温度对非晶SiOx薄膜的光致发光特性的影响

采用双离子束共溅射法制备的SiOx薄膜为非晶结构,在室温下观察到了可见光致发光（PL）现象,探测到样品有四个PL峰,它们的峰位分别为－320nm,-410nm,-560nm和－630nm,且峰位和峰强随温度（基片温度Ts和退火温度Ta)的变化而发生变化,并对实验结果进行了讨论。     

Si-SiO_2薄膜结构与光致发光的研究

采用射频磁控溅射复合靶技术制备了Si SiO2薄膜,并在各种温度下进行了退火处理.XRD分析表明Si SiO2薄膜为非晶结构,XPS分析表明样品主要是以SiO1.90的形式存在,它是富硅或者缺氧的结构.在室温下观察到了可见光致发光(PL)现象,探测到样品的峰位分别在370nm、410nm、470nm和510nm.结合激发谱对相应的激发与发光中心进行了讨论.另外,还研究了退火温度对其峰位与峰强的影响.     

纳米硅的拉曼散射和可见光致发光

我们用射频共溅射技术和后退火处理,获得在石英、Si和Ge衬底上的纳米晶Si(nc-Si) Raman测量清楚地显示出nc-Si的类Lo模(～518cm-1)和类To模(～814cm-1),Raman峰的半高宽(FWHM)和积分强度也显示随退火温度Ta增加的变化,这一结果同nc-Ge/SiO2的情况类同,退火温度Ta=650℃时,nc-Si的平均尺寸为4.9nm 我们用514.5nm的Ar+激光激发,得到了室温可见PL,结果表明:PL谱在2.2eV处有一强的发光峰,与nc-Ge/SiO2相比,SiO2中nc-Si的PL峰更强,峰值能量较大,相应的Ta也较高,当Ta>800℃和Ta<600℃时,PL峰很弱 通过地研究膜中nc-Si的含量与PL峰之间的关系,表明nc-Si的含量对PL峰的积分强度有重要影响,对峰位影响不大,当Si/SiO2靶面积比为1∶1时,PL峰最强     

Si-Si02薄膜结构与光致发光的研究

采用射频磁控溅射复合靶技术制备了Si-SiO2薄膜，并在各种温度下进行了退火处理．XRD分析表明Si-SiO2薄膜为非晶结构，XPS分析表明样品主要是以SiO1.90的形式存在，它是富硅或缺氧的结构．在室温下观察到了可见光致发光(PL)现象，探测到样品的峰位分别在370m、410m、470m和510nm．结合激发谱对相应的激发与发光中心进行了讨论．另外，还研究了退火温度对其峰位与峰强的影响．     

富Si-SiO_2薄膜的制备、结构及光致发光特性的研究

利用双离子束溅射沉积共溅射方法制备了富Si SiO2 薄膜 ,研究了沉积参数、时间、工作气压PAr、基片温度等对沉积速率的影响 ,用TEM和XRD分析了样品的结构 ,当基片温度Ts <4 50℃时 ,所制备一系列样品均为非晶结构 ,当沉积基片温度较高时 (Ts ≥4 50℃ ) ,薄膜样品中才出现Si的颗粒 我们还分析了样品的室温光致发光现象 ,从PL谱中可以看出 ,样品有～ 32 0nm、～ 4 10nm、～ 560nm和～ 630nm四个PL峰 ,并对其发光机理进行初步探讨     

退火温度对Zn_(1-x)Cd_xO薄膜的结构和光学性能的影响

利用直流反应磁控溅射的方法和后退火技术在石英衬底上制备了Zn_(1-x)Cd_xO(x=0.5)薄膜.利用XRD、XPS、TEM、Absorption及PL等详细地研究了退火温度对薄膜的结构和光学性能的影响.结果表明:原生未退火的Zn_(1-x)Cd_xO薄膜具有纯ZnO的六角纤锌矿结构并且在(002)晶面方向上择优生长;当退火温度(Ta)从300℃增加到600℃时,观察到薄膜中出现了CdO杂相;而且,随着Ta的增加,Zn_(1-x)Cd_xO薄膜的光学带隙由2.08 e V增加至3.14 e V;相应地,近带边发光峰的峰位由588 nm减小到403 nm.     

非晶掺氧氮化硅薄膜中N-Si-O发光缺陷态的研究

在室温下利用等离子体增强化学气相淀积(PECVD)方法制备出非晶掺氧氮化硅(a-SiN_x∶O)薄膜.通过改变硅烷(SiH_4)和氨气(NH_3)流量比R,可实现薄膜光致发光(PL)峰位在2.06~2.79eV可见光能量范围内的波长调制.光吸收谱中光吸收峰位与PL峰位重叠,表明薄膜发光来源于光吸收边以下0.65eV左右处的缺陷态.通过对傅里叶变换红外光谱(FTIR)的键浓度分析和X射线光电子能谱(XPS)Si 2p峰的分峰拟合,发现薄膜PL强度的增强与N-Si-O键合浓度的升高紧密相关.R=1∶4时,PL强度与N-Si-O键合浓度同时达到最大.进一步证明了a-SiN_x∶O薄膜中的发光缺陷态与N-Si-O键合结构密切相关.此外,PL峰位随流量比R的增大而发生红移的现象可能源自于N-Si-O组态转变造成的缺陷态密度最大位置处的能级偏移和光学带隙变窄引起的价带顶上移.     

n型多孔硅的制备及其光致发光性能

采用双槽电化学腐蚀法于光照条件下在n型单晶硅片衬底上制备多孔硅(n-PS);在室温下,采用500~700 nm范围内荧光光谱和扫描电镜(SEM)测试系统研究光照、腐蚀时间、电解液含量、腐蚀电流密度及单晶硅掺杂含量等对n-PS的形成、结构形貌和光致发光性能(PL)的影响。研究结果表明,通过光照,能获得具有均匀孔分布和良好发光特性的n-PS,在约600 nm处产生较强荧光峰;随腐蚀时间、HF含量和电流密度增加,PL峰位先发生蓝移,而后又出现红移;PL发光性能呈先增强后减弱变化趋势,分别在腐蚀时间为20 min、HF含量为6%和电流密度为60 mA/cm2时峰强出现极大值;而提高掺杂含量,PL性能降低。     

热弹性马氏体相变的内耗双峰现象

采用不完全马氏体相变法在0.01～10Hz范围内对CuAlNiMnTi多晶合金原位测量了内耗(IF)和相对动力学模量(RDM)。首次发现在完全马氏体相变中产生的单一相变内耗峰实质上是由两个不同的相变内耗峰叠加而成的,其中高温内耗峰(PH)对应于RDM的快速上升处(拐点),而低温内耗峰(PL)对应于RDM的最小值,峰位均与频率无关,因此属于相变内耗峰。     

富Si—SiO2薄膜的制备、结构及光致发光特性的研究

利用双离子束溅射沉积共溅射方法制备了富Si-SiO2薄膜,研究了沉积参数、时间、工作气压PAr.基片温度等对沉积速率的影响,用TEM和XRD分析了样品的结构,当基片温度Ts＜450℃时,所制备一系列样品均为非晶结构,当沉积基片温度较高时(Ts≥450℃),薄膜样品中才出现Si的颗粒.我们还分析了样品的室温光致发光现象,从PL谱中可以看出,样品有～320nm、～410nm、～500nm和～630nm四个PL峰,并对其发光机理进行初步探讨.     

CeO_2:Eu~(3+)薄膜的制备及其发光性能研究

采用Pechini法制备Eu3+掺杂的CeO2:Eu3+薄膜.利用X射线衍射(XRD)﹑原子力显微镜(AFM)和光致荧光光谱(PL)对样品进行表征.结果表明:薄膜样品在700℃就结晶成纯面心立方萤石结构的多晶薄膜;PL激发谱中,300～360 nm的宽带激发峰起源于基质CeO2的吸收.     

Ultraviolet photoluminescence of porous anodic alumina films

Photoluminescence (PL) properties of porous anodic alumina (PAA) films prepared by using electrochemical anodization technique in a mixed solution of oxalic and sulfuric acid have been investigated. The PAA films have an intensive ultraviolet PL emission around 350 nm, of which a possible PL mechanism has been proposed. It was found that the incorporated oxalic ions, which could transform into PL centers and exist in the PAA films, are responsible for this ultraviolet PL emission.     

纳米Zn1-xCuxO薄膜的结构及光学性质

采用射频磁控溅射制备了不同Cu掺杂浓度的ZnO薄膜．以X射线衍射、扫描电镜等对薄膜的结构和形貌进行了表征,XRD和SEM测试结果显示Cu掺杂量为5．0at．％时,Zno9,Cu0.05O薄膜呈纳米柱状结构．同时也对薄膜的光致发光（PL）进行了研究．结果表明,406nm的发光峰源于带边自由激子电子的复合,440nm的发光峰则和薄膜中的锌间隙Zni缺陷有关．     

ZnO:Al透明导电薄膜的制备及其光电性能的研究

利用溶胶-凝胶法在石英衬底上制备Al3+掺杂ZnO薄膜,研究了Al3+掺杂对ZnO薄膜微结构和光学性能的影响.XRD测量结果表明,Zn1-xAlxO薄膜具有六角纤锌矿结构,晶格常数随着Al掺杂浓度的增加而减小;紫外-可见透射光谱(UV)表明,所有薄膜在可见光区的透过率均超过80%;光致发光谱研究发现,随着Al掺杂浓度的增加ZnO的吸收带边发生蓝移,XRD和光学性能研究都证实了ZnO薄膜中的Al3+是以替位式形式存在于晶格中.     

Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm: Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide (a-Al2O3) thin films have been prepared by an alternative pulsed laser deposition. The phase structure and the surface of the deposited thin films were characterized by the X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. Effective photoluminescence (PL) in the region of 350-900nm was observed when pumped at 325nm, and the PL performance has been improved by modifying the Tm3 concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382nm and 500nm bands was improved effectively while that of 76Snm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm3 and Er3 play an important role in the evolution of the luminescent response.     

Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm:Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide （a-Al2O3） thin films have been prepared by an alternative pulsed laser deposition. The phase structure and the surface of the deposited thin films were characterized by the X-ray diffraction （XRD） and scanning electron microscopy （SEM）, respectively. Effective photoluminescence （PL） in the region of 350-900 nm was observed when pumped at 325 nm, and the PL performance has been improved by modifying the Tm^3＋ concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382 nm and 500 nm bands was improved effectively while that of 765 nm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm^3＋ and Er^3＋ play an important role in the evolution of the luminescent response.     

Effect of Tm-Er concentration ratio on the photoluminescence of Er-Tm:Al2O3 thin films fabricated by pulsed laser deposition

Er-Tm codoped amorphous aluminum oxide (a-Al2O3) thin films have been prepared by alternative pulsed laser deposition. The phase structure and surface of the deposited thin films were characterized by the X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. Effective photoluminescence (PL) in the region of 350-900 nm was observed when pumped at 325 nm, and the PL performance has been improved by modifying the Tm³⁺ concentration. With the increasing of [Tm]/[Er] concentration ratio, the intensity of emission of 382 nm and 500 nm bands was improved effectively while that of 765 nm band increased smoothly. Our results suggest that the resonant energy transfer and cross relaxation between Tm³⁺ and Er³⁺ play an important role in the evolution of the luminescent response.     

ZnCoO和ZnO纳米棒阵列的结构及发光特性

高浓度排列的ZnCoO、ZnO纳米棒在70℃下水热反应垂直生长在含ZnO薄膜涂层的玻璃上,这些阵列的形貌、结构和发光机理分别用场射扫描电子显微镜、X-ray衍射、光致发光来研究,显示出纳米棒直径为150 nm,沿着[0001]方向生长,氨水浓度和ZnO缓冲层在ZnCoO纳米棒成核和生长中起着重要的作用.用波长为325 nm的激光激发样品,测量了光致发光谱,光致发光表明PL光谱是由宽紫外光和可见光构成,并进一步观察发光谱随激发光功率密度的变化关系,对谱线强度、峰值波长进行了测量,同时对发光谱产生的机理、强度饱和值存在的原由、强度随激发光功率密度变化及紫光峰红移的起因进行了分析.