| Co-W磁性薄膜应变对其有效磁晶各向异性能的影响 |
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| 引用本文： | 秦高梧,肖娜,李松,任玉平.Co-W磁性薄膜应变对其有效磁晶各向异性能的影响[J].东北大学学报(自然科学版),2012,33(1):77-80,85. |
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| 作者姓名： | 秦高梧 肖娜 李松 任玉平 |
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| 作者单位： | 1. 东北大学材料各向异性与织构教育部重点实验室,辽宁沈阳,110819
2. 东北大学材料电磁过程研究教育部重点实验室,辽宁沈阳,110819 |
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| 基金项目： | 教育部新世纪优秀人才支持计划项目，教育部留学回国人员科研启动基金资助项目，辽宁省高等学校优秀人才支持计划项目 |
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| 摘 要： | 利用磁控溅射在250℃的MgO(220)单晶基片上先后沉积Cr(100 nm)下底层和不同厚度(9~80 nm)的Co-11%W(原子分数)磁性层,二者取向附生生长关系为Cr(112)111]∥Co-W(1010)1210]和Cr(112)110]∥Co-W(1010)0001].随着膜厚的增加,Co-W在薄膜面内的压应变(ε0)从0.781 3%减小到0.544 5%,相应地其有效磁晶各向异性能一级常数Ke1ff由3.82×106减小到2.58×106erg/cc.该结果表明通过设计磁性层和下底层之...
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| 关 键 词： | 应变 磁记录介质 磁晶各向异性能 取向附生 Co-W |
Effect of Strain of Co-W Thin Film on Effective Magnetic Anisotropy Energy |
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| QIN Gao-wu,XIAO Na,LI Song,REN Yu-ping.Effect of Strain of Co-W Thin Film on Effective Magnetic Anisotropy Energy[J].Journal of Northeastern University(Natural Science),2012,33(1):77-80,85. |
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| Authors: | QIN Gao-wu XIAO Na LI Song REN Yu-ping |
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| Institution: | 1(1.Key Laboratory for Anisotropy and Texture of Materials,Ministry of Education,Northeastern University,Shenyang 110819,China;2.Key Laboratory of Electromagnetic Processing of Materials,Ministry of Education,Northeastern University,Shenyang 110819,China.) |
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| Abstract: | Co-11at%W films with different thicknesses(9～80 nm) were deposited on MgO(220) single crystal substrate with Cr underlayer(100 nm) by magnetron sputtering.The epitaxial growth relationship between Cr and Co-W layer is Cr(112)∥Co-W(1010) and Cr(112)∥Co-W(1010).With the increasing of Co-W film thickness,the in-plane strain of Co-W layer decreases from-0.388 4% to-0.271 1%,while the out-of-plane strain decreases from 0.781 3% to 0.544 5%,and the first order effective magnetic anisotropy constant Keff1 decreases from 3.82×106 erg/cc to 2.58×106 erg/cc correspondingly.The results showed that the effective magnetic anisotropy energy of magnetic layer can be tuned by adjusting the strain between underlayer and magnetic layer. |
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| Keywords: | strain magnetic recording media magnetic animtropy energy epitaxial growth Co-W |
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