反射Talbot效应的高阶衍射及其在硅光晶上的成像应用

用纳秒脉冲激光在硅材料上制备一维和二维硅光子晶体结构,在这种一维和二维硅光子晶体上观测到反射泰伯(Talbot)效应成像。文中给出反射Talbot效应成像的理论模型,与传统的透射泰伯效应不同,反射泰伯效应有明显的泰伯距离变化和高阶衍射成像等现象。在反射泰伯效应成像中,相邻反射泰伯像之间的间距随像距增加呈线性增长;在泰伯距离间隔中,观察到交替的亮场和暗场成像。实验结果表明,选择适当输入光束的波阵面形状能够增大泰伯像的放大率,选择高阶衍射级能够提高泰伯像的分辨率。这种反射泰伯效应成像具有光路简洁和能够进行微区放大的特点,且不需将成像仪器放入样品室,这在硅基微加工与制备显微检测方面会有很好的应用。     

PL Emission and Shape of Silicon Quantum Dots

The calculation results show that the bonding energy and electronic states of silicon quantum dots are different on various curved surfaces, for example, a Si-O-Si bridge bond on curved surface provides the localized levels in band gap and its bonding energy is shallower than that on facet. The red-shifting of PL spectra on smaller silicon quantum dots can be explained by curved surface effect. Experiments demonstrate that silicon quantum dots are activated for emission due to the localized levels provided in curved surface effect.