气压对金刚石膜生长的影响

采用电子铺助热灯丝化学气相沉积（EA-CA）方法沉积大面积金刚石膜，在金刚石膜的沉积过程中，气压对金刚石膜沉积的影响会直接影响着金刚石膜的生长和质量。用Raman，SEM等手段对金刚石膜的生长特性进行了表征。     

甲烷浓度对光学级金刚石膜生长的影响

采用微波PCVD系统进行了高品质透明金刚石膜的制备,在金刚石膜的沉积过程中,碳源浓度的变化直接影响着金刚石膜的生长和质量。用Raman,SEM等手段对金刚石膜的生长特性进行了表征。     

甲烷浓度对大面积金刚石膜生长的影响

采用电子辅助热灯丝化学气相沉积(EA.CVD)方法沉积大面积金刚石膜,在金刚石膜的沉积过程中,碳源浓度的变化会直接影响着金刚石膜的生长和质量。使用Raman,SEM等手段对金刚石膜的生长特性进行了表征。     

Synthesis of high quality type-Ib diamond crystals in carats grade

High quality type-Ib tower-shape gem-diamond crystals in carats grade were synthesized in cubic anvil high pressure apparatus (SPD-6×1200) at 5.4 GPa and 1250-1450°C. The relationship between the growth time and the weight of growth diamond has been gained. The faces of {110} and {113} were found in the synthetic diamond crystals frequently. We found that the relative growth rate of {113} face was descending with the increase of growth temperature, and that of {110} face had no obvious change with the incre...     

人工合成金刚石研究发展新动向

介绍了人工合成金刚石的发展历史、合成方法及其应用前景，指出了我国金刚石薄膜沉积技术的研究现状及今后的发展方向。     

Effects of carbon diffusing field in alloy solvent on the growth of tower-shape diamond single crystal

High-quality type-Ib tower-shape diamond single crystals were synthesized in cubic anvil high pressure apparatus (SPD-6×1200) at 5.4 GPa and 1250-1450°C. The (100) face of seed crystal was used as the growth face, and FeNiMnCo alloy was used as the solvent/catalyst. Two kinds of carbon diffusing fields (type-B and type-G) were simulated by finite element method (FEM). Using the two kinds of carbon diffusing fields, many diamond single crystals were synthesized. The effects of carbon diffusing fields on the ...     

氮气流量对金刚石膜生长的影响

采用电子辅助热灯丝化学气相沉积（EA-CVD）方法沉积大面积金刚石膜,在金刚石膜的沉积过程中,氮气流量对金刚石膜沉积的影响会直接影响着金刚石膜的生长和质量。用Raman等手段对金刚石膜的生长特性进行了表征。     

CVD金刚石薄膜的掺硼研究

主要介绍硼掺杂金刚石膜的生长．采用热灯丝CVD法在硅上制备金刚石薄膜，采用三氧化二硼制备硼掺杂金刚石膜．利用拉曼光谱分析硼掺杂金刚石膜的生长情况．结果表明：硼的掺杂质量分数随生长时间延长而增大；利用SEM观察硼掺杂金刚石膜的表面晶粒变小；利用银浆在掺杂金刚石膜表面制备电极，测试电流随温度升高而变大.     

灯丝平面与衬底间距对金刚石膜沉积的影响

采用电子辅助热灯丝化学气相沉积(EA-CVD)方法沉积大面积金刚石膜,在金刚石膜的沉积过程中,灯丝平面与衬底间距对金刚石膜沉积的影响会直接影响着金刚石膜的生长和质量。用Raman手段对金刚石膜的生长特性进行了表征。     

Effects of Ti additive on HPHT diamond synthesis in Fe-Ni-C system

Diamond crystals with low nitrogen concentration were synthesized from the Fe-Ni-C system with Ti additive at high pressure and high temperature （HPHT） in a china-type cubic high pressure apparatus （CHPA）. The synthesis pressure range was 4.8-5.2 GPa, and the temperature range was 1420-1600 K. The lowest synthesis pressure for diamond fell first and then rose with the increase of Ti additive. The color, shape, surface morphology and nitrogen impurity concentration of the synthesized diamond crystals were characterized using optical microscopy （OM）, scanning electron microscopy （SEM） and micro Fourier transform infrared （FTIR） spectrometry. The results show that the Ti additive has significant effects on color, growth rate, crystal shape, surface morphology and nitrogen impurity con- centration of the synthesized diamond crystals. The color of diamond crystals synthesized without Ti additive is yellow, while that with Ti additive becomes light and nearly colorless. The growth rate without Ti additive is higher than that with Ti additive. The crystal shapes of as-grown diamond crystals vary with the increase of Ti additive. The {111} crystal faces become dominant and some {311} crystal faces appear with the increase of Ti additive. The concentration of nitrogen impurity in diamond crystals without Ti additive is higher than that with Ti additive.     

金刚石薄膜光学透过性能的研究

研究了金刚石薄膜的厚度、表面粗糙度及其成分对金刚石薄膜光学透过率的影响,采用AFM观察金刚石膜的表面形貌并测试其表面粗糙度Ra值;用XPS仪测试了金刚石膜成分;用UV-365分光光度仪测试了光学透过率.结果表明:表面粗糙度是影响金刚石薄膜光学透过率的重要因素,其降低一倍,光学透过率增加两倍多.要提高金刚石薄膜的光学透过率,应大力降低表面粗糙度.     

Atomic scale KMC simulation of {100} oriented CVD diamond film growth under low substrate temperature-Part II Simulation of CVD diamond film growth in C-H system and in Cl-containing systems

The growth of {100}-oriented CVD diamond film under two modifications of J-B-H model at low substrate temperatures was simulated by using a revised KMC method at atomic scale. The results were compared both in Cl-containing systems and in C-H system as follows: (1) Substrate temperature can produce an important effect both on film deposition rate and on surface roughness; (2) Aomic Cl takes an active role for the growth of diamond film at low temperatures; (3) {100}-oriented diamond film cannot deposit under single carbon insertion mechanism, which disagrees with the predictions before; (4) The explanation of the exact role of atomic Cl is not provided in the simulation results.     

Atomic scale KMC simulation of {100} oriented CVD diamond film growth under low substrate temperature—Part Ⅰ Simulation of CVD diamond film growth under Joe-Badgwell-Hauge model

The growth of {100} oriented CVD (Chemical Vapor Deposition)diamond film under Joe-Badgwell-Hauge (J-B-H) model is simulated at atomic scale by using revised KMC (Kinetic Monte Carlo) method. The results show that: (1) under Joe's model, the growth mechanism from single carbon species is suitable for the growth of {100} oriented CVD diamond film in low temperature; (2) the deposition rate and surface roughness () under Joe's model are influenced intensively by temperature ()and not evident bymass fraction of atom chlorine; (3)the surface roughness increases with the deposition rate, i.e. the film quality becomes worse with elevated temperature, in agreement with Grujicic's prediction; (4) the simulation results cannot make sure the role of single carbon insertion.     

化学气相沉积金刚石膜的硬度

使用力驱动静态超微压痕测量仪器（Ｆｏｒｃｅ Ｄｒｉｖｅｎ Ｓｔａｔｉｃ Ｍｅａｓｕｒｉｎｇ Ｕｌｔｒａ Ｍｉｃｒｏ－ Ｉｎｄｅｎ－ｔａｔｉｏｎ Ｓｙｓｔｅｍ ）－ ＵＭＩＳ－ ２０００ 对由直流等离子体喷射法沉积的金刚石膜进行测量。结果显示金刚石膜的硬度不仅与晶体生长方向和晶粒大小有关,还与厚度有关。生长面和与基底接触面的金刚石膜硬度也有区别。后者被认为由于随机取向的微小晶粒占优势,其硬度比生长面略高。在所进行的测量中,硬度值在９０ＧＰａ左右。     

氮铝钛和金刚石涂层刀具干切削磨损性能的研究

干切削是一种新型的绿色制造方式,它可消除切削液带来的一系列负面影响.本文通过选用氮铝钛和金刚石两种涂层刀具(基体采用硬质合金),在干切削和湿切削条件下对相同工件材料进行加工试验,探讨其切削性能及磨损机理,阐明了这两种新型涂层刀具在于切削加工中广泛的应用前景.     

干摩擦条件下金刚石复合膜摩擦学性能

在干摩擦条件下利用 SRV磨损试验机比较了在硬质合金基体上金刚石薄膜、石墨 /金刚石复合膜以及硬质合金 3种试样的摩擦学性能。利用扫描电子显微镜观察了试样和磨痕的表面形貌。利用表面形貌仪测试了磨损体积。研究了振动频率对试样的摩擦学性能影响。结果表明 ,在干摩擦条件下 ,金刚石薄膜与石墨 /金刚石复合膜的摩擦学性能差别不大 ,二者的磨损机理均为微断裂磨损。在干摩擦条件下 ,高频时金刚石薄膜的耐磨性是硬质合金耐磨性的 8～ 10倍 ,其原因是硬质合金的磨损机理存在着从粘着磨损到微断裂磨损的转变     

电镀晶种法合成金刚石单晶实验研究

目的寻求一种合成金刚石大单晶的有效方法。方法采用在金刚石单晶上面电镀一层金属镍膜作为触媒,镀有镍膜的金刚石晶种被规则地放在石墨片上预先刻好的洞中,每两个洞之间保持相等的间距,然后与其他石墨片交替组装在高温高压下进行实验合成。结果实验结果表明,在合成压力、温度和时间分别~5.8 GPa、~1 460℃和14 min的条件下,合成后的单晶尺寸约是原晶种的3倍。与传统的合成工艺相比较,合成后的金刚石单晶具有较好的形貌与质量。结论采用电镀晶种法合成对高品级金刚石大单晶的合成具有一定参考意义。