Chemical states of the atoms in magnetic multilayersTa/NiOx/Ni81Fe19/Ta and Co/AlOx/Co

Ta/NiOx/Ni81Fe19/Ta and Co/AiOx/Co multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field (Hex) and the coercivity (Hc)of NiOx/Ni81Fe19 as a function of the ratio of Ar to O2 during the deposition process were studied. The composition and chemical states at the interface region of NiOx/NiFe were also investigated using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that when the ratio of Ar to O2 is equal to 7 and the argon sputtering pressure is 0.57 Pa, the x value is approximately 1and the valence of nickel is +2. At this point, NiOx is antiferromagnetic NiO and the corresponding Hex is the largest.As the ratio of Ar/O2 deviates from 7, the Hex will decrease due to the presence of magnetic impurities such as Ni+3 or metallic Ni at the interface region of NiOx /NiFe, while the Hc will increase due to the metallic Ni. Al layers in Co/AIOx/Co multilayers were also studied by angle-resolved XPS. Our finding is that the bottom Co could be completely covered by depositing an Al layer about 1.8 nm. The thickness of AIOx was 1.2 nm.     

SiO2/Ta interface reaction in magnetic multilayers and its influence on Ta buffer layers

Ta is often used as a buffer layer in magnetic multilayers. In this study, Ta/Ni81Fe19/Ta multilayers were deposited by magnetron sputtering on sing-crystal Si with a 300-nm-thick SiO2 film. The composition and chemical states at the interface region of SiO2/Ta were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there is an "intermixing layer" at the SiO2/Ta interface due to a thermodynamically favorable reaction: 15 SiO2 + 37 Ta = 6 Ta2O5 + 5 Ta5Si3. Therefore, the Ta buffer layer thickness used to induce NiFe (111) texture increases.     

Rh/Ti3C2Tx MXene催化剂用于氨硼烷催化产氢

二维过渡金属碳/氮化合物基（MXene）催化剂对于水解产氢反应具有优异的催化活性.以二维过渡金属碳化钛（Ti₃C₂T_x MXene）材料为载体,采用原位还原法,制备了超高分散度的二维Ti₃C₂T_x MXene材料担载的金属铑（Rh）催化剂（Rh/Ti₃C₂T_x MXene）.利用单层二维Ti₃C₂T_x MXene材料高度暴露的表面,实现了Rh亚纳米团簇的高度分散.在常压的温和条件下,将制得的Rh/Ti₃C₂T_x MXene催化剂用于氨硼烷的常温分解.在35℃,0.1 MPa的条件下,氨硼烷可以在3 min内完全实现氢气（H₂）的释放.催化剂的结构表征证明：Rh亚纳米团簇的平均尺寸约为0.66 nm.构效关系研究表明：二维Ti₃C₂T_x MXene载体表面高度暴露的碳钛键（C-Ti）结构可以起到锚定和高度分散Rh亚纳米团簇的作用.