材料在拉伸波作用下出现锥形断裂,而微观上也出现一定的塑性滑移特征,主要表现为晶界处出现大量的滑移线;在更低能量下陶瓷未出现破裂,硬度分析结果显示具有微观塑性变形强化现象．     

Al2O3对碱硅酸反应的影响

采用分析纯Al2O3和烧铝矾土,以玻璃砂为活性骨料,通过测定砂浆棒的膨胀率及用能谱仪分析砂浆棒中C-S-H凝胶的组成,研究了Al2O3对碱硅酸反应的影响,并分析了其机理.结果显示,Al2O3对碱硅酸反应也有较好的抑制作用.其机理可能为Al3+对C-S-H中Si4+的取代作用加强了C-S-H对碱的结合能力.     

脉冲激光制膜技术烧蚀阶段的热特性研究

研究了用脉冲激光制备薄膜时激光烧蚀靶材的的全过程.从能量平衡原理出发,考虑气化带走热量的影响,分阶段地建立了含有气化项与热源项的适合于不同烧蚀阶段的热流方程,给出了相应的初始条件和边界条件.以单晶硅为例,用有限差分法进行模拟计算,得到了靶材在各个阶段温度随时间以及气化速度随时间的演化规律.结果表明,靶材熔融前(0相似文献   

SiO2对重力分离-SHS法制备Al2O3/Fe复合管组织的影响

采用重力分离-自蔓延高温合成(Self-propagating High-temperature Synthesis，简称SHS)法制备了Al2O3／Fe陶瓷内衬复合管。分析了添加剂SiO：对复合陶瓷层的相组成、陶瓷层的表面质量以及对Al2O3／Fe过渡层的影响。XRD分析表明，陶瓷层主晶相为α-Al2O3、FeAl2O3，加入SiO2后可形成Al2SiO3硅线石。SEM观察发现，SiO2的加入量过多会降低过渡层的质量，使过渡层变薄，结合形式由冶金结合变为机械结合。     

Bonding characteristics of the Al2O3-metal composite coating fabricated onto carbon steel by combustion synthesis

The fabrication of an alumina-metal composite coating onto a carbon steel substrate by using a self-propagating high-temperature synthesis technique was demonstrated. The effects of the type and thickness of the pre-coated layer on the binding structure and surface quality of the coating were systematically investigated. The macrostructure, phase composition, and bonding interface between the coating and the substrate were investigated by scanning electronic microscopy (SEM), X-ray diffraction (XRD), and energy-dispersive X-ray spectrometry (EDS). The diffraction patterns indicated that the coating essentially consisted of α-Al₂O₃, Fe(Cr), and FeO·Al₂O₃. With an increase in the thickness of the pre-coated working layer, the coating became more smooth and compact. The transition layer played an important role in enhancing the binding between the coating and the substrate. When the pre-coated working layer was 10 mm and the pre-coated transition layer was 1 mm, a compact structure and metallurgical bonding with the substrate were obtained. Thermal shock test results indicated that the ceramic coating exhibited good thermal shock resistance when the sample was rapidly quenched from 800°C to room temperature by plunging into water.     

Effects of deposition parameters on the properties of VO_2 thin films

Up to now, much attention has been paid tovanadiumoxide (VOx) thinfil ms due to their exten-sive applications in the infrared microbolometers .Incontrast tothe conventional photon detectors ,the mi-crobolometer using VOxthinfil ms as sensitive materi-als can offer decreased systemcost ,i mproved reliabil-ity,low power-consumption and high sensitivity inthe spectral range of 8—14μm.Vanadiumoxides have various crystal structuresand valency states ,such as VO, V2O3, VO2, V2O5,whichleads tol…