Fabrication of the beam splitters for soft X-ray laser application

The electron densities of a laser-produced plasma near the critical surface can be measured by using soft X-ray laser interferometry because the soft X-ray laser has shorter wavelength, higher brightness and better coher-ence and so on. It has obvious dominance in the experi-mental research of diagnosing the distribution of electron densities in a laser-produced plasma. The experimental results can not only give the information correlated with plasmas, which cannot be described accurately in t…     

Aging effect of Co/C soft X-ray multilayer mirrors

Conclusion We have investigated the aging effect of Co/C soft X-ray multilayers prepared by dualfacing-target sputtering. It was found that phase-separation phenomena exist in the Co/C multilayers, which causes the reflectivity at grazing incidence to increase with time, and can be interpreted as positive enthalpy of Co-C mixing. It is evident that oxidation of the outermost layer of Co/C multilayers with Co deposited last is a potential problem in applications where the highest possible reflectivity is required.     

Soft X-ray optical multilayer mirrors

The current research on the structure design, characterization and structural stability of soft X-ray optical multilayermirrors is reviewed and further studies on the currently existing problems and the possible solutions are made.     

Modulation structure stability of heat-treated Co/C and CoN/CN soft X-ray multilayers

Modulation structure stability of Co/C and CoN/CN soft X ray multilayers has been investigated by X ray diffraction and Raman spectroscopy. The graphitization of the amorphous carbon layers in Co/C multilayers causes a period expansion of 12% at annealing temperatures below 400℃. An enormous period expansion (～40%) induced by the crystallization and agglomeration of Co layers has been observed at 500℃. While the period expansion of CoN/CN multilayers is only 4% at 400℃. The interface pattern of the CoN/CN multilayers still exists even if they were annealed at 700℃. The relatively good thermal stability of CoN/CN multilayers can be attributed to the suppression of the formation of the sp 3 bonding and, at annealing temperatures higher than the phase transition temperature of 420℃ (from hcp to fcc), the coexistence of hcp and fcc Co structures through doping nitrogen.     

Cu层厚度对NiFe/Cu/Co 的巨磁电阻效应影响

用磁控射频溅射法制备了NiFe/Cu/Co多层膜;研究了薄膜的磁特性和磁电阻特性与中间层Cu厚度的关系.在适当的Cu层厚度下 (大约为2 nm),制备出了具有很好自旋阀巨磁阻效应的多层膜.研究表明,在弱磁场下,薄膜的磁电阻回线的斜率与原来的磁化过程有关,因此该薄膜材料可以用于巨磁电阻存储器中.     

Cu/Ni多层膜的电阻与位错

采用电桥及X射线衍射线形分析法研究磁控溅射Cu／Ni多层膜（CLI及Ni单层厚度均为5nm）的室温电阻率及平均位错密度随对层（bilayer）层数的变化规律．结果表明,随层数增加,电阻率及平均位错密度减少;多层膜电阻率大于单层膜电阻率;单层膜电阻率大于同质块状体的电阻率．并对其微观机制进行分析．     

Calculation of non－mono chromatic reflectance of Co／Sb multilayer

It is well known that the structure defects, such as the interfacial roughness, interdiffusion and chemical reaction at interface, can degrade the optical properties for soft X-ray multilayer[1—5]. For example, the interfacial rough-ness can lead to a loss of spectral reflectance, which has been investigated for many years, and number theories for the scattering of electromagnetic radiation by interfacial roughness have been formulated[6,7]. In addition, the fluc-tuation of the period can als…     

磁控溅射电源控制算法的优化设计

磁控溅射电源是磁控溅射镀膜生产装置中的关键设备之一,溅射过程中的不稳定严重影响镀膜的质量,因此电源控制算法的优化设计对改善溅射过程的稳定性至关重要。本文针对大型真空镀膜设备所用电源,提出变速积分PI控制和重复控制相结合的控制方案,详细介绍了复合控制器的设计过程,MATLAB仿真验证了该方案的合理性。在实验室搭建了样机,测试和运行结果证明了算法的正确性。     

平板显示中MISM多层膜电子发射结构的制作

介绍了一种用于场致发射显示的平面多层膜电子发射结构的制作过程 ,采用真空溅射的方法镀制玻璃衬底 Cr-Cu Al2 O3 ZnS Ag结构的平面电子源 ,对其发射性能进行了论述 ,并取得优化发射性能的工艺参数     

透明导电GZO/Cu/GZO多层薄膜的室温生长及性能研究

研究Ga掺杂ZnO(GZO)和Cu薄膜形成的GZO/Cu/GZO多层薄膜体系,以期提高透明导电薄膜的综合性能。GZO/Cu/GZO多层薄膜由直流磁控溅射技术在室温下制备,研究Cu层厚度对多层薄膜结构、电学和光学性能的影响。结果表明GZO/Cu/GZO多层薄膜具有较好的结晶性能。随着Cu层厚度的增加,多层薄膜的可见光透射率有所降低,同时电学性能大幅度提升。在Cu层厚度为7.5 nm时,GZO/Cu/GZO多层薄膜获得最优的光电综合性能指标,且相对于单层GZO薄膜ΦTC因子从7.65×10-5Ω-1增加到1.48×10-3Ω-1。     

Co/Si多层膜的磁控溅射及其X射线衍射分析

用超高真空磁控溅射设备在不同溅射压强及衬底温度的工艺条件下制备了一系列Ｃｏ／Ｓｉ多层膜．Ｘ射线小角衍射证实所研制的多层膜具有周期调制结构．分别采用不同的理论方法计算了多层膜的周期和折射修正项．表明修正项不再仅对折射效应修正,而应理解为更广义的修正项．并应用广义修正总多层膜厚度Ｂｒａｇｇ公式确定出了主峰之间次峰的级数．     

一种X光多层膜的设计方法

为了解决X光多层膜理论设计与实际镀膜反射率不一致的问题,基于物理学关于X光在多层膜界面散射的最新理论,提出一种数学模型,编制了软X光多层膜的设计程序。在考虑界面粗糙度、膜层配比、膜层周期多个实际参数条件影响下,多层膜反射率与入射X光波长的关系曲线。其设计结果与传统的设计方法相比,不但理论先进,能够给出最佳结构参数的设计结果,而且能够给出膜厚误差、配比误差对反射率的影响,同时考虑了多层膜的所有参数,使反射率设计结果更接近于实际镀膜结果。     

软X射线多层膜透射式起偏器和检偏器设计

叙述了软X射线波段多层膜透射式起偏器和检偏器的设计原理，提出了设计准则，通过该准则设计的多层膜偏振元件能够同时满足具有较大的光通量和偏振度要求．同时还优化了不同膜厚比情况下软X射线多层膜偏振元件的性能，讨论了在多层膜制作过程中，由于表界面粗糙度和扩散的不同对元件性能的影响，这些工作为制作软X射线多层膜透射式起偏器和检偏器提供了设计基础。     

软组织形变算法仿真改进研究

 针对以表面网格表示的软组织形变过程中受力点最近邻质点求取算法存在的不足,提出了基于随机点搜索平面最近邻质点的改进算法.该算法将以往穷举集合的方式改为随机点树形搜索方式,使得算法减少了受力点与各个质点之间的距离大小的比较次数,在模拟平面组织形变时具有较好的实时性.实验表明,面积匹配算法结合质点弹簧算法能很好地模拟软组织形变的过程,达到良好的实时与准确性.     

氧流量对直流反应磁控溅射制备TiO2薄膜的光学性质的影响

应用DC(直流)反应磁控溅射设备在硅基底上制备TiO2薄膜,在工作压强为2.0×10-1 Pa,氩气流量为42.6 sccm,溅射时间为30 min的条件下,通过控制氧流量改变TiO2薄膜的光学性质.应用n&k Analyzer 1200分析器测量,当氧流量增加时薄膜的平均反射率降低,同时反射低谷向中心波长(550 nm)处移动,薄膜的消光系数k有增大的趋势,但对薄膜的折射率影响不大.通过XRD和SEM表征发现,随着氧流量的增加金红石相的TiO2增多,并且表面趋于致密平滑.     

合肥国家同步辐射实验室软X射线磁性圆二色实验站建设及其初步应用

介绍了软X射线磁性圆二色谱的基本原理，合肥国家同步辐射实验室软X射线磁性圆二色实验站的主要装置，及其采用的相关技术，包括通过斩波器的同步光圆偏振度的计算及其与光通量的折中处理方法、光束线的主要组成和针对本储存环通量低所作的设计、与该实验站兼容的磁铁设计和采用的样品电流采集方式等，并介绍了各部分达到的性能指标．最后用该实验装置对不同厚度的Co多晶薄膜的自旋磁矩与轨道磁矩进行了初步研究，发现随薄膜厚度增加，样品自旋磁矩逐渐增大，而轨道磁矩逐渐减小．