高比表面积超细二氧化硅粉体的制备

以水玻璃为原料、乙酸乙酯为潜伏酸试剂 ,采用溶胶凝胶法制备出了高温润滑脂稠化剂———高比表面积超细SiO2 粉体。考察了乙酸乙酯用量和反应温度对成溶胶时间、SiO2 粉体BET比表面积及孔体积的影响 ,并用TEM、BET低温液氮吸附和IR等分析手段对SiO2 粉体颗粒进行了表征。结果表明 ,采用该方法制得的SiO2 粉体颗粒近似呈球形 ,粒径为 2 0～ 30nm ,比表面积均大于 40 0m2 /g ,最大比表面积可达 5 0 3 38m2 /g。较理想的反应条件为乙酸乙酯与水玻璃溶液中所含SiO2 的摩尔比为 0 8,反应温度为 5 0℃。     

高比表面积超细二氧化硅粉体的制备

以水玻璃为原料,乙醇乙酯为潜伏酸试剂,采用溶胶法制备出了高温涧滑脂稠化剂－高比表面积超细SiO2粉体,考察了乙酸乙酯用量和反应温度对成溶胶时间,SiO2粉体BET比表面积及孔体积的影响,并用TEM,BET低温液氮吸附和IR等分析手段对SiO2粉体颗粒进行了表征,结果表明,采用该方法制得的SiO2粉体颗粒近似呈球形,粒径为20－30nm,比表面积均大于400m^2/g,最大比表面积可达503.38m^2/g,较理想的反应条件为乙酸乙酯与水玻璃溶液中所含SiO2的摩尔比为0．8,反应应温度为50℃。     

溶胶凝胶法制备超细二氧化硅的研究

以Na2SiO3·9H2O为原料、乙酸乙酯为潜伏酸试剂,并辅以超声波振荡,采用溶胶-凝胶法制备了高比表面积超细SiO2粉体.考察了Na2SiO3浓度、酸试剂、表面活性剂、超声波等因素对SiO2粉体粒径的影响,并用TEM、BET、低温液氮吸附和XRD等分析手段对SiO2粉体颗粒进行了表征.结果表明,所制得的SiO2粉体呈无定形,粒径为40～60 nm,比表面积可达400 m2/g以上.     

纳米SiO2粉体的制备及其性质研究

采用溶胶—凝胶法制备了纳米SiO2,研究了3种干燥条件对制备纳米SiO2粉体的影响,对制备的纳米SiO2粉体的表面结构做了分析。结果表明:通过CO2超临界流体技术制备的SiO2超细粉体分散性好,比表面积高,粒径为30nm左右。     

低发射率SiO2/Al2 O3纳米复合粉体的制备和红外隐身性能

采用溶胶-凝胶法制备非晶态和结晶态两种相结构的SiO2/Al2 O3纳米复合粉体,通过X射线衍射、透射电子显微镜等手段对纳米复合粉体结构和形貌进行表征,并利用傅里叶变换红外光谱仪研究纳米复合粉体的红外隐身性能.结果表明：两种相结构的SiO2/Al2 O3纳米复合粉体均呈不规则颗粒状,其中结晶态SiO2/Al2 O3纳米复合粉体的平均晶粒尺寸约为18 nm；结晶态SiO2/Al2 O3纳米复合粉体在2.5~25μm波长范围内的红外发射率均低于非晶态复合粉体,3~5μm内发射率平均值为45.65%,8~14μm内发射率平均值为46.19%,是一种低发射率的红外隐身复合纳米材料.     

MCM-22分子筛静态水热晶化法合成的优化

系统地考察静态水热晶化法合成条件如硅源、晶化时间、凝胶配比及成胶老化方式等对MCM-22合成的影响,并通过XRD、SEM和FT-IR等方法对合成的MCM-22分子筛进行表征.研究结果表明:硅酸、硅溶胶、硅胶在适当比例下都能合成出较纯的MCM-22分子筛,但其聚集形貌及晶粒大小有所不同;晶化时间为8～10 d,MCM-22分子筛结晶度较高;凝胶的初始配比对产物物相的影响较大,最佳条件为n(SiO2)/n(Al2O3)=30～60,n(OH-)/n(SiO2)=0.15～0.25,n(HMI)/n(SiO2)=0.35～0.6,n(H2O)/n(SiO2)=20～45;成胶老化方式对MCM-22分子筛的晶化影响不大.     

TiO2和SiO2-Ag混合纳米粉体在水溶液中的分散

研究不同分散介质和分散剂对TiO2和SiO2-Ag混合纳米粉体在水溶液中分散的影响,采用分散相的沉降高度和分散后颗粒的粒度分布评价分散效果,得出（NaPO3）6是TiO2和SiO2-Ag粉体的良好分散剂.通过测定分散相在分散介质中ζ电位,分析分散剂的分散机制,（NaPO3）6可分别显著提高水溶液分散中TiO2和SiO2-Ag粉体表面ζ电位的绝对值,使超细混合粉体在水溶液中获得良好稳定的分散.     

原位法制备介孔SiO2@TiO2粉体及其性能研究

介孔SiO2@TiO2粉体具有较大比表面积及有序的孔径分布,在吸附、药物控释以及催化剂载体等领域应用前景广阔.以正硅酸乙酯为硅源、钛酸正丁酯为钛源、十六烷基三甲基溴化铵为模板剂,结合并改进溶胶凝胶法和水解沉淀法,设计了一种原位制备介孔SiO2@TiO2粉体的方法.通过对不同酸碱条件下所得样品进行结构与性能分析表明,碱性...     

反蛋白石结构硫化锑光子晶体的制备

用改进St ber法制备出单分散的SiO2胶球.通过离心沉降法将SiO2胶球有序排列,得到蛋白石结构的SiO2光子晶体,该方法可制备出较大尺寸的蛋白石结构光子晶体.以得到的SiO2光子晶体为模板,通过化学反应向模板间隙填入Sb2S3后再经氢氟酸腐蚀去除二氧化硅胶晶模板,制备出反蛋白石结构硫化锑光子晶体.     

溶胶-凝胶法制备SiO2-P2O5-TiO2粉体

采用溶胶-凝胶工艺制备出平均尺寸为0.109μm的SiO2-P2O5-TiO2细小均匀的粉体。通过XRD、SEM、热重分析发现,粉体中存在着包裹在颗粒周围的无定形二氧化硅膜,能有效的抑制水解时磷和钛的副反应发生,改善了粉体的化学稳定性,并且该粉体具有良好的吸湿性,适合于制备电解质薄膜。     

Spheroidization of silica powders by radio frequency inductively coupled plasma with Ar-H2 and Ar-N2 as the sheath gases at atmospheric pressure

Amorphous spherical silica powders were prepared by inductively coupled thermal plasma treatment at a radio frequency of 36.2 MHz.The effects of the added content of hydrogen and nitrogen into argon (serving as the sheath gas),as well as the carrier gas flow rate,on the spheroidization rate of silica powders,were investigated.The prepared silica powders before and after plasma treatment were examined by scanning electron microscopy,X-ray diffraction,and laser granulometric analysis.Results indicated that the average size of the silica particles increased,and the transformation of crystals into the amorphous state occurred after plasma treatment.Discharge image processing was employed to analyze the effect of the plasma temperature field on the spheroidization rate.The spheroidization rate of the silica powder increased with the increase of the hydrogen content in the sheath gas.On the other hand,the spheroidization rate of the silica power first increased and then decreased with the increase of the nitrogen content in the sheath gas.Moreover,the amorphous content increased with the increase of the spheroidization rate of the silica powder.     

Spheroidization of silica powders by radio frequency inductively coupled plasma with Ar-H2 and Ar-N2 as the sheath gases at atmospheric pressu

Amorphous spherical silica powders were prepared by inductively coupled thermal plasma treatment at a radio frequency of 36.2 MHz. The effects of the added content of hydrogen and nitrogen into argon (serving as the sheath gas), as well as the carrier gas flow rate, on the spheroidization rate of silica powders, were investigated. The prepared silica powders before and after plasma treatment were examined by scanning electron microscopy, X-ray diffraction, and laser granulometric analysis. Results indicated that the average size of the silica particles increased, and the transformation of crystals into the amorphous state occurred after plasma treatment. Discharge image processing was employed to analyze the effect of the plasma temperature field on the spheroidization rate. The spheroidization rate of the silica powder increased with the increase of the hydrogen content in the sheath gas. On the other hand, the spheroidization rate of the silica power first increased and then decreased with the increase of the nitrogen content in the sheath gas. Moreover, the amorphous content increased with the increase of the spheroidization rate of the silica powder.     

Spheroidization of silica powders by radio frequency inductively coupled plasma with Ar–H_2 and Ar–N_2 as the sheath gases at atmospheric pressure

Amorphous spherical silica powders were prepared by inductively coupled thermal plasma treatment at a radio frequency of 36.2 MHz. The effects of the added content of hydrogen and nitrogen into argon(serving as the sheath gas), as well as the carrier gas flow rate, on the spheroidization rate of silica powders, were investigated. The prepared silica powders before and after plasma treatment were examined by scanning electron microscopy, X-ray diffraction, and laser granulometric analysis. Results indicated that the average size of the silica particles increased, and the transformation of crystals into the amorphous state occurred after plasma treatment. Discharge image processing was employed to analyze the effect of the plasma temperature field on the spheroidization rate. The spheroidization rate of the silica powder increased with the increase of the hydrogen content in the sheath gas. On the other hand, the spheroidization rate of the silica power first increased and then decreased with the increase of the nitrogen content in the sheath gas. Moreover, the amorphous content increased with the increase of the spheroidization rate of the silica powder.     

超细二氧化硅的制备与改性

采用Na₂O·nSiO₂与CO₂为原料,加入丙三醇,用非离子表面活性剂聚乙二醇作为分散剂,制备出了和气相法接近的高分散超细二氧化硅粉末。用三甲基一氯硅烷(CTMS),二甲基二氯硅烷(DCDMS)改性沉淀二氧化硅,并对改性后样品的密度、吸油值、硅羟基含量进行了测定,用TEM、激光粒度分析仪、红外以及BET法对其进行了表征。     

海藻酸钙／多孔硅复合材料对水中铜离子的吸附性能研究

对比研究了海藻酸钙／多孔硅复合材料和纯多孔硅对铜离子的吸附作用,考察了溶液初始pH、温度、吸附剂加入量和吸附时间等因素对海藻酸钙／多孔硅复合材料吸附铜离子的影响。结果表明：海藻酸钙／多孔硅复合材料在相同铜离子浓度下的吸附性能优于纯多孔硅,其吸附速率也明显大于纯多孔硅。利用SEM、FTIR、BET等方法分别测定了改性前后多孔硅材料的形貌和物理化学性质。利用Langmuir等温吸附式计算出海藻酸钙／多孔硅复合材料在60℃下和pH为5．0时的铜离子最大吸附量为49．02mg／g。     

硫酸体积分数对胶体电解液性能的影响

以气相二氧化硅为凝胶剂，把它与不同体积分数的硫酸按一定比例混合制成胶体铅酸蓄电池用胶体电解质。通过阴极极化、循环伏安、交流阻抗和粘度测定手段，研究硫酸体积分数对胶体电解质的凝胶性能及电化学性能的影响。实验表明，在二氧化硅含量一致的情况下，胶体电解质的触变性随着硫酸浓度增大有所增强。另外，用不同体积分数的硫酸配胶体电解质的电化学性能也有着不同程度的影响。     

硅溶胶粒径和分散性的影响因素

采用硅粉催化水解工艺,以硅粉为原料,无机碱做催化剂,制备出粒径分布均匀的单分散二氧化硅胶体.通过考察催化剂种类、用量,硅粉投料方式及温度等对二氧化硅胶体的粒径和性质的影响,探索制备此类硅溶胶的最佳条件.结果表明:用硅粉催化水解法制得的二氧化硅胶体呈现出很好的稳定性;在一次性投料、投料温度为85℃,碱性pH值,制备的二氧化硅胶体性能最好.     

微硅粉固相反应制备莫来石粉体工艺

 以微硅粉和工业氧化铝为原料,在空气气氛下固相反应合成莫来石粉体。研究了煅烧温度和Al₂O₃/SiO₂的物质的量比对反应产物物相组成的影响,结果表明,当Al₂O₃ /SiO₂的物质的量比为3：2.5、煅烧温度为1450℃时,制备莫来石粉体质量分数达到最高,根据K值法计算其质量分数为95%。莫来石粉体平均粒径随球磨时间延长而逐渐减小,最终粉体平均粒径为0.58μm,比表面积为9.26m²/g,粒径分布由单峰分布演变为双峰分布,莫来石粉体颗粒形状不规则,以多边体状存在。     

碳热还原法合成TiB2-SiC复合粉末及其机理分析

以硅溶胶、炭黑、TiO2和B4C为原料,采用碳热还原法合成TiB2-SiC复合粉末.研究了反应温度、TiO2添加量对合成TiB2-SiC复合粉末的物相组成和显微形貌的影响;对反应过程进行了热力学分析和计算,并探讨了TiB2-SiC复合粉末的生长机理.结果表明:TiB2-SiC复合粉末适宜的合成条件为在1 600℃保温1h.在反应过程中,TiB2先于SiC生成,TiB2的生成改变了SiC的生长方式.当复合粉末中TiB2的质量分数为10%左右时,SiC的合成过程由气-固(V-S)反应转变为气-固(V-S)和气-气(V-V)共同反应,复合粉末主要由少量球状颗粒、短棒状颗粒以及大量的晶须组成.当体系中生成的TiB2质量分数(≥20%左右)较大时,生成的晶须数量减少,同时球状、片状和短棒状等结构颗粒明显增多,出现多样化结构并存的现象,SiC的生长仍然由V-S反应和V-V反应共同控制.