氧化物纳米线肖特基势垒的输运特性及光电器件研究

基于一维半导体纳米材料发展新型纳米光电器件是纳米科技研究中的重要领域.近年来纳米线肖特基势垒的输运特性及其在光电器件方面的应用受到研究人员的广泛关注.本文中,对氧化物纳米线肖特基势垒的研究背景以及我们近年的研究进展进行评述,主要包括以下三个方面:(1)氧化物纳米线肖特基势垒的输运特性研究;(2)氧化物纳米线肖特基势垒输运特性的调控方法探索;(3)基于氧化物纳米线肖特基势垒的光电器件研究.     

硅扩散p-n结势垒宽度和势垒电容的计算

p-n结势垒宽度和势垒电容在半导体器件的设计与制造工作中是经常需要计算的。这两者都是外加电压的函数,同时还与p-n结中的杂质分布有关。对于单边突变结和线性缓变结近似的情形,由势垒区电位所满足的一维泊松方程求解,所得到的势垒宽度和电容随外加电压和杂质浓度(或浓度梯度)而变化的关系,是简单的解析表达式。而对于实际的扩散p-n结,把它作为上述两种情形的近似,其范围是比较狭窄的。在不同的扩散条件下,p-n结杂质的分布情况也不同,有时往往是很复杂的。Lawrence和     

Pb／PbSe Schottky势垒结研究

本文对形成Ⅳ-Ⅵ族PbSe 金属-半导体肖特基势垒结之工艺和为了提高该器件的R_0A 值,将氯化物作为Pb/PbSe 界面的机理作了研究.本文还研究了具有PbCl_x 界面的PbSe 肖特基势垒结的特性模型化,同时给出了R_0,n,R_(SH),和Φ_B 等模型参数的提取方法.测量表明具有界面层的Pb/PbSe势垒结显示了良好的电学性能.     

环栅肖特基势垒MOSFET解析电流模型

肖特基势垒金属氧化物半导体场效应晶体管(Metal-Oxide-Semiconductor FieldEffect Transistor,MOSFET)的电流一般需要通过载流子的费米狄拉克分布对能量积分来计算或自洽迭代数值计算,为降低其复杂性,本文采用若干拟合参数,考虑镜像力势垒降低效应、偶极子势垒降低效应和小尺寸下量子化效应对肖特基势垒高度的影响,给出了环栅肖特基势垒MOSFET一种新的解析电流模型。所提出的电流模型与文献报道实验数据符合较好,验证了模型的正确性,对环栅肖特基势垒MOSFET器件以及电路设计提供了一定的参考价值.     

有机LED器件结构对其内部电场和电荷分布的影响

利用高电场作用下载流子的Fowler-Nordheim(F-N)隧穿理论,建立了双层结构有机发光二极管(LED)器件载流子的动力学方程,通过计算机模拟,研究了稳态条件下势垒参数、外加电压、阳极区和阴极区的厚度等因素对器件内部电场和电荷分布的影响.结果表明:有机LED内部阴极区与阳极区的电场分布、内界面两侧积累的载流子面密度跟势垒高低、膜层厚薄以及外加电压大小密切相关,各功能层之间的能级匹配和厚度匹配对于器件结构优化和性能改善具有重要作用.     

4H-SiC肖特基势垒二极管温度特性研究

采用平面工艺，用高真空电子束分别蒸发金属Ni、Ti做肖特基接触，采用多层金属Ni、Ti、Ag合金做欧姆接触，制作出Ni／4H—SiC、Ti／4H—SiC肖特基势垒二极管(SBD)．研究了在-100～500℃之间器件正向直流压降与温度变化的关系．实验表明：当通过肖特基势垒二极管的正向电流恒定时，器件正向直流压降随温度变化具有线性关系，斜率约为1．8mV／℃，由此，提出了以4H—SiC肖特基势垒二极管为基础的高温温度传感器模型．     

高压4H-SiC肖特基二极管的模拟及研制

结终端技术能提高4 H-SiC肖特基势垒二极管器件的耐压性能.利用仿真软件ISE-TCAD10.0对具有结终端扩展JTE保护的4 H-SiC SBD器件进行了仿真研究,并依据仿真优化好的参数试制了器件.实验测试结果表明,模拟优化结果与实验测试器件的结果一致性较好,实测此器件的反向电压值达2 000 V,接近理想击穿耐压88%,漏电流数值为0.1mA/cm2.     

高k栅介质SOI应变硅肖特基源漏MOSFET漏致势垒降低效应研究

高k栅介质SOI应变硅肖特基源漏MOSFET结合了应变硅工程、高k栅介质、SOI结构和肖特基源漏四者的优点,是一种实现小尺寸MOSFET的潜力器件.通过求解二维泊松方程建立了该结构的阈值电压模型,模型中考虑了镜像力势垒和小尺寸量子化效应对源漏极的电子本征肖特基势垒高度的影响,在阈值电压模型基础上获得了漏致势垒降低模型.从文献中提取漏致势垒降低的实验数据与模型进行对比,验证了其正确性,随后在此基础上讨论分析了漏致势垒降低和各项参数的变化关系.结果表明,漏致势垒降低随应变硅层厚度的变厚、沟道掺杂浓度的提高和锗组分的增大而增大,随沟道长度的变长、栅介质介电常数的增大、电子本征肖特基势垒高度的提高和漏源电压的增大而减小.适当调节模型参数,该结构可很好的抑制漏致势垒降低效应,对高k栅介质SOI应变硅肖特基源漏MOSFET器件以及电路设计具有一定的参考价值.     

高k栅介质SOI应变硅肖特基源漏MOSFET漏致势垒降低效应研究

高k栅介质SOI应变硅肖特基源漏MOSFET结合了应变硅工程、高k栅介质、SOI结构和肖特基源漏四者的优点,是一种实现小尺寸MOSFET的潜力器件.通过求解二维泊松方程建立了该结构的阈值电压模型,模型中考虑了镜像力势垒和小尺寸量子化效应对源漏极的电子本征肖特基势垒高度的影响,在阈值电压模型基础上获得了漏致势垒降低模型.从文献中提取漏致势垒降低的实验数据与模型进行对比,验证了其正确性,随后在此基础上讨论分析了漏致势垒降低和各项参数的变化关系.结果表明,漏致势垒降低随应变硅层厚度的变厚、沟道掺杂浓度的提高和锗组分的增大而增大,随沟道长度的变长、栅介质介电常数的增大、电子本征肖特基势垒高度的提高和漏源电压的增大而减小.适当调节模型参数,该结构可很好的抑制漏致势垒降低效应,对高k栅介质SOI应变硅肖特基源漏MOSFET器件以及电路设计具有一定的参考价值.     

宽禁带SiC肖特基势垒二极管的研制

采用微电子平面工艺 ,高真空电子束蒸发金属Ni作肖特基接触 ,多层金属Ni、Ti、Ag合金作欧姆接触 ,SiO2 绝缘环隔离减小高压电场集边效应等技术 ,制作出Ni/4H SiC肖特基势垒二极管 (SBD) .该器件在室温下反向击穿电压大于 450V ,对应漏电流为 6× 1 0 -6 A .并对实验结果进行分析模拟 ,理想因子为 1 .73 ,肖特基势垒高度为 1 .2 5V ,实验表明 ,该器件具有较好的正向整流特性和较小的反向漏电流 .     

SixGel-x/Si和Si/Ge应变层超晶格及其器件的应用

SixGel-x/Si和Si/Ge应变层超晶格(SLS)的新颖物理特性显示了它们在各种半导体器件应用方面的诱人前景。本文综述了这类超晶格的生长特性、能带结构以及它们的电学和光学特性。最后介绍了它们在HBTs,p沟BICFETs,n沟和p沟MODFETs以及p-i-n和APD光电探测器应用方面的进展。     

Characteristics of InGaN-based superluminescent diodes with one-sided oblique cavity facet

We have fabricated InGaN-based superlumi-nescent diodes （SLDs） with one-sided oblique facet. The characteristics of the SLDs and laser diodes with the same cavity length （800 μm） were compared. The typical peak wavelength and the full width at half maximum of the spectrum in superluminescence regime are 445.3 and 7.7 nm for the SLDs with 800 μm cavity length. The characteristics of the SLDs with different cavity length were also demon-strated in a comparative way. It is found that the gain of the InGaN multi-quantum wells in blue spectral range is a linear function of the current density below gain saturation region. The lasing threshold current turns out to be higher for the shorter SLD （S-SLD） （400 μm）, but the output light intensity of the longer SLD （800 μm） is higher than that of the S-SLD under the same current density. The gain saturation phe-nomenon was observed in S-SLD when it was biased at a current density larger than 27.5 kA/cm^2. The increase of junction temperature was identified as the main reason for gain saturation through spectra analysis.     

平板型荧光显示器件静态工作特性的研究

平板型荧光显示器件含多个分立的显示单元，阴极近于全长工作。以多位数码管作测算实例。整管阴极工作电流等于各单元电流之和。在空间电荷限制区，各单元孤立工作；在加速场区，各单元按场强调整电流值，但电流总量不变。整管阴极工作电流的饱和过渡区介于等效电压最高位的起始饱和点与最低位的饱和过渡区终点之间。在空间电荷限制区，整管静态伏安特性符合3／2次方定律。计算整管阴极工作电流须把全管统为一体来进行。     

Study on temperature characteristics of organic light-emitting diodes based on tris-（8-hydroxylquinoline）-aluminum

Both single-layer and double-layer organic light-emitting devices based on tris-（8-hydroxylquino- line）-aluminum （AIq3） as emitter are fabricated by thermal vacuum deposition. The electroluminescent characteristica of these devices at various temperatures are measured, and the temperature characteristics of device performance are studied. The effect of temperature on device current conduction regime is analyzed in detail. The results show that the current-voltage （I-V） characteristics of devices are in good agreement with the theoretical prediction of trapped charge limited current （TCLC）. In addition, both the charge carrier mobility and charge carrier concentration in the organic layer increase with the rise of temperature, which results in the monotonous increase of AIq3 device current. The current conduction mechanisms of two devices at different temperatures are identical, but the exponent m in current-voltage equation changes randomly with temperature. The device luminance increases slightly and the efficiency decreases monotonously due to the aging of AIq3 luminescent properties caused by high temperature. A tiny blue shift can be observed in the electroluminescent （EL） spectra as the temperature increases, and the reduction of device monochromaticity is caused by the intrinsic characteristics of organic semiconductor energy levels.     

Ballistic carbon nanotube field-effect transistors

A common feature of the single-walled carbon-nanotube field-effect transistors fabricated to date has been the presence of a Schottky barrier at the nanotube--metal junctions. These energy barriers severely limit transistor conductance in the 'ON' state, and reduce the current delivery capability--a key determinant of device performance. Here we show that contacting semiconducting single-walled nanotubes by palladium, a noble metal with high work function and good wetting interactions with nanotubes, greatly reduces or eliminates the barriers for transport through the valence band of nanotubes. In situ modification of the electrode work function by hydrogen is carried out to shed light on the nature of the contacts. With Pd contacts, the 'ON' states of semiconducting nanotubes can behave like ohmically contacted ballistic metallic tubes, exhibiting room-temperature conductance near the ballistic transport limit of 4e(2)/h (refs 4-6), high current-carrying capability (approximately 25 micro A per tube), and Fabry-Perot interferences at low temperatures. Under high voltage operation, the current saturation appears to be set by backscattering of the charge carriers by optical phonons. High-performance ballistic nanotube field-effect transistors with zero or slightly negative Schottky barriers are thus realized.     

一种新型的a-Si:H静电感应晶体管

我们提出一种新型的表面肖特基栅的a-Si∶H静电感应晶体管.这种管子制备工艺简单,界面特性良好.计算机模拟结果表明,隙态密度和沟道宽度是影响管子性能的主要参量,当隙态密度为10~(16)cm~(-3)ev~(-1)时,电流开关效应达10~8,工作频率为几兆周.     

InGaAs肖特基源漏MOSFET的多子带系综蒙特卡洛模拟

采用基于有效质量近似的多子带、多能谷系综蒙特卡洛方法, 考虑纳米尺度MOSFET沟道二维电子气中实际存在的多种散射机制, 模拟 InGaAs肖特基源漏MOSFET。结果显示, 在稳态下, 散射虽然改变了InGaAs肖特基源漏MOSFET沟道中沟道电势、电子浓度和速度的分布, 但对InGaAs肖特基源漏MOSFET的输出特性和转移特性影响较小; 而在施加阶跃漏端电压时, 散射的存在增加了过冲电流的峰值和转换时间, 降低了器件的截止频率。     

高压低饱和压降GTR最佳设计

本文提出了高压低饱和压降ＧＴＲ的最佳设计方法。分析表明，高压低饱和压降晶体管采用集电区穿通性设计比非穿通性设计有利。并论证了穿通因子（Ｎ＝Ｗｅ／Ｘｍ）的最佳值为０．７左右。在此范围内，在保证高击穿电压的条件下，可使他和压降ＵＣＥＲ较低，发射极面积Ａｅ最小，大注入下的电流增益大。     

Active terahertz metamaterial devices

The development of artificially structured electromagnetic materials, termed metamaterials, has led to the realization of phenomena that cannot be obtained with natural materials. This is especially important for the technologically relevant terahertz (1 THz = 10(12) Hz) frequency regime; many materials inherently do not respond to THz radiation, and the tools that are necessary to construct devices operating within this range-sources, lenses, switches, modulators and detectors-largely do not exist. Considerable efforts are underway to fill this 'THz gap' in view of the useful potential applications of THz radiation. Moderate progress has been made in THz generation and detection; THz quantum cascade lasers are a recent example. However, techniques to control and manipulate THz waves are lagging behind. Here we demonstrate an active metamaterial device capable of efficient real-time control and manipulation of THz radiation. The device consists of an array of gold electric resonator elements (the metamaterial) fabricated on a semiconductor substrate. The metamaterial array and substrate together effectively form a Schottky diode, which enables modulation of THz transmission by 50 per cent, an order of magnitude improvement over existing devices.